公开(公告)号：EP1365250A4

公开(公告)日：2005-07-27

申请号：EP02715876

申请日：2002-01-22

Applicant: SUMITOMO ELECTRIC INDUSTRIES

Inventor： HIRATA YOSHIHIRO ,  HAGA TSUYOSHI ,  NUMAZAWA TOSHIYUKI ,  NAKAMAE KAZUO ,  OKADA KAZUNORI ,  YORITA JUN

IPC: G01R1/067 ,  G01R3/00 ,  G01R15/24 ,  H01L21/66

CPC classification number: G01R1/06733 ,  G01R1/06738 ,  G01R1/06755 ,  G01R3/00 ,  Y10T29/49117 ,  Y10T29/49204

Abstract: A method of manufacturing a contact probe, comprising an electroforming process for forming a metal layer (526) by performing an electroforming so as to fill clearances in a resist film (522) by using the resist film (522)as a pattern frame having a shape matching the contact probe disposed on a substrate (521), a tip working process for sharpening the area of the metal layer (526) forming the tip end part of the contact probe by diagonally cutting out the area, and a retrieval process for retrieving only the metal layer (526) from the pattern frame.