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公开(公告)号：EP3336126A1
公开(公告)日：2018-06-20
申请号：EP17205302.7
申请日：2017-12-04
发明人： KINZIE, Charles R. , GREENE, Daniel , GILMORE, Christopher , CAMERON, James F. , DING, Ping , WANG, Qing-Min , KIM, Young-Seok
IPC分类号： C08G61/10 , C08G61/12 , C09D165/02 , C08L65/02 , H01L23/532
CPC分类号： C08F32/06 , C07C49/537 , C08G61/10 , C08G61/12 , C08G2261/135 , C08G2261/1426 , C08G2261/312 , C08G2261/46 , C08G2261/64 , C08G2261/65 , C08G2261/76 , C08L45/00 , C08L65/02 , C08L67/03 , C09D165/02 , H01L23/5329
摘要： Certain cyclopentadienone monomers having polar moieties are useful in forming polyarylene resins having improved solubility in certain organic solvents and are useful in forming polyarylene resin layers in electronics applications.
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公开(公告)号：EP3343293A1
公开(公告)日：2018-07-04
申请号：EP17211251.8
申请日：2017-12-29
CPC分类号： G03F7/0035 , C23C18/1612 , C23C18/1667 , C23C18/1689 , C23C18/1844 , C23C18/38 , G03F7/0045 , G03F7/0046 , G03F7/039 , G03F7/0392 , G03F7/0397 , G03F7/2037 , G03F7/322 , G03F7/40
摘要： A patterning process, comprises: (i) forming a radiation-sensitive film on a substrate, wherein the radiation-sensitive film comprises: (a) a resin, (b) a photoacid generator, (c) a first quencher, and (d) a second quencher; (ii) patternwise exposing the radiation-sensitive film to activating radiation; and (iii) contacting the radiation-sensitive film with an alkaline developing solution to form a resist pattern; wherein the resin comprises the following repeat units:
wherein: Ri is selected from a hydrogen atom, an alkyl group having from 1 to 4 carbon atoms, a cyano group or a trifluoromethyl group; Z is a non-hydrogen substituent that provides an acid-labile moiety; n is from 40 to 90 mol%; m is from 10 to 60 mol%; and the total combined content of the two repeat units in the resin is 80 mol% or more based on all repeat units of the resin; and the first quencher is selected from benzotriazole or a derivative thereof.
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