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公开(公告)号：EP0314634A3
公开(公告)日：1990-09-19
申请号：EP88830426.8
申请日：1988-10-20
IPC分类号： B24B33/08
CPC分类号： B24B33/10 , B23Q1/36 , B24B33/08 , B24B41/06 , Y10S451/905
摘要： In improved equipment for lapping internal surfaces, use is made of a composite lap (12), the rod (2) of which is held by the tool spindle (11) and inserted with a marginal degree of clearance into a cone (3) that carries the abrasive shell (4), and a chucking mechanism (1) located beneath and coaxial with the spindle and lap; errors are avoided, particularly with small-bore work, by embodying the lap rod (2) in three rigidly associated sections (7, 8 and 9), namely, a polygonal tip (7), insertable and fastened with a transverse pin (10) in a matching polygonal socket (13) offered by the cone (3), a flexible coupling section (8), and a shank (9) uppermost that is screwed into or otherwise clamped to the spindle. Work to be lapped is held in a chuck (1) suspended from at least three cables (5, 6) threaded through relative peripheral mountings (14) afforded by the chuck itself.
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公开(公告)号：EP0706582B2
公开(公告)日：2004-03-17
申请号：EP94918171.3
申请日：1994-05-25
申请人： RODEL, INC.
IPC分类号： C23F1/00 , H01L21/306 , C09G1/02
CPC分类号： H01L21/3212 , C09G1/02 , H01L21/31053 , Y10S451/905
摘要： Improved compositions for polishing silicon, silica or silicon-containing articles, including a composite of metal and silica, comprising an aqueous medium, abrasive particles, an oxidizing agent and an anion which suppresses the rate of removal of silica are provided. The anion is derived from a class of compounds which contain at least two acid groups and where the pKa of the first dissociable acid is not substantially larger than the pH of the polishing composition. Methods using the composition to polish or planarize the surfaces of workpieces, as well as products produced by such methods, are also provided.
摘要翻译： 提供了用于抛光硅，二氧化硅或含硅制品（包括金属和二氧化硅的复合物）的改进组合物，其包含水性介质，磨粒，氧化剂和抑制二氧化硅去除速率的阴离子。 阴离子来源于一类含有至少两个酸性基团的化合物，并且其中第一可离解酸的pKa基本上不大于抛光组合物的pH值。 还提供了使用该组合物抛光或平面化工件表面的方法，以及由这种方法生产的产品。
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公开(公告)号：EP0706582A4
公开(公告)日：1997-06-11
申请号：EP94918171
申请日：1994-05-25
申请人： RODEL INC
IPC分类号： B24B37/00 , C04B41/91 , C09G1/02 , C23F1/24 , C23F1/30 , H01L21/304 , H01L21/306 , H01L21/3105 , H01L21/321 , C23F1/00
CPC分类号： H01L21/3212 , C09G1/02 , H01L21/31053 , Y10S451/905
摘要： Improved compositions for polishing silicon, silica or silicon-containing articles, including a composite of metal and silica, comprising an aqueous medium, abrasive particles, an oxidizing agent and an anion which suppresses the rate of removal of silica are provided. The anion is derived from a class of compounds which contain at least two acid groups and where the pKa of the first dissociable acid is not substantially larger than the pH of the polishing composition. Methods using the composition to polish or planarize the surfaces of workpieces, as well as products produced by such methods, are also provided.
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公开(公告)号：EP0370843B1
公开(公告)日：1992-07-15
申请号：EP89402889.3
申请日：1989-10-19
发明人： Broido, Georges
CPC分类号： B24B37/12 , B24D7/063 , Y10S451/905
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公开(公告)号：EP0706582A1
公开(公告)日：1996-04-17
申请号：EP94918171.0
申请日：1994-05-25
申请人： Rodel, Inc.
CPC分类号： H01L21/3212 , C09G1/02 , H01L21/31053 , Y10S451/905
摘要： Improved compositions for polishing silicon, silica or silicon-containing articles, including a composite of metal and silica, comprising an aqueous medium, abrasive particles, an oxidizing agent and an anion which suppresses the rate of removal of silica are provided. The anion is derived from a class of compounds which contain at least two acid groups and where the pKa of the first dissociable acid is not substantially larger than the pH of the polishing composition. Methods using the composition to polish or planarize the surfaces of workpieces, as well as products produced by such methods, are also provided.
