-
公开(公告)号：EP1632989A3
公开(公告)日：2011-03-02
申请号：EP05023272.7
申请日：1997-01-24
发明人： Yaegashi, Hidetami , Toshima, Takayuki , Akimoto, Masami , Yamaguchi, Eiji , Kitano, Junichi , Katano, Takayuki , Shinya, Hioshi , Iida, Nauaki
IPC分类号： H01L21/00
CPC分类号： H01L21/67178 , H01L21/67196 , H01L21/67225 , H01L21/67742 , Y10T29/41
摘要： A processing apparatus comprising a plurality of process unit groups (G1 to G5) each including a plurality of process units to subject an object (w) to a series of processes, said process units being arranged vertically in multiple stages, an object transfer space (22) being defined among the process unit groups (G1 to G5); transfer means (21) for transferring the object (w), said transfer means (21) having a transfer member (73, 78a, 78b, 78c) vertically movable in the object transfer space (22), said transfer member (73, 78a, 78b, 78c) being capable of transferring the object (w) to each of said process units; and means (20b, 50 to 62, 84, 95, 95a, 96, 114, 114a, 115, 115a) for reducing a variation in condition of the object transfer space (22), the processing apparatus further comprising at least one first process unit group (G1, G2) in which process units including a resist coating unit for coating a resist and a developing unit for developing a pattern of the resist are vertically stacked; and at least one second process unit group (G3, G4, G5) in which at least one or all of an alignment unit for aligning an object to be processed, a baking unit for baking the object, a cooling unit for cooling the object, an adhesion unit for subjecting the object to an adhesion process, and an extension unit are vertically stacked, wherein said first process unit group (G1, G2) has such an arrangement that the coating unit is placed below the developing unit.
-
公开(公告)号：EP1848025B1
公开(公告)日：2009-12-02
申请号：EP07007786.2
申请日：2007-04-17
发明人： Kaneko, Satoshi , Matsumoto, Kazuhisa , Ito, Norihiro , Akimoto, Masami , Toshima, Takayuki , Nanba, Hiromitsu
CPC分类号： H01L21/67051 , H01L21/6715 , H01L21/68728 , Y10S134/902
-
公开(公告)号：EP1883100A2
公开(公告)日：2008-01-30
申请号：EP07014286.4
申请日：2007-07-20
IPC分类号： H01L21/00
CPC分类号： H01L21/67051 , H01L21/67017 , H01L21/6708 , H01L21/67173
摘要： A liquid processing system includes a liquid processing section (21b) including liquid processing units (22) horizontally disposed therein and each configured to perform a liquid process while supplying a process liquid onto a substrate (W); a process liquid storing section (21h) that stores the process liquid to be supplied to the liquid processing units of the liquid processing section; and a piping unit (21f) including a supply pipe configured to guide the process liquid from the process liquid storing section to the liquid processing units. The process liquid storing section, the piping unit, and the liquid processing section are disposed inside a common casing (21) in this order from below. The supply pipe of the piping unit has a horizontal pipe portion (70a) horizontally extending along an array direction of the liquid processing units, such that the process liquid is supplied from the horizontal pipe portion to the liquid processing units individually.
摘要翻译： 液体处理系统包括液体处理部分（21b），其包括水平地设置在其中的液体处理单元（22），并且每个液体处理部分被配置为在将处理液体供应到基板（W）上时进行液体处理。 处理液储存部（21h），其存储供给到所述液体处理部的液体处理单元的处理液; 以及管道单元（21f），其包括供给管，其构造成将处理液从处理液储存部引导到液体处理单元。 处理液储存部，配管部和液处理部从下方依次配置在公共壳体21内。 管道单元的供给管具有沿着液体处理单元的排列方向水平延伸的水平管部分（70a），使得处理液体从水平管部分分别供应到液体处理单元。
-
公开(公告)号：EP1848025A1
公开(公告)日：2007-10-24
申请号：EP07007786.2
申请日：2007-04-17
发明人： Kaneko, Satoshi , Matsumoto, Kazuhisa , Ito, Norihiro , Akimoto, Masami , Toshima, Takayuki , Nanba, Hiromitsu
CPC分类号： H01L21/67051 , H01L21/6715 , H01L21/68728 , Y10S134/902
摘要： A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; a rotary cup configured to surround the substrate and to rotate along with the substrate; a liquid supply mechanism configured to supply a process liquid onto at least a front surface of the substrate; and an exhaust/drain section configured to perform gas-exhausting and liquid-draining out of the rotary cup; and a guide member disposed to surround the substrate, having an upper surface to be substantially continued to the front surface of the substrate, and configured to rotate along with the substrate holding member and the rotary cup, such that a process liquid supplied onto the front surface of the substrate and thrown off from the substrate is guided by the upper surface of the guide member from the rotary cup to the exhaust/drain section.
摘要翻译： 一种液体处理装置，包括：基板保持部件，其构造成与水平状态下保持的基板一起旋转; 旋转杯，其构造成围绕所述基底并与所述基底一起旋转; 液体供给机构，其构造成将处理液体供给到所述基板的至少前表面上; 以及排气/排出部，被构造成从所述旋转杯中排出并排出液体; 以及设置成围绕所述基板的引导构件，所述引导构件具有基本上连续到所述基板的前表面的上表面，并且被构造成与所述基板保持构件和所述旋转杯一起旋转，使得提供给所述前端的处理液 从衬底抛出的衬底的表面由引导构件的上表面从旋转杯引导到排气/排出区。
-
公开(公告)号：EP1883100A3
公开(公告)日：2012-01-04
申请号：EP07014286.4
申请日：2007-07-20
IPC分类号： H01L21/67
CPC分类号： H01L21/67051 , H01L21/67017 , H01L21/6708 , H01L21/67173
摘要： A liquid processing system includes a liquid processing section (21b) including liquid processing units (22) horizontally disposed therein and each configured to perform a liquid process while supplying a process liquid onto a substrate (W); a process liquid storing section (21h) that stores the process liquid to be supplied to the liquid processing units of the liquid processing section; and a piping unit (21f) including a supply pipe configured to guide the process liquid from the process liquid storing section to the liquid processing units. The process liquid storing section, the piping unit, and the liquid processing section are disposed inside a common casing (21) in this order from below. The supply pipe of the piping unit has a horizontal pipe portion (70a) horizontally extending along an array direction of the liquid processing units, such that the process liquid is supplied from the horizontal pipe portion to the liquid processing units individually.
