专利检索 ap:("Stichting Nederlandse Wetenschappelijk Onderzoek Instituten" OR "ASML Netherlands B.V." OR "Stichting VU" OR "Universiteit van Amsterdam") AND inv:"ROSCAM ABBING, Sylvianne Dorothea Christina" 第 1 页

1.

发明公开
METROLOGY APPARATUS AND METROLOGY METHODS BASED ON HIGH HARMONIC GENERATION FROM A DIFFRACTIVE STRUCTURE 审中-公开

公开(公告)号：EP4006640A1

公开(公告)日：2022-06-01

申请号：EP20209950.3

申请日：2020-11-26

申请人： Stichting Nederlandse Wetenschappelijk Onderzoek Instituten , ASML Netherlands B.V. , Stichting VU , Universiteit van Amsterdam

发明人： KRAUS, Peter Michael , ROSCAM ABBING, Sylvianne Dorothea Christina , CAMPI, Filippo , ZHANG, ZhuangYan , SMORENBURG, Petrus Wilhelmus , LIN, Nan , WITTE, Stefan Michiel , DEN BOEF, Arie Jeffrey

IPC分类号： G03F7/20 , G01N21/47 , G01N21/956 , G01N23/22

摘要： Disclosed is a metrology apparatus and method for measurement of a diffractive structure on a substrate. The metrology apparatus comprises a radiation source operable to provide first radiation for excitation of the diffractive structure such that high harmonic second radiation is generated from said diffractive structure and/or substrate; and a detection arrangement operable to detect said second radiation, at least a portion of which having been diffracted by said diffractive structure.