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公开(公告)号：EP1385195A3
公开(公告)日：2004-03-17
申请号：EP03024266.3
申请日：1997-05-26
发明人： Kitano, Junichi , Shinya, Hiroshi , Katano, Takayuki , Yaegashi, Hidetami , Kawakami, Yasunori , Kawano, Fumihiko
IPC分类号： H01L21/027 , F24F3/16 , F24F11/02 , H01L21/00
CPC分类号： H01L21/67173 , G03F7/7075 , H01L21/67017 , H01L21/67178 , H01L21/67778 , Y10S414/14
摘要： The present invention provides a substrate treating system for successively treating a plurality of substrates W under an air-conditioned environment. The system comprises an outer casing (100a, 302) provided with a cassette transfer port (100b, 304) through which a cassette (CR, C) is transferred, a cassette section (10, 351) having a cassette table (20, 303) arranged within an inner space surrounded by the outer casing for supporting the cassette transferred through the cassette transfer port, a sub-arm mechanism (22, 311) for taking the substrates one by one from the cassette section, a process section (12, 352) positioned adjacent to the cassette section and having a plurality of treating units for treating the substrates arranged therein, a main arm mechanism (24, 312, 313) arranged within the process section for receiving the substrates from the sub-arm mechanism arranged in the cassette section and, then, transferring the received substrates to each of the treating units while transferring the treated substrates out of the treating units, an air supply mechanism (10a, 10b, 12a, 14a, 16a to 16e, 30, 31, 32, 33a to 33f, 34, 36, 37a to 37e, 38, 39, 48, 306, 306a, 306b) for supplying a clean air to form a down-stream within the space surrounded by the outer casing (100a, 302), and a partition plate (11, 11A, 29, 51, 61, 305) for partitioning the inner space surrounded by the outer casing (100a, 302) not to interfere the down-flow of the air formed by the air supply mechanism, the partition plate having a substrate transfer port (11a, 11b, 29a, 51a, 61a, 308) through which the substrate is transferred from one of the partitioned spaces to the other partitioned space.
摘要翻译： 本发明提供了一种用于在空调环境下连续处理多个基板W的基板处理系统。 该系统包括设置有用于传送盒（CR，C）的盒传送口（100b，304）的外壳（100a，302），具有盒台（20,303）的盒部分 ），其配置在由外壳包围的内部空间内，用于支撑通过盒输送口输送来的盒;副臂机构（22,311），其用于从盒部一个一个地取出基板;处理部（12， 352），所述主臂机构位于所述盒子部分附近并且具有用于处理布置在其中的所述基板的多个处理单元;主臂机构（24,312,313），所述主臂机构布置在所述处理部分内，用于接收来自所述副臂机构 然后将所接收的基板传送到每个处理单元，同时将处理过的基板从处理单元中输出，空气供应机构（10a，10b，12a，14a，16a至16e，30,31,32 ，33a至33f，34,36， （100a，302）所包围的空间内供给清洁空气以形成下游流;以及分隔板（11,11A，11B，13A，17A， （100a，302）所包围的内部空间不会妨碍空气供给机构所形成的空气向下流动的分隔板（11a，29a，51a，61,305） ，11b，29a，51a，61a，308），基板从其中一个分隔空间转移到另一个分隔空间。
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公开(公告)号：EP1400760A1
公开(公告)日：2004-03-24
申请号：EP03024189.7
申请日：2003-10-24
发明人： Kitano, Junichi , Shinya, Hiroshi , Katano, Takayuki , Yaegashi, Hidemati , Kawakami, Yasunori , Kawano, Fumihiko
CPC分类号： H01L21/67173 , G03F7/7075 , H01L21/67017 , H01L21/67178 , H01L21/67778 , Y10S414/14
摘要： The present invention provides a substrate treating system for successively treating a plurality of substrates W under an air-conditioned environment. The system comprises an outer casing (100a, 302) provided with a cassette transfer port (100b, 304) through which a cassette (CR, C) is transferred, a cassette section (10, 351) having a cassette table (20, 303) arranged within an inner space surrounded by the outer casing for supporting the cassette transferred through the cassette transfer port, a sub-arm mechanism (22, 311) for taking the substrates one by one from the cassette section, a process section (12, 352) positioned adjacent to the cassette section and having a plurality of treating units for treating the substrates arranged therein, a main arm mechanism (24, 312, 313) arranged within the process section for receiving the substrates from the sub-arm mechanism arranged in the cassette section and, then, transferring the received substrates to each of the treating units while transferring the treated substrates out of the treating units, an air supply mechanism (10a, 10b, 12a, 14a, 16a to 16e, 30, 31, 32, 33a to 33f, 34, 36, 37a to 37e, 38, 39, 48, 306, 306a, 306b) for supplying a clean air to form a down-stream within the space surrounded by the outer casing (100a, 302), and a partition plate (11, 11A, 29, 51, 61, 305) for partitioning the inner space surrounded by the outer casing (100a, 302) not to interfere the down-flow of the air formed by the air supply mechanism, the partition plate having a substrate transfer port (11a, 11b, 29a, 51a, 61a, 308) through which the substrate is transferred from one of the partitioned spaces to the other partitioned space.
