公开(公告)号：EP4224155A1

公开(公告)日：2023-08-09

申请号：EP21885717.5

申请日：2021-09-10

申请人： Rigaku Corporation

发明人： HARA, Shinya ,  YAMADA, Yasujiro ,  KODAMA, Kenji ,  DOI, Makoto

IPC分类号： G01N23/223

摘要： An exclusion module (21) is configured to calculate a coating amount of each component whose measurement element is not contained in the base layers, for each of corresponding measurement lines, on an assumption that that component solely makes up the thin film and to adopt a maximum coating amount as an initial value of the coating amount of that component; and to calculate a coating amount of each component whose measurement element is contained in the base layers, for each of corresponding measurement lines, on the basis of initial values of coating amounts of individual components whose measurement elements are not contained in the base layers, if calculation results for all the corresponding measurement lines give errors, to exclude that component from analysis targets as an unquantifiable component, and in other cases, to adopt a maximum coating amount as an initial value of the coating amount of that component.

公开(公告)号：EP3336527B1

公开(公告)日：2020-04-22

申请号：EP16834897.7

申请日：2016-07-01

申请人： Rigaku Corporation

发明人： YAMADA, Yasujiro ,  HARA, Shinya ,  DOI, Makoto

IPC分类号： G01N23/223

公开(公告)号：EP3336527A1

公开(公告)日：2018-06-20

申请号：EP16834897.7

申请日：2016-07-01

申请人： Rigaku Corporation

发明人： YAMADA, Yasujiro ,  HARA, Shinya ,  DOI, Makoto

IPC分类号： G01N23/223

CPC分类号： G01N23/223 ,  G01N23/207 ,  G01N2223/076 ,  G01N2223/0766

摘要： A measurement line evaluation unit (23): calculates, for all of specified measurement lines, estimated measured intensities by theoretical calculation on the basis of a composition and/or a thickness specified for a thin film; changes, by a predetermined amount, only an estimated measured intensity of one measurement line, and obtains quantitative values of the composition and/or the thickness of the thin film after change of the estimated measured intensity, for each changed measurement line, by a fundamental parameter method; and estimates a quantitative error and/or determines possibility of analysis, on the basis of the obtained quantitative values and the specified composition and/or the specified thickness.

公开(公告)号：EP2012113B1

公开(公告)日：2015-06-24

申请号：EP06833211.3

申请日：2006-11-24

申请人： Rigaku Corporation

发明人： KATAOAKA, Yoshiyuki ,  KOHNO, Hisayuki ,  YAMASHITA, Noboru ,  DOI, Makoto

IPC分类号： G01N23/223

CPC分类号： G01N23/223 ,  G01N2223/076

公开(公告)号：EP4209780A1

公开(公告)日：2023-07-12

申请号：EP21863913.6

申请日：2021-06-09

申请人： Rigaku Corporation

发明人： KIKUTA, Shinya ,  DOI, Makoto

IPC分类号： G01N23/223 ,  G06N20/00

摘要： Provided are a total reflection X-ray fluorescence spectrometer and an estimation method which are capable of easily and quickly determining whether contamination exists on a substrate through use of a machine learning device. The total reflection X-ray fluorescence spectrometer includes: a spectrum acquisition unit configured to acquire a spectrum representing a relationship between intensities, and energies, of emitted fluorescent X-rays by irradiating a surface of a substrate with primary X-rays at a total reflection critical angle or less; and a learning unit which includes an estimation unit configured to generate estimation data on an element contained in contamination on the surface of the substrate in response to input of the spectrum, and for which learning by the estimation unit has been executed based on teacher data including the spectrum for learning and data on the element contained in the contamination on the surface of the substrate which has been used to acquire the spectrum for learning and the estimation data generated when the spectrum for learning is input to the estimation unit.