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公开(公告)号：EP0597103A4
公开(公告)日：1994-08-17
申请号：EP92916221
申请日：1992-07-24
IPC分类号： C23C14/58 , C23C16/56 , G02F1/1333 , G21K1/14 , H01L21/02 , H01L21/265 , H01L21/677 , H05F3/06
摘要： An apparatus which can neutralize charged bodies such as processed substrates for semiconductor devices and for flat display, free from electromagnetic noise, impurity contamination, and residual potentials. To process in a prescribed way a wafer (5) to be processed, the wafer (5) is, for example, moved from a pretreatment chamber (2) to a low pressure reaction chamber (3). In this case, a gas, which does not react on the wafer, such as nitrogen and argon, is introduced into the pretreatment chamber (2), and is kept under a predetermined pressure by a vacuum pump (15). Then, ultraviolet rays are projected in the pretreatment chamber (2) from an ultraviolet rays lamp (11) constituting a means for generating neutralization charges, and positive and negative floating charged particles (electrons and positive ions) are generated by exciting the atmosphere in the chamber (2). Since the charges are removed by projecting the ultraviolet rays from the outsides of a case (1) and the case (2) and moreover in a non- contact way, no electromagnetic noise is generated and the residual potentials are vanished too.
摘要翻译： 可以中和带电体的装置，例如半导体器件的处理衬底和平面显示器，没有电磁噪声，杂质污染和残留电位。 为了以规定的方式处理要处理的晶片（5），晶片（5）例如从预处理室（2）移动到低压反应室（3）。 在这种情况下，将不与晶圆反应的气体（例如氮气和氩气）引入预处理室（2），并通过真空泵（15）保持在预定压力下。 然后，从构成产生中和电荷的装置的紫外线灯（11）将紫外线投射到预处理室（2）中，通过激发正极和负的浮动带电粒子（电子和正离子） 室（2）。 由于通过从壳体（1）和壳体（2）的外侧投射紫外线而且以非接触方式移除电荷，因此不会产生电磁噪声并且剩余电位也消失。
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公开(公告)号：EP0613749A4
公开(公告)日：1994-11-02
申请号：EP92923994
申请日：1992-11-20
申请人： OHMI TADAHIRO
CPC分类号： B23K9/0282 , B23K9/325 , B23K2201/06
摘要： A welding system for superhigh purity gas supply pipe system, capable of removing easily and completely the metals deposited, during the installation of the superhigh purity gas pipe system, on the outer surfaces of the portions of the pipes which are closed to the portions to be welded thereof and on the inner portions of these pipes, and capable of setting up a superhigh purity gas supply system in a short period of time. A welding system for the gas supply pipe system in which a plurality of members are connected together by welding, characterized in that a first member to be welded (113) is provided with a means for supplying an inert gas or a welding back seal gas and a means for supplying superpure water, a second member to be welded (114) being provided with a means for discharging the inert gas or back seal gas and a means for discharging the superpure water, the first and second members being welded as the inert gas or back seal gas is being supplied, the superpure water being supplied after the welding of these members has been completed, whereby the metal fume deposited on the surfaces of the welded members during the welding thereof can be washed out.
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3.发明公开SUPERHIGH PURITY FLUID SUPPLY PIPE SYSTEM AND METHOD OF INSTALLING THE SAME. 失效BOHRLEITUNGSYSTEM ZU HOCHREINEN FLUIDUM SOWIE VERFAHREN ZU DESSEN AUFBAU。
公开(公告)号：EP0621103A4
公开(公告)日：1994-09-06
申请号：EP92923993
申请日：1992-11-20
申请人： OHMI TADAHIRO
IPC分类号： F17D1/04 , B23K9/028 , B23K9/16 , B23K9/29 , B23K9/32 , B23K37/08 , H01L21/205 , B23K9/00 , B23K31/00
CPC分类号： B23K9/325 , B23K9/0282 , B23K9/164 , B23K9/296 , B23K9/323
摘要： A superhigh purity gas supply pipe system adapted to prevent a semiconductor device of high cleanliness, into which a gas is introduced through a gas supply pipe system, from being contaminated with the metals or the like deposited during the welding thereof, and a method of installing such a gas supply pipe system. The superhigh purity gas supply pipe system according to the present invention is a pipe system consisting of gas supply pipe system parts having welded portions, characterized in that the gas supply pipe system parts having such welded portions are washed with superhigh purity water before, during or after the installation of the pipe system. The invention also provides a method of installing a superhigh purity gas supply pipe system having welded portions, characterized in that pipe system members are welded as an inert gas or a back seal gas is being introduced into at least these members, superhigh purity water being introduced into the welded members after the welding of these members so as to wash out the metal fume deposited on the inner surfaces of the welded members during the welding thereof.
摘要翻译： 本发明提供一种超高纯度气体供给配管系统，该高纯度气体供给配管系统用于防止通过气体供给配管系统导入气体的清洁度高的半导体装置被焊接时堆积的金属等所污染， 这种气体供应管道系统。 根据本发明的超高纯度气体供应管系统是由具有焊接部分的气体供应管系统部分组成的管系统，其特征在于具有这种焊接部分的气体供应管系统部分在超高纯度水洗涤之前， 在管道系统安装之后。 本发明还提供了一种安装具有焊接部分的超高纯度气体供应管道系统的方法，其特征在于管道系统部件作为惰性气体被焊接或者背密封气体被引入至少这些部件中，引入超高纯度水 在焊接这些构件之后将它们焊接到焊接构件中，以便在焊接期间清除堆积在焊接构件的内表面上的金属烟尘。
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公开(公告)号：EP0606479A4
公开(公告)日：1994-07-27
申请号：EP92921002
申请日：1992-10-01
申请人： OHMI TADAHIRO
CPC分类号： G01N21/94 , G01J3/2803 , G01N21/64
摘要： An analyzer capable of detecting a light element, such as Na, capable of evaluating a sample having an uneven surface, such as pattern-carrying wafer without destroying and damaging the same, with simple construction and simple operation, and safely to the human body, and capable of identifying the composition of a minute amount of impurities and fine particles deposited on the surface of a sample. This analyzer is characterized in that it has a sample retaining stage, an ultraviolet ray-emitting light source, a means for collecting the ultraviolet rays sent out from the light source and applying the resultant rays to the surface of a sample, and a means for detecting the light emitted from the surface of the sample to which the ultraviolet rays have been applied.
摘要翻译： 能够以简单的结构和简单的操作能够检测能够评价具有不平坦表面的样品（例如图案携带的晶片）而不破坏和损坏图案的晶片的分析仪，并且安全地到达人体， 并且能够识别沉积在样品表面上的微量杂质和细颗粒的组成。 该分析仪的特征在于具有样品保留台，紫外线发射光源，用于收集从光源发出的紫外线并将得到的光线施加到样品表面的装置，以及用于 检测从施加有紫外线的样品的表面发射的光。
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