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    METHOD OF FORMING NOZZLE FOR INJECTORS AND METHOD OF MANUFACTURING INK JET HEAD
    1.
    发明公开
    METHOD OF FORMING NOZZLE FOR INJECTORS AND METHOD OF MANUFACTURING INK JET HEAD 失效
    法形成一种生产喷墨头喷雾和方法

    公开(公告)号：EP0985534A1

    公开(公告)日：2000-03-15

    申请号：EP98919579.7

    申请日：1998-05-13

    申请人： SEIKO EPSON CORPORATION

    发明人： MAKIGAKI, Tomohiro ,  TAKEKOSHI, Taro ,  FUJII, Masahiro ,  KITAHARA, Koji ,  FUJITA, Seiichi

    IPC分类号： B41J2/135 ,  B41J2/16

    CPC分类号： B41J2/1629 ,  B41J2/16 ,  B41J2/162 ,  B41J2/1628 ,  B41J2/1635 ,  B41J2002/043 ,  B41J2002/14387 ,  B41J2002/14411

    摘要： When a nozzle (21) with a stepwise cross-section, which is provided with a small cross-section nozzle portion (21a) formed on the front side thereof and with a large cross-section nozzle portion (21b) formed on the rear side thereof in a discharge direction, respectively, is formed by applying etching to a silicon wafer (200) for forming a nozzle plate (2), a resist film (210) is formed on a surface (200a) of the silicon wafer (200), and patterning by half-etching and patterning by full-etching is applied to the resist film (210). Next, anisotropic-dry-etching is applied to the silicon wafer (200) by ICP discharge, thereby forming grooves at the full-etched portions. Next, the resist film at the half-etched portions is removed and anisotropic-dry-etching is applied to the portions from which the resist film is removed by ICP discharge. As a result, there can be simply formed on a monocrystalline silicon substrate an ink nozzle having a stepwise cross-section and further having an action, which is larger than that of a conventional ink nozzle, for aligning the directions of pressures applied from cavities to nozzles in a nozzle axis direction.

    摘要翻译： 当其设置有形成于前侧的小横截面的喷嘴部分（21a）和具有大横截面的喷嘴部的喷嘴（21）配有一个阶梯状的横截面，所有（21B）形成在后侧 其在排放方向，分别是通过蚀刻硅晶片（200），用于形成喷嘴板（2），抗蚀剂薄膜 - （210）形成的表面上形成（200A）的硅晶片（200） ，和图案化通过半蚀刻和图案化通过全蚀刻被施加到抗蚀剂薄膜 - （210）。 接着，各向异性干蚀刻被施加到通过ICP放电硅晶片（200），从而形成在完全蚀刻的部分的槽。 接着，将抗蚀剂膜在半蚀刻部分被去除和各向异性干蚀刻被施加到从所述抗蚀剂电影的部分是由ICP放电去除。 其结果是，能够简单地形成在一个单晶硅基底具有墨喷嘴以逐步的横截面并且还具有以动作，所有这一切是比常规墨水喷嘴的直径，用于对准的压力的从腔施加到方向 喷嘴在喷嘴轴方向。

    ELECTROSTATIC ACTUATOR, ITS MANUFACTURING METHOD, AND LIQUID INJECTION DEVICE USING THEM
    4.
    发明公开
    ELECTROSTATIC ACTUATOR, ITS MANUFACTURING METHOD, AND LIQUID INJECTION DEVICE USING THEM 有权
    静电驱动器，其制造的IT流程和那些用于液体喷射装置

    公开(公告)号：EP0985533A1

    公开(公告)日：2000-03-15

    申请号：EP99909216.6

    申请日：1999-03-17

    申请人： SEIKO EPSON CORPORATION

    发明人： FUJII, Masahiro ,  MARUYAMA, Hiroyuki ,  SATO, Kazuhiko ,  KITAHARA, Koji ,  MAKIGAKI, Tomohiro ,  NOJIMA, Shigeo ,  TAKEKOSHI, Taro

    IPC分类号： B41J2/045 ,  B41J2/055

    CPC分类号： B41J2/1626 ,  B41J2/14314 ,  B41J2/16 ,  B41J2/1623 ,  B41J2/164 ,  B41J2/1642 ,  B41J2/1646 ,  B41J2002/14387 ,  B41J2002/14411 ,  B41J2202/03 ,  Y10T29/42

