公开(公告)号：EP0706582B9

公开(公告)日：2004-11-03

申请号：EP94918171.3

申请日：1994-05-25

申请人： RODEL, INC.

发明人： BRANCALEONI, Gregory ,  COOK, Lee Melbourne

IPC分类号： C23F1/00 ,  H01L21/306 ,  C09G1/02

CPC分类号： H01L21/3212 ,  C09G1/02 ,  H01L21/31053 ,  Y10S451/905

摘要： Improved compositions for polishing silicon, silica or silicon-containing articles, including a composite of metal and silica, comprising an aqueous medium, abrasive particles, an oxidizing agent and an anion which suppresses the rate of removal of silica are provided. The anion is derived from a class of compounds which contain at least two acid groups and where the pKa of the first dissociable acid is not substantially larger than the pH of the polishing composition. Methods using the composition to polish or planarize the surfaces of workpieces, as well as products produced by such methods, are also provided.

公开(公告)号：EP0706582A1

公开(公告)日：1996-04-17

申请号：EP94918171.0

申请日：1994-05-25

申请人： Rodel, Inc.

发明人： BRANCALEONI, Gregory ,  COOK, Lee Melbourne

IPC分类号： B24B37 ,  C04B41 ,  C09G1 ,  C23F1 ,  H01L21

CPC分类号： H01L21/3212 ,  C09G1/02 ,  H01L21/31053 ,  Y10S451/905

摘要： Improved compositions for polishing silicon, silica or silicon-containing articles, including a composite of metal and silica, comprising an aqueous medium, abrasive particles, an oxidizing agent and an anion which suppresses the rate of removal of silica are provided. The anion is derived from a class of compounds which contain at least two acid groups and where the pKa of the first dissociable acid is not substantially larger than the pH of the polishing composition. Methods using the composition to polish or planarize the surfaces of workpieces, as well as products produced by such methods, are also provided.

公开(公告)号：EP0706582B2

公开(公告)日：2004-03-17

申请号：EP94918171.3

申请日：1994-05-25

申请人： RODEL, INC.

发明人： BRANCALEONI, Gregory ,  COOK, Lee Melbourne

IPC分类号： C23F1/00 ,  H01L21/306 ,  C09G1/02

CPC分类号： H01L21/3212 ,  C09G1/02 ,  H01L21/31053 ,  Y10S451/905

摘要： Improved compositions for polishing silicon, silica or silicon-containing articles, including a composite of metal and silica, comprising an aqueous medium, abrasive particles, an oxidizing agent and an anion which suppresses the rate of removal of silica are provided. The anion is derived from a class of compounds which contain at least two acid groups and where the pKa of the first dissociable acid is not substantially larger than the pH of the polishing composition. Methods using the composition to polish or planarize the surfaces of workpieces, as well as products produced by such methods, are also provided.

摘要翻译： 提供了用于抛光硅，二氧化硅或含硅制品（包括金属和二氧化硅的复合物）的改进组合物，其包含水性介质，磨粒，氧化剂和抑制二氧化硅去除速率的阴离子。 阴离子来源于一类含有至少两个酸性基团的化合物，并且其中第一可离解酸的pKa基本上不大于抛光组合物的pH值。 还提供了使用该组合物抛光或平面化工件表面的方法，以及由这种方法生产的产品。

公开(公告)号：EP0706582B1

公开(公告)日：2001-05-02

申请号：EP94918171.3

申请日：1994-05-25

申请人： RODEL, INC.

发明人： BRANCALEONI, Gregory ,  COOK, Lee Melbourne

IPC分类号： C23F1/00 ,  H01L21/306 ,  C09G1/02

CPC分类号： H01L21/3212 ,  C09G1/02 ,  H01L21/31053 ,  Y10S451/905

摘要： Improved compositions for polishing silicon, silica or silicon-containing articles, including a composite of metal and silica, comprising an aqueous medium, abrasive particles, an oxidizing agent and an anion which suppresses the rate of removal of silica are provided. The anion is derived from a class of compounds which contain at least two acid groups and where the pKa of the first dissociable acid is not substantially larger than the pH of the polishing composition. Methods using the composition to polish or planarize the surfaces of workpieces, as well as products produced by such methods, are also provided.

摘要翻译： 提供用于抛光硅，二氧化硅或含硅制品的改进的组合物，其由水性介质，磨料颗粒和控制二氧化硅去除速率的阴离子组成。 阴离子衍生自一类含有至少两个酸基的化合物，其中第一离解酸的pKa基本上不大于抛光组合物的pH。 还提供了使用组合物来抛光或平坦化工件表面的方法，以及通过这些方法生产的产品。