专利检索 ap:("SONY CORPORATION" OR "AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY") AND inv:"Kinomura, Atsushi Osaka National Research Inst." 第 1 页

1.

发明公开
Surface hardening of resins 审中-公开
标题翻译：树脂的表面硬化

公开(公告)号：EP0969118A3

公开(公告)日：2003-08-06

申请号：EP99305292.7

申请日：1999-07-02

申请人： SONY CORPORATION , AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY

发明人： Tonosaki, Minehiro , Takei, Yutaka , Okita, Hiroyuki , Horino, Yuji c/o Osaka National Research Inst. , Chayahara, Akiyoshi Osaka National Research Inst. , Kinomura, Atsushi Osaka National Research Inst. , Tsubouchi, Nobuteru Osaka National Research Inst.

IPC分类号： C23C14/48 , C23C14/02 , B29C59/16

CPC分类号： C23C14/48 , B29C59/16 , B29C2035/0872 , B29C2043/527 , B29C2043/566 , C23C14/02

摘要： There are disclosed a surface hardening method for resins and a surface hardened resin, capable of reforming the surface of a plastics disk substrate at low energy in a short time, and a production device of such a resin. The formation of an ion-implanted layer (11) by implanting equal to or more than 10 17 carbon ions per cm 2 into the surface of a plastic disk substrate (10) at equal to or less than 20 KeV and the formation of a thin film (12) of high hardness on the ion-implanted layer (11) are performed alternately or simultaneously, and the hardening rate is increased further by using a bias device.