公开(公告)号：EP3346337A1

公开(公告)日：2018-07-11

申请号：EP17207286.0

申请日：2017-12-14

申请人： Tokyo Electron Limited

发明人： Nagahara, Seiji ,  Tomono, Masaru ,  Fukunaga, Nobutaka ,  Shiraishi, Gousuke

IPC分类号： G03F7/20 ,  H01L21/67

CPC分类号： G03F7/7055 ,  G03F7/16 ,  G03F7/201 ,  G03F7/2022 ,  G03F7/30 ,  G03F7/7005 ,  G03F7/70133 ,  G03F7/70558 ,  H01L21/027 ,  H01L21/67115 ,  H01L21/6715

摘要： A technology capable of easily adjusting an illuminance distribution pattern in the irradiation region in the lengthwise direction to a target illuminance distribution pattern with high accuracy when optical processing is performed on a substrate by forming a strip-shaped irradiation region with a plurality of light-emitting blocks is provided. An illuminance distribution response amount as the change amount of the illuminance distribution pattern, associating the position in the irradiation region in the lengthwise direction with the change amount of the illuminance with respect to the change in the drive current, has previously been acquired and stored in a storage unit for each light-emitting block (42). There is provided an arithmetic processing unit that determines (estimates) a current command value of each of the light-emitting blocks based on a present current command value of each of the light-emitting blocks (42) and the change amount of the illuminance distribution pattern of each light-emitting block in order to bring a present illuminance distribution pattern in the irradiation region in a lengthwise direction close to a target illuminance distribution pattern.

公开(公告)号：EP2253997A3

公开(公告)日：2010-12-08

申请号：EP09169158.4

申请日：2009-09-01

申请人： Süss MicroTec Lithography GmbH

发明人： Völkel, Reinhard ,  Vogler, Uwe ,  Bich, Andreas ,  Weible, Kenneth J. ,  Eisner, Martin ,  Hornung, Michael ,  Kaiser, Paul ,  Zoberbier, Ralph ,  Cullmann, Elmar

IPC分类号： G03F7/20

CPC分类号： G03F7/7035 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70566

摘要： An illumination system for a micro-lithographic contact and proximity exposure apparatus comprising a light source (1), a collector (2), two optical integrators (3,6), two Fourier lenses (4,7), at least one angle defining element (5); and at least one field lens (8). The first optical integrator (3) comprises optical sub-elements and produces a plurality of secondary light sources (6a) each emitting a light bundle. A first Fourier lens (7) effects a superposition of the light bundles and uniform irradiance in its Fourier plane (4a). The second optical integrator (6) is located at the Fourier plane (7a) of the first Fourier lnes (7), comprises optical sub-elements and produces a plurality of tertiary light sources (6a) each emitting a light bundle. A second Fourier lens (7) effects a superposition of the light bundles, uniform irradiance and a desired and uniform angular distribution of light illuminating a mask (9) for contact or proximity lithographic printing. The field lens (8) in the Fourier plane (7a) ensures telecentric illumination the mask (9). The optional field lens (12) in the Fourier plane (4a) of the first optical integrator (3) ensures telecentric illumination of the second optical integrator (6). The angle defining element (5) comprises optical sub-elements and defines the angular distribution of the light illuminating the mask (9). A change of the position of the second Fourier lens (7) or the use of a Fourier zoom lens (62) or hybrid Fourier lens (63) allows run-out control (registration error correction) of the lateral dimensions of the printed miniature pattern in the resist layer on the surface of the wafer (10).

