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    X-RAY SOURCES USING LINEAR ACCUMULATION
    3.
    发明公开
    X-RAY SOURCES USING LINEAR ACCUMULATION 审中-公开
    X射线源采用线性累积

    公开(公告)号：EP3168856A2

    公开(公告)日：2017-05-17

    申请号：EP16200793.4

    申请日：2014-09-19

    Applicant: Sigray Inc.

    Inventor： YUN, Wenbing ,  LEWIS, Sylvia Jia Yun ,  KIRZ, Janos ,  LYON, Alan Francis

    IPC: H01J35/08

    CPC classification number: H01J35/08 ,  H01J2235/084 ,  H01J2235/086

    Abstract: This application discloses a compact source for high brightness x-ray generation. Higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This is achieved by aligning discrete x-ray emitters, or through use of novel x-ray targets comprising a number of microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and allows bombardment of this material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of an on-axis collection angle, allowing accumulation of x-rays from several microstructures to be aligned, appearing to have a single origin, also known as "zero-angle" x-ray emission.

    Abstract translation: 该申请公开了用于高亮度x射线产生的紧凑源。 通过对彼此对齐的多个区域的电子束轰击实现更高的亮度，以实现X射线的线性累积。 这通过对准分立的X射线发射器或者通过使用包括许多与具有高导热性的衬底紧密热接触制造的x射线产生材料的微结构的新型x射线靶来实现。 这允许热量更有效地从X射线产生材料中抽出，并且允许用更高的电子密度和/或更高能量的电子轰击该材料，导致更大的X射线亮度。 微结构的取向允许使用轴上收集角度，允许来自几个微结构的X射线的积累被对准，似乎具有单一原点，也称为“零角度”X射线发射。

    X-RAY INTERFEROMETRIC IMAGING SYSTEM
    5.
    发明公开
    X-RAY INTERFEROMETRIC IMAGING SYSTEM 审中-公开
    INTERFEROMETRISCHESRÖNTGENBILDGEBUNGSSYSTEM

    公开(公告)号：EP3136970A1

    公开(公告)日：2017-03-08

    申请号：EP15786098.2

    申请日：2015-04-30

    Applicant: Sigray Inc.

    Inventor： LEWIS, Sylvia Jia Yun ,  YUN, Wenbing ,  KIRZ, Janos

    IPC: A61B6/03 ,  A61B6/00

    Abstract: An x-ray interferometric imaging system in which the x-ray source comprises a target having a plurality of structured coherent sub-sources of x-rays embedded in a thermally conducting substrate. The system additionally comprises a beam-splitting grating G1 that establishes a Talbot interference pattern, which may be a phase-shifting grating, and an x-ray detector to convert two-dimensional x-ray intensities into electronic signals. The system may also comprise a second analyzer grating G2 that may be placed in front of the detector to form additional interference fringes, a means to translate the second grating G2 relative to the detector. The system may additionally comprise an antiscattering grid to reduce signals from scattered x-rays. Various configurations of dark-field and bright-field detectors are also disclosed.

    Abstract translation: 一种X射线干涉成像系统，其中x射线源包括具有嵌入在导热衬底中的多个X射线的结构化相干子源的靶。 该系统还包括分束光栅G1，其建立Talbot干涉图案，其可以是移相光栅，以及将二维x射线强度转换成电子信号的x射线检测器。 该系统还可以包括第二分析器光栅G2，其可以放置在检测器的前面以形成附加的干涉条纹，相对于检测器平移第二光栅G2的装置。 该系统可以另外包括用于减少来自散射的X射线的信号的反散射网格。 还公开了暗场和亮场检测器的各种配置。

    X-RAY SOURCES USING LINEAR ACCUMULATION
    6.
    发明公开
    X-RAY SOURCES USING LINEAR ACCUMULATION 审中-公开
    X线检查线性累加来源

    公开(公告)号：EP3047501A2

    公开(公告)日：2016-07-27

    申请号：EP14868433.5

    申请日：2014-09-19

    Applicant: Sigray Inc.

    Inventor： YUN, Wenbing ,  LEWIS, Sylvia Jia Yun ,  KIRZ, Janos ,  LYON, Alan Francis

    IPC: H01J35/14 ,  H05G1/32

    CPC classification number: H01J35/08 ,  H01J2235/084 ,  H01J2235/086

    Abstract: This application discloses a compact source for high brightness x-ray generation. Higher brightness is achieved through electron beam bombardment of multiple regions aligned with each other to achieve a linear accumulation of x-rays. This is achieved by aligning discrete x-ray emitters, or through use of novel x-ray targets comprising a number of microstructures of x-ray generating materials fabricated in close thermal contact with a substrate with high thermal conductivity. This allows heat to be more efficiently drawn out of the x-ray generating material, and allows bombardment of this material with higher electron density and/or higher energy electrons, leading to greater x-ray brightness. The orientation of the microstructures allows the use of an on-axis collection angle, allowing accumulation of x-rays from several microstructures to be aligned, appearing to have a single origin, also known as "zero-angle" x-ray emission.

    X-RAY ABSORPTION MEASUREMENT SYSTEM
    9.
    发明公开
    X-RAY ABSORPTION MEASUREMENT SYSTEM 有权
    X射线吸收测量系统

    公开(公告)号：EP3152554A1

    公开(公告)日：2017-04-12

    申请号：EP15803316.7

    申请日：2015-03-03

    Applicant: Sigray Inc.

    Inventor： LEWIS, Sylvia, Jia, Yun ,  YUN, Wenbing ,  KIRZ, Janos ,  LYON, Alan Fancis

    IPC: G01N23/083 ,  G01T1/16

    CPC classification number: H01J35/08 ,  G01N23/085 ,  G21K1/067 ,  G21K2201/062 ,  G21K2201/064 ,  H01J35/116 ,  H01J2235/086

    Abstract: This disclosure presents systems for x-ray absorption fine structure (XAFS) measurements that have x-ray flux and flux density several orders of magnitude greater than existing compact systems; for applications of x-ray absorption near-edge spectroscopy (XANES) or extended x-ray fine absorption structure (EXFAS) spectroscopy. The higher brightness is achieved using designs for x-ray targets that comprise aligned microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment with higher electron density and/or higher energy electrons, leading to greater x-ray brightness and high flux. The high brightness x-ray source is coupled to an x-ray reflecting optical system to collimate the x-rays, and a monochromator, which selects the exposure energy. Absorption spectra of samples using the high flux monochromatic x-rays can be made using standard detection techniques.

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