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7.发明公开
公开(公告)号：EP0314634A2
公开(公告)日：1989-05-03
申请号：EP88830426.8
申请日：1988-10-20
IPC分类号： B24B33/08
CPC分类号： B24B33/10 , B23Q1/36 , B24B33/08 , B24B41/06 , Y10S451/905
摘要： In improved equipment for lapping internal surfaces, use is made of a composite lap (12), the rod (2) of which is held by the tool spindle (11) and inserted with a marginal degree of clearance into a cone (3) that carries the abrasive shell (4), and a chucking mechanism (1) located beneath and coaxial with the spindle and lap; errors are avoided, particularly with small-bore work, by embodying the lap rod (2) in three rigidly associated sections (7, 8 and 9), namely, a polygonal tip (7), insertable and fastened with a transverse pin (10) in a matching polygonal socket (13) offered by the cone (3), a flexible coupling section (8), and a shank (9) uppermost that is screwed into or otherwise clamped to the spindle. Work to be lapped is held in a chuck (1) suspended from at least three cables (5, 6) threaded through relative peripheral mountings (14) afforded by the chuck itself.
摘要翻译： 在用于研磨内表面的改进的设备中，使用由工具主轴（11）保持的杆（2）并且将边缘的间隙插入到锥体（3）中的复合搭扣（12），所述组合搭扣（12） 携带磨料壳体（4）和夹紧机构（1），其位于主轴和搭接部下方并与之同轴; 避免了误差，特别是通过在三个刚性相关部分（7,8和9）中体现搭接棒（2）的小口径工作，即多边形尖端（7），可插入并用横向销（10 ）在由锥体（3）提供的匹配的多边形插座（13）中，柔性联接部分（8）和最上部的柄部（9）被旋入或以其他方式夹紧到心轴。 待研磨的工件被保持在从至少三根电缆（5,6）悬挂的卡盘（1）中，该电缆穿过由卡盘本身提供的相对外围安装件（14）。
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8.发明授权
公开(公告)号：EP0706582B1
公开(公告)日：2001-05-02
申请号：EP94918171.3
申请日：1994-05-25
申请人： RODEL, INC.
IPC分类号： C23F1/00 , H01L21/306 , C09G1/02
CPC分类号： H01L21/3212 , C09G1/02 , H01L21/31053 , Y10S451/905
摘要： Improved compositions for polishing silicon, silica or silicon-containing articles, including a composite of metal and silica, comprising an aqueous medium, abrasive particles, an oxidizing agent and an anion which suppresses the rate of removal of silica are provided. The anion is derived from a class of compounds which contain at least two acid groups and where the pKa of the first dissociable acid is not substantially larger than the pH of the polishing composition. Methods using the composition to polish or planarize the surfaces of workpieces, as well as products produced by such methods, are also provided.
摘要翻译： 提供用于抛光硅，二氧化硅或含硅制品的改进的组合物，其由水性介质，磨料颗粒和控制二氧化硅去除速率的阴离子组成。 阴离子衍生自一类含有至少两个酸基的化合物，其中第一离解酸的pKa基本上不大于抛光组合物的pH。 还提供了使用组合物来抛光或平坦化工件表面的方法，以及通过这些方法生产的产品。
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9.发明公开
公开(公告)号：EP0526914A2
公开(公告)日：1993-02-10
申请号：EP92118100.4
申请日：1988-10-20
申请人： MAS S.r.L.
IPC分类号： B24B41/06
CPC分类号： B24B33/10 , B23Q1/36 , B24B33/08 , B24B41/06 , Y10S451/905
摘要： In improved equipment for lapping internal surfaces, work to be lapped is held in a chuck (1) suspended from at least three cables (5, 6) threaded through relative peripheral mountings (14) afforded by the chuck itself.
摘要翻译： 在用于研磨内表面的改进设备中，待研磨的工件被保持在从由卡盘本身提供的相对外围安装件（14）穿过的至少三根电缆（5,6）悬挂的卡盘（1）中。
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公开(公告)号：EP0370843A1
公开(公告)日：1990-05-30
申请号：EP89402889.3
申请日：1989-10-19
发明人： Broido, Georges
CPC分类号： B24B37/12 , B24D7/063 , Y10S451/905
摘要： Les arcs (3 à 13) découpés dans les parties tendres (1) par un cercle de rayon égal à la motié environ de celui du disque et dont le centre est à une distance de celui du disque égal à la moitié du rayon du disque ont une longueur comprise entre 0,5 et 5 mm. Polissage de pièces.
摘要翻译： 弧（3至13）将软部件（1）切割成半径等于盘的大约一半的圆，并且其中心距盘的距离等于盘的半径的一半 长度在0.5到5毫米之间。 抛光工件。 ...
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