公开(公告)号：EP1901339A4

公开(公告)日：2010-05-05

申请号：EP06767712

申请日：2006-06-30

申请人： NIPPON KOGAKU KK

发明人： ARAI MASAYOSHI

IPC分类号： H01L21/027 ,  G03F7/20 ,  H01S3/00

CPC分类号： G03F7/70458 ,  G03F7/7005 ,  G03F7/70525 ,  G03F7/70558 ,  G03F7/70575 ,  G03F7/70625 ,  H01S3/10069 ,  H01S3/1055 ,  H01S3/1394 ,  H01S3/225 ,  H01S2301/08

摘要： An exposure apparatus (10) is equipped with a laser unit (16) that emits a laser beam, a memory (51) that stores a first information which shows a relation between a linewidth error of a pattern formed on a wafer and a spectral characteristic of the laser beam emitted from the laser unit, and a main controller (50) that controls the spectral width of the laser beam via a laser controller (16e), based on the first information and on information related to a reticle that is to be used. Main controller (50) performs spectral width control of the laser beam so as to suppress linewidth error, based on the first information and on the information related to the reticle that is to be used.

公开(公告)号：EP1844366B1

公开(公告)日：2008-11-26

申请号：EP06712736.5

申请日：2006-01-25

申请人： Olympus Corporation

发明人： MIZUSAWA, Masayuki

IPC分类号： G03F7/20

CPC分类号： G03F7/7005 ,  G03F7/70075

公开(公告)号：EP1369731A3

公开(公告)日：2008-02-13

申请号：EP03012892.0

申请日：2003-06-06

申请人： FUJIFILM Corporation

发明人： Sunagawa, Hiroshi ,  Ishikawa, Hiromi ,  Okazaki, Yoji ,  Nagano, Kazuhiko ,  Fujii, Takeshi ,  Omori, Toshihiko

IPC分类号： G02B26/08

CPC分类号： G03F7/7005 ,  G02B26/0841 ,  G03F7/70275 ,  G03F7/70291

摘要： With the device of the present invention the reduction in utilization efficiency of laser beams emitted from laser emission portions of an illumination means is limited and an exposure surface is exposed by beam spots with desired spot diameters and spot forms. At the exposure head of the present invention, first microlenses are arranged in a two dimensional manner so as to correspond to the micromirrors at a DMD, and apertures are arranged in a two dimensional manner at the back side focusing positions of the first microlenses. With this exposure head light source images, which are formed to be very small at the back side focusing positions of the first microlenses by the first microlenses, are projected onto the exposure surface, and these light source images serve as beam spots BS and expose the exposure surface.

公开(公告)号：EP1646073A4

公开(公告)日：2007-08-29

申请号：EP03762869

申请日：2003-07-02

申请人： HITACHI VIA MECHANICS LTD

发明人： OSHIDA YOSHITADA ,  MARUYAMA SHIGENOBU ,  KOBAYASHI KAZUO ,  NAITOU YOSHITATU ,  OSAKA YOSHIHISA

IPC分类号： H01L21/027 ,  G02B3/00 ,  G02B19/00 ,  G03F7/20

CPC分类号： G03F7/70075 ,  G02B3/005 ,  G02B3/0062 ,  G02B19/0014 ,  G02B19/0057 ,  G03F7/7005

摘要： An exposing device characterized by comprising an illuminating optical system having a light source array where discrete light sources are arranged one- or two-dimensionally, a focusing optical system for focusing the light beams emitted from the light sources of the light source array, and a light integrator composed of a plurality of rod lenses for spatially decomposing the light beams focused by the focusing optical system and generating a plurality of pseudo-secondary light sources and having a ratio r1/r0 of 0.8 to 1.2 where r1 is the aspect ration of the cross section vertical to the optical axis of each rod lens and r0 is the aspect ratio of an area (21) to be illuminated, and a condenser lens for combining the light beams from the pseudo-secondary light sources generated by the light integrator and illuminating with the light the area having a pattern to be exposed; and a projection optical system for projecting the light transmitted through or reflected from the pattern illuminated by the illuminating system and to be exposed onto the area on the object to be exposed so as to expose the area to the light. An exposing method is also disclosed.

公开(公告)号：EP1072957B1

公开(公告)日：2006-12-27

申请号：EP00115730.4

申请日：2000-07-21

申请人： Carl Zeiss SMT AG

发明人： Schultz, Jörg ,  Rothweiler, Dirk, Dr.

