摘要:
A semiconductor package comprising a substrate (20) and a damage-sensitive device (21), comprising a package substrate core (14) having an upper and a lower surface (14a, 14b), at least one pair of metal layers (12a, 12b, 13a, 13b) coating said upper and lower surfaces (14a, 14b) of the package substrate core (14); one pair of solder mask layers (11a, 11b) coating the outer metal layers (12a, 12b) of the at least one pair of metal layers (12a, 12b, 13a, 13b); and a plurality of vias (19) formed across the package substrate core (14) and the at least one pair of metal layers (12a, 12b, 13a, 13b) and a damage-sensitive device mounted on top of the upper solder mask layer. Advantageously, the plurality of vias (19) is substantially distributed according to a homogeneous pattern in an area (21 a) that is to be covered by the damage-sensitive device (21), a plurality of vias (19) being positioned so that the vias substantially coincide with an outline of said damage-sensitive device (21) that the semiconductor package substrate (20) is intended to support. A method for the production of such semiconductor package substrate is also described.
摘要:
A semiconductor package substrate (20) suitable for supporting a damage-sensitive device (21), comprising a package substrate core (14) having an upper and a lower surface (14a, 14b), at least one pair of metal layers (12a, 12b, 13a, 13b) coating said upper and lower surfaces (14a, 14b) of the package substrate core (14); one pair of solder mask layers (11a, 11b) coating the outer metal layers (12a, 12b) of the at least one pair of metal layers (12a, 12b, 13a, 13b); and a plurality of vias (19) formed across the package substrate core (14) and the at least one pair of metal layers (12a, 12b, 13a, 13b). Advantageously, the plurality of vias (19) is substantially distributed according to a homogeneous pattern in an area (21a) that is to be covered by the damage-sensitive device (21). A method for the production of such semiconductor package substrate is also described.