摘要:
The invention relates to a lens unit and a lens driving apparatus, which enable lenses to be displaced smoothly without increasing a restriction on a distance between the lenses and moreover, prevent positioning accuracy of the lenses from decreasing. First to third guide members (25 to 27) have first to third axis lines (31 to 33), and the first to third axis lines (31 to 33) are arranged in parallel with each other. A first lens holder (28) has a first lens (35) held by a first lens holding portion (35) with a first main sliding portion (37) guided by sliding on the first guide member (25), and a first sub sliding portion (38) guided by sliding on the third guide member (27). A second lens holder (29) has a second lens (45) held coaxially with the first lens (35) by a second lens (45) holding portion with a second main sliding portion (47) guided by sliding on the second guide member (26), and a second sub sliding portion (48) guided by the third guide member (27).
摘要:
It is possible to provide a lens unit and a lens drive device capable of smoothly displacing a lens and suppressing lowering of lens position accuracy without increasing the limit on the distance between lenses. A first to third guide member (25 to 27) have a first to a third axis line (31 to 33), which are arranged parallel to one another. A first lens holding body (28) holds a first lens (35) by a first lens (35) holding unit and is guided to slide along the first guide member (25) by a first main slide unit (37) and slide along a third guide member (27) by a first sub slide unit (38). A second lens holding body (29) holds a second lens (45) coaxially with the first lens (35) by a second lens (45) holding unit and is guided to slide along a second guide member (26) by a second main slide unit (47) and slide along a third guide member (27) by a second sub slide unit (48).
摘要:
A pattern exposing apparatus includes a plurality of optical units, a control section sending to each optical unit a signal for controlling an exposure pattern width to be exposed according to pattern data concerning a target exposure pattern, and a compensation operation memory 24 for compensating the control signal sent from the control means to each optical unit according to the characteristics of each optical unit. In the pattern exposing apparatus including a plurality of optical units, a pattern faithful to a target pattern can be exposed regardless of the characteristics of each optical unit.