摘要:
A semi-conductor non-volatile memory comprises one or more integrated memory cells. The or each memory cell comprises a first semi-conductor region (101) having a first surface, an electric charge storage structure (104) disposed on the first surface of the first semi-conductor region for storing electric charge, and a first gate (106) provided to electrically connect to the electric charge storage structure. A second semi-conductor region (121) is electrically connected at one side to the first semi-conductor region (101) and has a second surface. A second gate (126) controls the second surface. A third region (122) is electrically connected to the other side of the second semi-conductor region and a random access potential setting means (131 - 133, 135, 136) is connected to the second gate (126) for setting a potential thereof on a random access basis.
摘要:
A semi-conductor non-volatile memory comprises one or more integrated memory cells. Each memory cell comprises a first semi-conductor region having a first surface, and electric charge storage structure (5) disposed on the first surface for storing electric charge and a first gate (7) electrically coupled to the electric charge storage structure. There is a second region electrically connected to the first surface and a second gate (9) electrically coupled to either the electric charge storage structure or the first gate. A random access potential setting means (9 - 11) sets a random access potential to the first gate (7).
摘要:
A magnetic sensor comprising at least one Hall device (1,2) which is formed on the crystal surface (100) of a silicon single crystal chip (0), characterised in that the or each Hall device (1,2) is arranged so that the direction of current flow between its electrodes (101,102 or 201,202) is substantially parallel to the direction 100 or the direction 010 on the crystal surface (100).
摘要:
A semiconductor non-volatile random access memory comprises an insulating film (12) disposed on a semiconductor substrate (100) of a first conductivity type. Charge storing means (13) are provided in the insulating film. A first insulated gate electrode (15) is electrically coupled to the charge storing means (13) and controls electric potential in a region (11) in the surface of the substrate under the charge storing means. A second insulated gate electrode (35) is provided to form a channel (31) in a region of the substrate (100) adjacent to the region (11) under the charge storing means (13). A read/write region (40) is of a second conductivity type opposite the first conductivity type provided adjacent to the region where the channel (31) is formed. In operation, volatile information in the form of electric potential or electric charge is stored when power is supplied to the region (11) in the substrate under the charge storing means (13), and information is transferred to the charge storing means (13) to store the information therein in non-volatile form before a power supply is perfectly turned off.
摘要:
A semiconductor substrate and a light-valve semiconductor substrate is provided so as to prevent the threshold value of a MOS transistor on a single-crystal silicon device forming layer from increasing in order to obtain a MOS integrated circuit with a high reliability even for over a long time of operation. A semiconductor substrate and a light-valve semiconductor substrate comprising a single-crystal silicon thin-film device forming layer 5001 formed above an insulating substrate 5004 through an adhesive layer 5003 and an insulating layer 5002 formed on the single-crystal silicon thin-film device forming layer, wherein heat conductive layers 5201 and 5202 made of a material with a high heat conductivity are arranged between the single-crystal silicon thin-film device forming layer and the adhesive layer and on the insulating layer.
摘要:
A semiconductor substrate and a light-valve semiconductor substrate is provided so as to prevent the threshold value of a MOS transistor on a single-crystal silicon device forming layer from increasing in order to obtain a MOS integrated circuit with a high reliability even for over a long time of operation. A semiconductor substrate and a light-valve semiconductor substrate comprising a single-crystal silicon thin-film device forming layer 5001 formed above an insulating substrate 5004 through an adhesive layer 5003 and an insulating layer 5002 formed on the single-crystal silicon thin-film device forming layer, wherein heat conductive layers 5201 and 5202 made of a material with a high heat conductivity are arranged between the single-crystal silicon thin-film device forming layer and the adhesive layer and on the insulating layer.
摘要:
A magnetic sensor comprising at least one Hall device (1,2) which is formed on the crystal surface (100) of a silicon single crystal chip (0), characterised in that the or each Hall device (1,2) is arranged so that the direction of current flow between its electrodes (101,102 or 201,202) is substantially parallel to the direction 100 or the direction 010 on the crystal surface (100).
摘要:
The invention provides a semi-conductor light valve device and a process for fabricating the same. The device comprises an insulating substrate (7) having a semi-conductor single crystal thin film (1) over at least a portion thereof and providing a pixel array region and a peripheral circuit region. The pixel array region includes a plurality of switch elements (2) for selectively energising a plurality of pixel electrodes (3), and the peripheral circuit region includes drive circuits (15, 16) for operating the switch elements. At least circuit elements of the drive circuits are formed from the semi-conductor single crystal thin film. In the fabricating process, the semi-conductor single crystal thin film and the insulating substrate are formed as a composite substrate by adhering a semiconductor single crystal plate to the surface of the insulating substrate and by polishing the single crystal plate. The circuit elements of the drive circuits are then formed by treating the single crystal plate.
摘要:
A semi-conductor non-volatile memory comprises one or more integrated memory cells. The or each memory cell comprises a first semi-conductor region (101) having a first surface, an electric charge storage structure (104) disposed on the first surface of the first semi-conductor region for storing electric charge, and a first gate (106) provided to electrically connect to the electric charge storage structure. A second semi-conductor region (121) is electrically connected at one side to the first semi-conductor region (101) and has a second surface. A second gate (126) controls the second surface. A third region (122) is electrically connected to the other side of the second semi-conductor region and a random access potential setting means (131 - 133, 135, 136) is connected to the second gate (126) for setting a potential thereof on a random access basis.