Developer compositions for photoresists
    1.
    发明公开
    Developer compositions for photoresists 失效
    光电开发者组合物

    公开(公告)号:EP0097282A3

    公开(公告)日:1984-07-25

    申请号:EP83105619

    申请日:1983-06-08

    CPC classification number: G03F7/322

    Abstract: An aqueous metal ion containing developer composition for developing photoresists comprising a metal ion-free alkali and a metal ion-free surfactant that is a quaternary ammonium compound. The developer permits a reduction of from 20 to 50% in the energy necessary to expose the photoresist without deleterious effect on image quality and image resolution.

    Developer compositions for photoresists
    2.
    发明公开
    Developer compositions for photoresists 失效
    EntwicklerzusammensetzungfürFotolacke。

    公开(公告)号:EP0097282A2

    公开(公告)日:1984-01-04

    申请号:EP83105619.7

    申请日:1983-06-08

    CPC classification number: G03F7/322

    Abstract: An aqueous metal ion containing developer composition for developing photoresists comprising a metal ion-free alkali and a metal ion-free surfactant that is a quaternary ammonium compound. The developer permits a reduction of from 20 to 50% in the energy necessary to expose the photoresist without deleterious effect on image quality and image resolution.

    Abstract translation: 一种含金属离子的显影剂组合物,用于显影光致抗蚀剂,其包含不含金属离子的碱和作为季铵化合物的无金属离子的表面活性剂。 显影剂允许将曝光光刻胶所需的能量从20%减少到50%,而对图像质量和图像分辨率没有有害影响。

    Metal ion-free photoresist developer composition
    4.
    发明公开
    Metal ion-free photoresist developer composition 失效
    Metallionenfreie EntwicklerzusammensetzungfürPhotoresist。

    公开(公告)号:EP0062733A1

    公开(公告)日:1982-10-20

    申请号:EP82100579.0

    申请日:1982-01-28

    CPC classification number: G03F7/322

    Abstract: An aqueous metal ion-free developer composition for developing photoresists comprising a metal ion-free alkali and a metal ion-free surfactant that is quaternary ammonium compound. The developer permits a reduction of from 40-50% in the energy necessary to expose the photoresist without deleterious effect on image quality and image resolution.

    Abstract translation: 一种用于显影光致抗蚀剂的无金属离子的显影剂组合物,其包含不含金属离子的碱和作为季铵化合物的无金属离子的表面活性剂。 显影剂允许从曝光光刻胶所需的能量减少40-50%,而不会对图像质量和图像分辨率产生有害影响。

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