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公开(公告)号：EP0273026A3
公开(公告)日：1990-06-13
申请号：EP87870199.4
申请日：1987-12-22
Applicant: SHIPLEY COMPANY INC.
Inventor： Daniels, Brian Kenneth , Madoux, David Charles , Templeton, Michael Karpovich , Trefonas III, Peter , Woodbrey, James Calvin , Zampani, Anthony
CPC classification number: G03F7/0226 , G03F7/0048 , G03F7/022
Abstract: This invention is directed to novel photoresist processes and compositions having high resolution novalac resins, high resolution photoactive components with several diazoquinone groups per molecule, and solvents having a high solvency power, better safety, improved photospeed, higher contrast and equivalent cast film thickness from lower percent sofids formulations.
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Patent Agency Ranking2.发明公开
公开(公告)号：EP0273026A2
公开(公告)日：1988-06-29
申请号：EP87870199.4
申请日：1987-12-22
Applicant: SHIPLEY COMPANY INC.
Inventor： Daniels, Brian Kenneth , Madoux, David Charles , Templeton, Michael Karpovich , Trefonas III, Peter , Woodbrey, James Calvin , Zampani, Anthony
CPC classification number: G03F7/0226 , G03F7/0048 , G03F7/022
Abstract: This invention is directed to novel photoresist processes and compositions having high resolution novalac resins, high resolution photoactive components with several diazoquinone groups per molecule, and solvents having a high solvency power, better safety, improved photospeed, higher contrast and equivalent cast film thickness from lower percent sofids formulations.
Abstract translation: 本发明涉及具有高分辨率诺瓦克树脂的新型光致抗蚀剂工艺和组合物，每分子具有几个重氮醌基团的高分辨率光活性组分和具有高溶解能力，更好的安全性，更高的感光速度，更高的对比度和相当于从较低的 固体含量百分数。
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公开(公告)号：EP0718693A3
公开(公告)日：1998-03-11
申请号：EP96102977.4
申请日：1987-12-22
Applicant: SHIPLEY COMPANY INC.
Inventor： Daniels, Brian Kenneth , Madoux, David Charles , Templeton, Michael Karpovich , Trefonas III, Peter , Woodbrey, James Calvin , Zampani, Anthony
CPC classification number: G03F7/0226 , G03F7/0048 , G03F7/022
Abstract: This invention is directed to novel photoresist processes and compositions having high resolution alkali-soluble resins, high resolution photoactive components with several diazoquinone groups per molecule, and solvents having a high solvency power, better safety, improved photospeed, higher contrast and equivalent cast film thickness from lower percent solids formulations.
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公开(公告)号：EP0273026B1
公开(公告)日：1996-09-11
申请号：EP87870199.4
申请日：1987-12-22
Applicant: SHIPLEY COMPANY INC.
Inventor： Daniels, Brian Kenneth , Madoux, David Charles , Templeton, Michael Karpovich , Trefonas III, Peter , Woodbrey, James Calvin , Zampani, Anthony
CPC classification number: G03F7/0226 , G03F7/0048 , G03F7/022
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公开(公告)号：EP0718693B1
公开(公告)日：2003-07-02
申请号：EP96102977.4
申请日：1987-12-22
Applicant: SHIPLEY COMPANY INC.
Inventor： Daniels, Brian Kenneth , Madoux, David Charles , Templeton, Michael Karpovich , Trefonas III, Peter , Woodbrey, James Calvin , Zampani, Anthony
CPC classification number: G03F7/0226 , G03F7/0048 , G03F7/022
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6.发明公开
公开(公告)号：EP0718693A2
公开(公告)日：1996-06-26
申请号：EP96102977.4
申请日：1987-12-22
Applicant: SHIPLEY COMPANY INC.
Inventor： Daniels, Brian Kenneth , Madoux, David Charles , Templeton, Michael Karpovich , Trefonas III, Peter , Woodbrey, James Calvin , Zampani, Anthony
CPC classification number: G03F7/0226 , G03F7/0048 , G03F7/022
Abstract: This invention is directed to novel photoresist processes and compositions having high resolution alkali-soluble resins, high resolution photoactive components with several diazoquinone groups per molecule, and solvents having a high solvency power, better safety, improved photospeed, higher contrast and equivalent cast film thickness from lower percent solids formulations.
Abstract translation: 本发明涉及具有高分辨率碱溶性树脂的新型光刻胶工艺和组合物，每分子具有几个重氮醌基团的高分辨率光活性组分和具有高偿付能力的溶剂，更好的安全性，更高的感光速度，更高的对比度和等效的流延膜厚度 来自较低百分比的固体制剂。
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