公开(公告)号：EP4006640A1

公开(公告)日：2022-06-01

申请号：EP20209950.3

申请日：2020-11-26

申请人： Stichting Nederlandse Wetenschappelijk Onderzoek Instituten ,  ASML Netherlands B.V. ,  Stichting VU ,  Universiteit van Amsterdam

发明人： KRAUS, Peter Michael ,  ROSCAM ABBING, Sylvianne Dorothea Christina ,  CAMPI, Filippo ,  ZHANG, ZhuangYan ,  SMORENBURG, Petrus Wilhelmus ,  LIN, Nan ,  WITTE, Stefan Michiel ,  DEN BOEF, Arie Jeffrey

IPC分类号： G03F7/20 ,  G01N21/47 ,  G01N21/956 ,  G01N23/22

摘要： Disclosed is a metrology apparatus and method for measurement of a diffractive structure on a substrate. The metrology apparatus comprises a radiation source operable to provide first radiation for excitation of the diffractive structure such that high harmonic second radiation is generated from said diffractive structure and/or substrate; and a detection arrangement operable to detect said second radiation, at least a portion of which having been diffracted by said diffractive structure.

公开(公告)号：EP2888621A1

公开(公告)日：2015-07-01

申请号：EP13759869.4

申请日：2013-08-27

申请人： Stichting VU-VUmc

发明人： WITTE, Stefan Michiel ,  EIKEMA, Kjeld Sijbrand Eduard

IPC分类号： G02B21/36 ,  G06F17/14 ,  H01J37/26

CPC分类号： G02B21/365 ,  G02B21/367 ,  G03F7/70616

摘要： The invention relates to amicroscopic imaging apparatus to provide an image of a sample. The apparatus having an illumination system to provide an illumination beam with radiation;and a sensor constructed and arranged to receive: a first image of a first diffraction pattern created by diffraction of the illumination beam on the sample; a second image of a second diffraction pattern created by diffraction of the illumination beam on the sample. The sensor may be connected with a processor running a program to retrieve phase information from the sample from the first and second image received by the sensor. The illumination system may have a first illumination device to provide the illumination beam with radiation of substantially a first wavelength; and a second illumination device to provide the illumination beam with radiation of substantially a second wavelength different than the first wavelength. The sensor may receive a first image of a first diffraction pattern created by diffraction of the illumination beam with radiation of substantially the first wavelength on the sample; and,a second image of a second diffraction pattern created by diffraction of the illumination beam with radiation of substantially the second wavelength on the sample.

摘要翻译： 一种用于提供样品图像的显微成像装置。 该装置包括用于向辐射提供照明光束的照明系统; 以及传感器，其被构造和布置成接收：通过所述样品上的所述照射光束的衍射而产生的第一衍射图案的第一图像; 以及由样品上的照明光束衍射产生的第二衍射图案的第二图像。