-
公开(公告)号：EP1848024A1
公开(公告)日：2007-10-24
申请号：EP07007785.4
申请日：2007-04-17
发明人： Akimoto, Masami , Toshima, Takayuki , Kaneko, Satoshi , Matsumoto, Kazuhisa , Ito, Norihiro , Nanba, Hiromitsu
CPC分类号： H01L21/67051 , H01L21/6715 , H01L21/68728
摘要： A liquid processing apparatus includes: a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; a rotary cup configured to surround the substrate held on the substrate holding member and to rotate along with the substrate; a rotation mechanism configured to integratedly rotate the rotary cup and the substrate holding member; a liquid supply mechanism configured to supply a process liquid onto the substrate; and an exhaust/drain section configured to perform gas-exhausting and liquid-draining of the rotary cup. The exhaust/drain section includes an annular drain cup configured to mainly collect and discharge a process liquid thrown off from the substrate, and an exhaust cup surrounding the drain cup and configured to mainly collect and discharge a gas component from inside and around the rotary cup. Liquid-draining from the drain cup and gas-exhausting from the exhaust cup are performed independently of each other.
摘要翻译： 一种液体处理装置，其特征在于，具备：基板保持部件，其与保持在基板上的基板一起以水平状态旋转; 旋转杯，其被构造成围绕保持在所述基板保持构件上的所述基板并且与所述基板一起旋转; 旋转机构，所述旋转机构构造成使所述旋转杯和所述基板保持部件一体旋转; 液体供应机构，其构造成将处理液供应到所述基板上; 以及配置成执行旋转杯的排气和排液的排气/排放部。 排气/排水部分包括被构造成主要收集和排出从基板抛出的处理液的环形排水杯和围绕排水杯的排气杯，排气杯被配置为主要从旋转杯的内部和周围收集和排出气体成分 。 从排水杯排出液体和从排气杯排出气体是彼此独立进行的。
-
公开(公告)号：EP1632989A2
公开(公告)日：2006-03-08
申请号：EP05023272.7
申请日：1997-01-24
发明人： Yaegashi, Hidetami , Toshima, Takayuki , Akimoto, Masami , Yamaguchi, Eiji , Kitano, Junichi , Katano, Takayuki , Shinya, Hioshi , Iida, Nauaki
IPC分类号： H01L21/00
CPC分类号： H01L21/67178 , H01L21/67196 , H01L21/67225 , H01L21/67742 , Y10T29/41
摘要： A processing apparatus comprising a plurality of process unit groups (G1 to G5) each including a plurality of process units to subject an object (w) to a series of processes, said process units being arranged vertically in multiple stages, an object transfer space (22) being defined among the process unit groups (G1 to G5); transfer means (21) for transferring the object (w), said transfer means (21) having a transfer member (73, 78a, 78b, 78c) vertically movable in the object transfer space (22), said transfer member (73, 78a, 78b, 78c) being capable of transferring the object (w) to each of said process units; and means (20b, 50 to 62, 84, 95, 95a, 96, 114, 114a, 115, 115a) for reducing a variation in condition of the object transfer space (22), the processing apparatus further comprising at least one first process unit group (G1, G2) in which process units including a resist coating unit for coating a resist and a developing unit for developing a pattern of the resist are vertically stacked; and at least one second process unit group (G3, G4, G5) in which at least one or all of an alignment unit for aligning an object to be processed, a baking unit for baking the object, a cooling unit for cooling the object, an adhesion unit for subjecting the object to an adhesion process, and an extension unit are vertically stacked, wherein said first process unit group (G1, G2) has such an arrangement that the coating unit is placed below the developing unit.
摘要翻译： 一种处理装置，包括多个处理单元组（G1至G5），每个处理单元组包括多个处理单元以对象（w）进行一系列处理，所述处理单元以多级垂直排列，对象传送空间 22）被定义在处理单元组（G1至G5）之间; 传送装置（21），用于传送物体（w），所述传送装置（21）具有可在物体传送空间（22）中垂直移动的传送部件（73,78a，78b，78c），所述传送部件 ，78b，78c）能够将物体（w）传送到每个所述处理单元; 以及用于减少所述物体传送空间（22）的状态变化的装置（20b，50至62,84,95,95a，96,114,115a，115a，115,115a），所述处理设备还包括至少一个第一过程 单元组（G1，G2），其中包括用于涂覆抗蚀剂的抗蚀剂涂布单元和用于显影抗蚀剂图案的显影单元的工艺单元垂直堆叠; 以及至少一个第二处理单元组（G3，G4，G5），其中用于对准待处理物体的对准单元，用于烘烤物体的烘焙单元，用于冷却物体的冷却单元， 用于使物体进行粘合处理的粘合单元和垂直堆叠的所述第一处理单元组（G1，G2）具有将所述涂布单元放置在所述显影单元下方的布置。
-
-
-
-
-
-
搜索结果
7 条记录 (耗时 0.011 秒)