    摘要： An electrostatic ink jet head (1) using an electrostatic actuator and its manufacturing method, comprising pressure chambers (6) communicating with ink nozzles (21) and an atmospheric pressure chamber (12) open to the atmosphere, wherein diaphragms (5) are formed on the bottom surfaces of the pressure chambers (6), a voltage is applied between the diaphragms (5) and electrodes (43) to vibrate the diaphragms (5) electrostatically so as to inject ink droplets, vibration chambers (41) communicate with a pressure compensating chamber (49), a displacement plate (16) which is displaceable toward the outside of the bottom surface of the pressure compensating chamber (49) according to a variation in atmospheric pressure is formed on the bottom surface of the pressure compensating chamber (49), the volume of the pressure compensating chamber (49) is increased or decreased according to the displacement of the displacement plate (16) so that the inside pressure of each vibration chamber (41) communicating with the pressure compensating chamber (49) is regulated to the atmospheric pressure, whereby the vibration characteristics of the diaphragms (5) can be kept constant even if the atmospheric pressure is varied so as to maintain an appropriate ink-droplet injecting operation.

    摘要翻译： 利用在静电致动器及其制造方法的静电喷墨头（1），包括压力腔室（6）与墨水喷嘴（21）和大气压力腔（12）向大气开放，worin隔膜（5）形成连通 腔室（6），将电压施加在膜片之间施加（5）和电极（43），以振动所述膜片的压力的底表面（5）上静电，以便注入墨滴，振动腔室（41）与通信 压力补偿室（49），一位移板（16），所有这些是朝向压力的底表面的补偿外部腔室（49）雅丁移位以在大气压力的变化是形成在压力补偿室的底表面（上 49）中，压力补偿室（49）的容积增大或减小gemäß到位移板（16的位移）象各振动室的内部压力（41）通讯 与压力补偿室unicating（49）被调节到大气压，由此膜片（5）的振动特性可以即使大气压力变化时，可以保持恒定，从而在适当的墨滴喷射操作维护。

    INK JET HEAD
    5.
    发明公开
    INK JET HEAD 失效
    喷墨头

    公开(公告)号：EP0679514A1

    公开(公告)日：1995-11-02

    申请号：EP94903033.2

    申请日：1993-12-21

    申请人： SEIKO EPSON CORPORATION

    发明人： KAMISUKI, Shinichi ,  ATOBE, Mitsuro ,  KOEDA, Hiroshi ,  YOTSUYA, Shinichi ,  FUJII, Masahiro ,  KOBAYASHI, Naoki

    IPC分类号： B41J2/05 ,  B41J2/045

    CPC分类号： B41J2/04541 ,  B41J2/04578 ,  B41J2/16 ,  B41J2/1623 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1642 ,  B41J2/1646 ,  B41J2002/14379 ,  B41J2202/03

    摘要： An ink jet head wherein a charge is applied to a thin plate-shaped diaphragm formed on a Si or other semiconductor substrate, and to an electrode disposed in opposition to said diaphragm to electrostatically deform the diaphragm and eject ink, and wherein a single layer or multiple layer metallic coating forming ohmic contact with the semiconductor substrate is formed as a common electrode on the semiconductor substrate. In addition, a group III or group V element is doped to a high concentration where the common electrode is formed on the semiconductor substrate. The diaphragm can therefore vibrate at high speed, and an ink jet head capable of high speed printing can be provided because supply and elimination of the charge to the diaphragm can be accomplished at high speed.

    摘要翻译： 一种喷墨头，其中电荷被施加到形成在Si或其它半导体衬底上的薄板状隔膜，以及与所述隔膜相对设置的电极，以使所述隔膜静电变形并喷射墨水，并且其中单层或 与半导体衬底形成欧姆接触的多层金属涂层形成为半导体衬底上的公共电极。 另外，III族或V族元素以高浓度掺杂，其中公共电极形成在半导体衬底上。 因此，膜片可以高速振动，并且可以提供能够高速打印的喷墨头，因为可以高速地向膜片供给和消除电荷。