Abstract:
An aqueous metal ion containing developer composition for developing photoresists comprising a metal ion-free alkali and a metal ion-free surfactant that is a quaternary ammonium compound. The developer permits a reduction of from 20 to 50% in the energy necessary to expose the photoresist without deleterious effect on image quality and image resolution.
Abstract:
An aqueous metal ion containing developer composition for developing photoresists comprising a metal ion-free alkali and a metal ion-free surfactant that is a quaternary ammonium compound. The developer permits a reduction of from 20 to 50% in the energy necessary to expose the photoresist without deleterious effect on image quality and image resolution.
Abstract:
An aqueous metal ion-free developer composition for developing photoresists comprising a metal ion-free alkali and a metal ion-free surfactant that is quaternary ammonium compound. The developer permits a reduction of from 40-50% in the energy necessary to expose the photoresist without deleterious effect on image quality and image resolution.