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公开(公告)号：EP3068819B1
公开(公告)日：2019-03-27
申请号：EP13896914.2
申请日：2013-11-06
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2.发明公开POLYMERS CONTAINING BENZIMIDAZOLE MOIETIES AS LEVELERS 审中-公开POLYMER MIT BENZIMIDAZOLGRUPPEN ALS NIVELLIERER
公开(公告)号：EP3036224A1
公开(公告)日：2016-06-29
申请号：EP13897823.4
申请日：2013-11-20
发明人： DUAN, Lingli , LI, Yang , SUN, Tong , FENG, Shaoguang , CHEN, Chen , NIAZIMBETOVA, Zuhra I. , RZEZNIK, Maria Anna
IPC分类号： C07D235/20 , C07D235/08 , C25D3/00
CPC分类号： H05K3/423 , C08G73/0677 , C25D3/02 , C25D3/32 , C25D3/38 , C25D5/56 , C25D7/00 , C25D7/123 , H05K3/241
摘要： Polymers of reaction products of dihalogens and compounds containing benzimidazole moieties are included in metal electroplating compositions to provide level metal deposits on substrates.
摘要翻译： 二卤素和含有苯并咪唑部分的化合物的反应产物的聚合物包括在金属电镀组合物中以在基材上提供金属沉积物。
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公开(公告)号：EP3288991B1
公开(公告)日：2020-03-18
申请号：EP15890233.8
申请日：2015-04-28
IPC分类号： C08G73/10 , C07D241/04 , C07D413/10 , C07D265/33 , C09D179/02 , C09D179/08 , C08G73/02 , C25D3/38 , C25D3/32 , C25D3/58 , C25D3/60 , C07D413/06 , C07D413/12
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4.发明公开REACTION PRODUCTS OF DIAMINES WITH REACTION PRODUCTS OF MONOAMINES AND BISANHYDRIDES AS ADDITIVES FOR ELECTROPLATING BATHS 审中-公开含有单胺和双醛水溶液反应产物的二胺反应产物作为电镀浴添加剂
公开(公告)号：EP3288991A1
公开(公告)日：2018-03-07
申请号：EP15890233.8
申请日：2015-04-28
CPC分类号： C07D413/12 , C07D241/04 , C07D265/33 , C07D413/06 , C07D413/10 , C08G73/028 , C08G73/1017 , C09D179/02 , C09D179/08 , C25D3/30 , C25D3/32 , C25D3/38 , C25D3/58 , C25D3/60
摘要： Reaction products of diamines with the reaction products of monoamines and bisanhydrides are included as additives in metal electroplating baths. The metal electroplating baths have good throwing power and deposit metal layers having substantially planar surfaces. The metal plating baths may be used to deposit metal on substrates with surface features such as through-holes and vias.
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公开(公告)号：EP3036224B1
公开(公告)日：2019-04-17
申请号：EP13897823.4
申请日：2013-11-20
发明人： DUAN, Lingli , LI, Yang , SUN, Tong , FENG, Shaoguang , CHEN, Chen , NIAZIMBETOVA, Zuhra I. , RZEZNIK, Maria Anna
IPC分类号： C07D235/20 , C07D235/08 , C25D3/00 , C25D7/12 , C25D3/02 , C25D3/38 , C25D3/32 , C25D7/00 , H05K3/24
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6.发明公开REACTION PRODUCTS OF AMINE MONOMERS AND POLYMERS CONTAINING SATURATED HETEROCYCLIC MOIETIES AS ADDITIVES FOR ELECTROPLATING BATHS 审中-公开胺类单体的反应产物和含饱和杂环官能团的聚合物作为电镀浴添加剂
公开(公告)号：EP3289003A1
公开(公告)日：2018-03-07
申请号：EP15890232.0
申请日：2015-04-28
CPC分类号： C25D3/32 , C08G73/00 , C08G73/1017 , C08G73/1092 , C08K5/17 , C25D3/30 , C25D3/38 , C25D7/00 , H05K3/241
摘要： Reaction products of amines and polymers containing saturated heterocyclic moieties may be used as levelers in metal electroplating baths. The reaction products may plate metal with good surface properties and good physical reliability.
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7.发明公开REACTION PRODUCTS OF BISANHYDRIDS AND DIAMINES AS ADDITIVES FOR ELECTROPLATING BATHS 审中-公开双乙醇胺和二胺作为电镀浴添加剂的反应产物
公开(公告)号：EP3288990A1
公开(公告)日：2018-03-07
申请号：EP15890231.2
申请日：2015-04-28
CPC分类号： C07D265/33 , C07D241/04 , C07D413/12 , C08G73/028 , C08G73/0293 , C08G73/10 , C09D179/08 , C25D3/32 , C25D3/38 , C25D7/00 , C25D7/123
摘要： Reaction products of primary and secondary diamines and bisanhydrides are included as additives in metal electroplating baths. The metal electroplating baths have good throwing power and deposit metal layers having substantially planar surfaces. The metal plating baths may be used to deposit metal on substrates with surface features such as through-holes and vias.
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公开(公告)号：EP3068819A1
公开(公告)日：2016-09-21
申请号：EP13896914.2
申请日：2013-11-06
CPC分类号： C25D3/32 , C08G73/0616 , C09D179/04 , C25D3/38 , C25D3/58 , C25D3/60 , C25D7/00 , C25D7/123 , H05K3/10 , H05K3/188 , H05K2203/0723 , C08K3/30 , C08L71/02
摘要： Polymers of reaction products of polyamines and nitrogen containing cyclic compounds are included in metal electroplating compositions to provide level metal deposits on substrates.
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公开(公告)号：EP3048190B1
公开(公告)日：2018-06-27
申请号：EP15194687.8
申请日：2015-11-16
摘要： Sulfonamide based polymers are reaction products of sulfonamides and epoxides. The polymers may be used as levelers in copper electroplating baths, to provide good throwing power. Such reaction products may plate copper or copper alloys with good surface properties and good physical reliability.
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10.发明授权
公开(公告)号：EP2444522B1
公开(公告)日：2017-04-05
申请号：EP11185777.7
申请日：2011-10-19
发明人： LIU, Feng , RZEZNIK, Maria Anna
IPC分类号： C23C18/28
CPC分类号： C23C18/28
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