COATED CUTTING TOOL AND METHOD OF MANUFACTURING THE SAME
    1.
    发明公开
    COATED CUTTING TOOL AND METHOD OF MANUFACTURING THE SAME 有权
    VERFAHREN ZUM HERSTELLEN EINES BESCHICHTETEN SCHNEIDWERKZEUGS。

    公开(公告)号:EP2791387A1

    公开(公告)日:2014-10-22

    申请号:EP12808784.8

    申请日:2012-12-14

    发明人: BJÖRMANDER, Carl

    IPC分类号: C23C16/36

    摘要: The present invention provides a coated cutting tool comprising a substrate and a surface coating, wherein said coating comprises a Ti(C,N,O) layer comprising at least one columnar fine-grained MTCVD Ti(C,N) layer with an average grain width of 0.05-0.4 µm and an atomic ratio of carbon to the sum of carbon and nitrogen (C/(C+N)) contained in said MTCVD Ti(C,N) layer is in average 0.50-0.65. A method for manufacturing said coated cutting tool comprising depositing the MTCVD Ti(C,N) layer is also provided. The deposition is performed with at least TiCl 4 , CH 3 CN or other nitrile and H 2 as precursors and the grain size of the MTCVD Ti(C,N) layer is controlled by controlling the TiCl 4 / CH 3 CN volume ratio to be within 4-10.

    摘要翻译: 本发明提供了一种包括基材和表面涂层的涂层切削工具,其中所述涂层包括Ti(C,N,O)层,其包含至少一个具有平均颗粒的至少一个柱状细晶粒MTCVD Ti(C,N)层 所述MTCVD Ti(C,N)层中包含的0.05〜0.4μm的宽度和碳与碳和氮的总和(C /(C + N))的原子比平均为0.50-0.65。 还提供了一种用于制造所述涂覆的切割工具的方法,包括沉积MTCVD Ti(C,N)层。 通过至少TiCl 4,CH 3 CN或其他腈和H 2作为前体进行沉积,并通过控制TiCl 4 / CH 3 CN体积比来控制MTCVD Ti(C,N)层的晶粒尺寸为 在4-10之内。

    COATED CUTTING TOOL
    3.
    发明公开
    COATED CUTTING TOOL 审中-公开
    涂层切削工具

    公开(公告)号:EP3008225A1

    公开(公告)日:2016-04-20

    申请号:EP14729903.6

    申请日:2014-06-13

    发明人: BJÖRMANDER, Carl

    IPC分类号: C23C16/36 C23C30/00

    CPC分类号: B24D3/34 C23C16/36 C23C30/005

    摘要: A coated cutting tool having a substrate and a surface coating, wherein the coating includes a Ti(C,N) layer of at least one columnar fine-grained MTCVD Ti(C,N) layer with an average grain width of 0.05-0.2 μm and an atomic ratio of carbon to the sum of carbon and nitrogen (C/(C+N)) contained in the MTCVD Ti(C,N) layer is in average 0.50-0.65.

    摘要翻译: 本发明提供了一种包括基材和表面涂层的涂覆的切削工具,其中所述涂层包含Ti(C,N)层,所述Ti(C,N)层包含至少一个柱状细晶MTCVD Ti(C,N)层, 0.05-0.5μm,并且所述MTCVD Ti(C,N)层中包含的碳与碳和氮之和(C /(C + N))的原子比平均为0.50-0.65。

    CUTTING INSERT WITH SENSOR ARRANGEMENT AND METHOD FOR MANUFACTURING A CUTTING INSERT

    公开(公告)号:EP3467471A1

    公开(公告)日:2019-04-10

    申请号:EP17195198.1

    申请日:2017-10-06

    摘要: A cutting insert (100, 200) for cutting, milling or drilling of metal comprises a body having an elongate recess (111, 1111) extending along at least a portion of the body, a first layer (120, 1120) covering interior side walls (112, 113) of the recess, and a sensor arrangement. The body comprises a substrate (110). The sensor arrangement comprises a lead (130, 230, 240) extending along the recess. The lead comprises electrically conductive material which is arranged in the recess such that the first layer is located between the electrically conductive material and the substrate. For at least a depth (D1, D2, D5) below which at least a portion of the electrically conductive material is arranged in the recess, a width (W2, W3, W4) of the recess measured at that depth between portions of the first layer covering opposite interior side walls (112, 113) of the recess is less than or equal to 80 micrometers.

    METHOD OF MANUFACTURING A COATED CUTTING TOOL.
    8.
    发明授权
    METHOD OF MANUFACTURING A COATED CUTTING TOOL. 有权
    制造涂层切削工具的方法。

    公开(公告)号:EP2791387B8

    公开(公告)日:2018-03-28

    申请号:EP12808784.8

    申请日:2012-12-14

    发明人: BJÖRMANDER, Carl

    摘要: The present invention provides a coated cutting tool comprising a substrate and a surface coating, wherein said coating comprises a Ti(C,N,O) layer comprising at least one columnar fine-grained MTCVD Ti(C,N) layer with an average grain width of 0.05-0.4 µm and an atomic ratio of carbon to the sum of carbon and nitrogen (C/(C+N)) contained in said MTCVD Ti(C,N) layer is in average 0.50-0.65. A method for manufacturing said coated cutting tool comprising depositing the MTCVD Ti(C,N) layer is also provided. The deposition is performed with at least TiCl 4 , CH 3 CN or other nitrile and H 2 as precursors and the grain size of the MTCVD Ti(C,N) layer is controlled by controlling the TiCl 4 / CH 3 CN volume ratio to be within 4-10.