IPC分类号： G03F7/20

CPC分类号： G03F7/7005 ,  B82Y10/00 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G21K1/06

公开(公告)号：EP1705520A2

公开(公告)日：2006-09-27

申请号：EP06004720.6

申请日：2006-03-08

申请人： HITACHI VIA MECHANICS, Ltd.

发明人： Yamaguchi, Yoshihide ,  Oyama, Hiroshi

IPC分类号： G03F7/20

CPC分类号： G03F7/70291 ,  G03F7/203 ,  G03F7/7005 ,  G03F7/70383 ,  G03F7/70466 ,  H05K3/0082

摘要： The mask-less exposure apparatus includes: a stage (11) which moves with the substrate (10) having a photosensitive resin layer (10a) with sensitivity to ultraviolet radiation formed thereon; a first light source (1) for emitting light containing a wavelength component in the wavelength range of 300 to 410 nm; a first light irradiation optical system (50) for modulating a radiant flux (55) emitted from the first light source (1) based on data of a desired exposure pattern to image a pattern on the photosensitive resin layer (10a); a second light source (2) for emitting light containing a wavelength component in the wavelength range of 450 to 2500 nm; and a second light irradiation optical system (60) for guiding a radiant flux emitted from the second light source (2) to a second light irradiation area that is set so as to include at least a first light irradiation area.

摘要翻译： 无掩模曝光装置包括：与其上形成有紫外线的敏感性的具有感光性树脂层（10a）的基板（10）一起移动的台（11） 第一光源（1），用于发射包含在波长范围为300至410nm的波长分量的光; 第一光照射光学系统（50），用于基于期望的曝光图案的数据来调制从第一光源（1）发射的辐射通量（55），以在感光性树脂层（10a）上成像; 第二光源（2），用于发射包含在波长范围为450至2500nm的波长分量的光; 以及第二光照射光学系统（60），用于将从第二光源（2）发射的辐射通量引导到被设置为至少包括第一光照射区域的第二光照射区域。

公开(公告)号：EP1500981A1

公开(公告)日：2005-01-26

申请号：EP03254630.1

申请日：2003-07-23

申请人： ASML Netherlands B.V.

发明人： The designation of the inventor has not yet been filed

IPC分类号： G03F7/20

CPC分类号： G03F7/7005 ,  G03F7/70291

摘要： The pulse-to-pulse dose reproducibility of a radiation system for use in maskless lithography is improved by providing a plurality of lasers and combing the radiation beams produced by each to form a single projection beam of radiation.

摘要翻译： 用于无掩模光刻的辐射系统的脉冲到脉冲剂量再现性通过提供多个激光器并且梳理由每个辐射束产生的辐射束以形成单个投影辐射束来改进。

公开(公告)号：EP1443361A2

公开(公告)日：2004-08-04

申请号：EP04001974.7

申请日：2004-01-29

申请人： CANON KABUSHIKI KAISHA

发明人： Iizuka, Kazuo ,  Isohata, Junji ,  Tanaka, Nobuyoshi

IPC分类号： G03F1/14 ,  G03F7/20

CPC分类号： G03F7/7005 ,  G03F7/70208 ,  G03F7/70283 ,  G03F7/70308 ,  G03F7/70358 ,  G03F7/70466 ,  G03F7/70791

摘要： A projection exposure mask with a small size and low cost for exposing a member to form a continuous pattern and a discontinuous pattern thereon is disclosed. The projection exposure mask has a first mask pattern for exposing the member to form the continuous pattern thereon and a second mask pattern for exposing the member to form the discontinuous pattern thereon. One of the first and second mask patterns is a reflecting type mask pattern, and the other mask pattern is a transmitting mask pattern.

摘要翻译： 公开了一种具有小尺寸和低成本的投影曝光掩模，用于使构件暴露以形成连续图案和不连续图案。 投影曝光掩模具有用于使构件暴露以形成其上的连续图案的第一掩模图案和用于使构件暴露以在其上形成不连续图案的第二掩模图案。 第一和第二掩模图案中的一个是反射型掩模图案，另一个掩模图案是透射掩模图案。