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    TWO-DIMENSIONALLY BALANCED POSITIONING DEVICE, AND LITHOGRAPHIC DEVICE PROVIDED WITH SUCH A POSITIONING DEVICE
    3.
    发明公开
    TWO-DIMENSIONALLY BALANCED POSITIONING DEVICE, AND LITHOGRAPHIC DEVICE PROVIDED WITH SUCH A POSITIONING DEVICE 失效
    与这种定位装置EQUIPPED平版印刷二维的，平衡定位

    公开(公告)号：EP0894287A1

    公开(公告)日：1999-02-03

    申请号：EP97940299.0

    申请日：1997-09-29

    申请人： Koninklijke Philips Electronics N.V.

    发明人： SPERLING, Frank, Bernhard ,  JANSSEN, Henricus, Wilhelmus, Aloysius

    IPC分类号： B23Q1 ,  B23Q11 ,  G03F7 ,  H01L21

    CPC分类号： G03F7/70766 ,  B23Q1/621 ,  B23Q1/623 ,  B23Q11/0032 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/709 ,  H01L21/682

    摘要： A positioning device (3, 121, 141) with a base (67) and a displaceable unit (5) which is displaceable relative to the base parallel to an X-direction and parallel to a Y-direction by means of an X-actuator (45, 47, 123, 125) and a Y-actuator (49, 127). The X-actuator and the Y-actuator each has a first part (51, 53, 129, 131; 59, 137) which is coupled to the displaceable unit, seen parallel to the X-direction and Y-direction, respectively, and a second part (55, 57, 133, 135; 61, 139) which is coupled to a common balancing unit (43), seen parallel to the X-direction and the Y-direction, respectively, which balancing unit is displaceably guided parallel to the X-direction and to the Y-direction along a guide (69) which extends parallel to the X-direction and the Y-direction and which is fastened to the base. During operation the first parts of the X-actuator and the Y-actuator exert on the second parts reaction forces which are directed parallel to the X-direction and to the Y-direction, respectively, whereby the common balancing unit is displaced parallel to the X-direction and the Y-direction, respectively. It is prevented thereby that the reaction forces are transmitted into the base, so that mechanical vibrations of the base are reduced. In a special embodiment, the balancing unit comprises a support body (43) which comprises a surface (41) which extends parallel to the X-direction and the Y-direction and along which the displaceable unit is guided. The positioning device (3, 121, 141) can be used for the displacement and positioning of a substrate holder (5) in a lithographic device for the manufacture of semiconductor substrates.

    LITHOGRAPHIC DEVICE WITH A THREE-DIMENSIONALLY POSITIONABLE MASK HOLDER
    4.
    发明公开
    LITHOGRAPHIC DEVICE WITH A THREE-DIMENSIONALLY POSITIONABLE MASK HOLDER 失效
    LITHOGRAPHISCHESGERÄTMIT EINEM SOWIE HORIZONTAL ALS AUCH VERTIKAL JUSTIBBEN MASKENHALTER

    公开(公告)号：EP0772800A1

    公开(公告)日：1997-05-14

    申请号：EP96903180.0

    申请日：1996-03-11

    申请人： PHILIPS ELECTRONICS N.V. ,  ASM Lithography

    发明人： LOOPSTRA, Erik, Roelof ,  SPERLING, Frank, Bernhard ,  MEIJER, Hendricus, Johannes, Maria ,  VAN EIJK, Jan

    IPC分类号： G03F7 ,  G03F9 ,  H01L21

    CPC分类号： G03F7/707 ,  G03F7/70716 ,  G03F7/70833

    摘要： The lithographic appts. includes a machine frame (45) which, seen parallel to a vertical Z direction, supports a substrate holder positioned by a device parallel to the X direction perpendicular to the Z, and a Y direction perpendicular to the X and the Z. Also included is a focusing system with a main axis directed parallel to the Z direction, and a mask holder is positioned parallel to the X by a second positioner and a radiation source. The mask holder (5) is also positionable parallel to the Y direction and is rotatable about an axis of rotation parallel to the Z direction using the second positioning device.

    摘要翻译： 平版印刷 包括平行于垂直Z方向的机架（45），其支撑由垂直于Z的X方向平行的装置定位的基板保持架以及与X和Z垂直的Y方向。还包括 具有与Z方向平行的主轴的聚焦系统，并且通过第二定位器和辐射源将掩模保持器平行于X定位。 掩模支架（5）也可以平行于Y方向定位，并且可以使用第二定位装置绕平行于Z方向的旋转轴线旋转。

    TWO-DIMENSIONALLY BALANCED POSITIONING DEVICE, AND LITHOGRAPHIC DEVICE PROVIDED WITH SUCH A POSITIONING DEVICE
    5.
    发明授权
    TWO-DIMENSIONALLY BALANCED POSITIONING DEVICE, AND LITHOGRAPHIC DEVICE PROVIDED WITH SUCH A POSITIONING DEVICE 失效
    与这种定位装置EQUIPPED平版印刷二维的，平衡定位

    公开(公告)号：EP0894287B1

    公开(公告)日：2000-07-19

    申请号：EP97940299.7

    申请日：1997-09-29

    申请人： Koninklijke Philips Electronics N.V.

    发明人： SPERLING, Frank, Bernhard ,  JANSSEN, Henricus, Wilhelmus, Aloysius

    IPC分类号： G03F7/20 ,  B23Q1/62

    CPC分类号： G03F7/70766 ,  B23Q1/621 ,  B23Q1/623 ,  B23Q11/0032 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/709 ,  H01L21/682

    摘要： A positioning device (3, 121, 141) with a base (67) and a displaceable unit (5) which is displaceable relative to the base parallel to an X-direction and parallel to a Y-direction by means of an X-actuator (45, 47, 123, 125) and a Y-actuator (49, 127). The X-actuator and the Y-actuator each has a first part (51, 53, 129, 131; 59, 137) which is coupled to the displaceable unit, seen parallel to the X-direction and Y-direction, respectively, and a second part (55, 57, 133, 135; 61, 139) which is coupled to a common balancing unit (43), seen parallel to the X-direction and the Y-direction, respectively, which balancing unit is displaceably guided parallel to the X-direction and to the Y-direction along a guide (69) which extends parallel to the X-direction and the Y-direction and which is fastened to the base. During operation the first parts of the X-actuator and the Y-actuator exert on the second parts reaction forces which are directed parallel to the X-direction and to the Y-direction, respectively, whereby the common balancing unit is displaced parallel to the X-direction and the Y-direction, respectively. It is prevented thereby that the reaction forces are transmitted into the base, so that mechanical vibrations of the base are reduced. In a special embodiment, the balancing unit comprises a support body (43) which comprises a surface (41) which extends parallel to the X-direction and the Y-direction and along which the displaceable unit is guided. The positioning device (3, 121, 141) can be used for the displacement and positioning of a substrate holder (5) in a lithographic device for the manufacture of semiconductor substrates.