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公开(公告)号：EP0154482B1
公开(公告)日：1990-05-16
申请号：EP85301250.8
申请日：1985-02-25
申请人： STC PLC
IPC分类号： C23C16/02
CPC分类号： C03C17/3435 , C03C17/3441 , C03C17/42 , C03C25/1061 , C03C25/223 , C03C2217/91 , C23C16/0209 , C23C16/515
摘要： A substrate surface, e.g. an electrical component or an optical fibre, is provided with a film coating by pulsed plasma deposition. The film comprises a lower layer compatible with the substrate and an upper layer that provides hermeticity. There is a graded transition between the layers.
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公开(公告)号：EP0154483A3
公开(公告)日：1986-08-20
申请号：EP85301251
申请日：1985-02-25
申请人： STC PLC
CPC分类号： C23F4/00 , C23C16/515
摘要： 57 In a pulsed radio frequency plasma deposition process the pulse repetition frequency is matched to the gas exchange rate. This is achieved by using a pulse width of 50 to 500 microseconds and a pulse repetition rate corresponding to the time within which gas is exchanged in the reaction region.
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公开(公告)号：EP0156516B1
公开(公告)日：1988-06-15
申请号：EP85301252.4
申请日：1985-02-25
申请人： STC PLC
CPC分类号： B05D1/62 , B05D3/144 , B05D2201/02 , B29C59/14
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公开(公告)号：EP0154482A3
公开(公告)日：1988-03-23
申请号：EP85301250
申请日：1985-02-25
申请人： STC PLC
CPC分类号： C03C17/3435 , C03C17/3441 , C03C17/42 , C03C25/1061 , C03C25/223 , C03C2217/91 , C23C16/0209 , C23C16/515
摘要： A substrate surface, e.g. an electrical component or an optical fibre, is provided with a film coating by pulsed plasma deposition. The film comprises a lower layer com- patFble with the substrate and an upper layer that provides hermeticity. There is a graded transition between the layers.
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公开(公告)号：EP0154483B1
公开(公告)日：1989-12-27
申请号：EP85301251.6
申请日：1985-02-25
申请人： STC PLC
CPC分类号： C23F4/00 , C23C16/515
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公开(公告)号：EP0156516A2
公开(公告)日：1985-10-02
申请号：EP85301252.4
申请日：1985-02-25
申请人： STC PLC
CPC分类号： B05D1/62 , B05D3/144 , B05D2201/02 , B29C59/14
摘要： 5 Discontinuities, e.g. scratches, in a plastics surface are removed by exposing the surface to a pulsed radio frequency plasma comprising a mixture of argon and hydrogen. After melting has been effected the surface is exposed to an argon plasma to effect cross-linking to form a smooth surface layer.
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公开(公告)号：EP0154483A2
公开(公告)日：1985-09-11
申请号：EP85301251.6
申请日：1985-02-25
申请人： STC PLC
CPC分类号： C23F4/00 , C23C16/515
摘要： 57 In a pulsed radio frequency plasma deposition process the pulse repetition frequency is matched to the gas exchange rate. This is achieved by using a pulse width of 50 to 500 microseconds and a pulse repetition rate corresponding to the time within which gas is exchanged in the reaction region.
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公开(公告)号：EP0154482A2
公开(公告)日：1985-09-11
申请号：EP85301250.8
申请日：1985-02-25
申请人： STC PLC
IPC分类号： C23C16/02
CPC分类号： C03C17/3435 , C03C17/3441 , C03C17/42 , C03C25/1061 , C03C25/223 , C03C2217/91 , C23C16/0209 , C23C16/515
摘要： A substrate surface, e.g. an electrical component or an optical fibre, is provided with a film coating by pulsed plasma deposition. The film comprises a lower layer com- patFble with the substrate and an upper layer that provides hermeticity. There is a graded transition between the layers.
摘要翻译： 衬底表面，例如 电气部件或光纤，通过脉冲等离子体沉积设置有薄膜涂层。 该薄膜包括与基底相配合的下层和提供气密性的上层。 层之间有渐变过渡。
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