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公开(公告)号：EP1632989A2
公开(公告)日：2006-03-08
申请号：EP05023272.7
申请日：1997-01-24
发明人： Yaegashi, Hidetami , Toshima, Takayuki , Akimoto, Masami , Yamaguchi, Eiji , Kitano, Junichi , Katano, Takayuki , Shinya, Hioshi , Iida, Nauaki
IPC分类号： H01L21/00
CPC分类号： H01L21/67178 , H01L21/67196 , H01L21/67225 , H01L21/67742 , Y10T29/41
摘要： A processing apparatus comprising a plurality of process unit groups (G1 to G5) each including a plurality of process units to subject an object (w) to a series of processes, said process units being arranged vertically in multiple stages, an object transfer space (22) being defined among the process unit groups (G1 to G5); transfer means (21) for transferring the object (w), said transfer means (21) having a transfer member (73, 78a, 78b, 78c) vertically movable in the object transfer space (22), said transfer member (73, 78a, 78b, 78c) being capable of transferring the object (w) to each of said process units; and means (20b, 50 to 62, 84, 95, 95a, 96, 114, 114a, 115, 115a) for reducing a variation in condition of the object transfer space (22), the processing apparatus further comprising at least one first process unit group (G1, G2) in which process units including a resist coating unit for coating a resist and a developing unit for developing a pattern of the resist are vertically stacked; and at least one second process unit group (G3, G4, G5) in which at least one or all of an alignment unit for aligning an object to be processed, a baking unit for baking the object, a cooling unit for cooling the object, an adhesion unit for subjecting the object to an adhesion process, and an extension unit are vertically stacked, wherein said first process unit group (G1, G2) has such an arrangement that the coating unit is placed below the developing unit.
摘要翻译： 一种处理装置，包括多个处理单元组（G1至G5），每个处理单元组包括多个处理单元以对象（w）进行一系列处理，所述处理单元以多级垂直排列，对象传送空间 22）被定义在处理单元组（G1至G5）之间; 传送装置（21），用于传送物体（w），所述传送装置（21）具有可在物体传送空间（22）中垂直移动的传送部件（73,78a，78b，78c），所述传送部件 ，78b，78c）能够将物体（w）传送到每个所述处理单元; 以及用于减少所述物体传送空间（22）的状态变化的装置（20b，50至62,84,95,95a，96,114,115a，115a，115,115a），所述处理设备还包括至少一个第一过程 单元组（G1，G2），其中包括用于涂覆抗蚀剂的抗蚀剂涂布单元和用于显影抗蚀剂图案的显影单元的工艺单元垂直堆叠; 以及至少一个第二处理单元组（G3，G4，G5），其中用于对准待处理物体的对准单元，用于烘烤物体的烘焙单元，用于冷却物体的冷却单元， 用于使物体进行粘合处理的粘合单元和垂直堆叠的所述第一处理单元组（G1，G2）具有将所述涂布单元放置在所述显影单元下方的布置。
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公开(公告)号：EP1632989A3
公开(公告)日：2011-03-02
申请号：EP05023272.7
申请日：1997-01-24
发明人： Yaegashi, Hidetami , Toshima, Takayuki , Akimoto, Masami , Yamaguchi, Eiji , Kitano, Junichi , Katano, Takayuki , Shinya, Hioshi , Iida, Nauaki
IPC分类号： H01L21/00
CPC分类号： H01L21/67178 , H01L21/67196 , H01L21/67225 , H01L21/67742 , Y10T29/41
摘要： A processing apparatus comprising a plurality of process unit groups (G1 to G5) each including a plurality of process units to subject an object (w) to a series of processes, said process units being arranged vertically in multiple stages, an object transfer space (22) being defined among the process unit groups (G1 to G5); transfer means (21) for transferring the object (w), said transfer means (21) having a transfer member (73, 78a, 78b, 78c) vertically movable in the object transfer space (22), said transfer member (73, 78a, 78b, 78c) being capable of transferring the object (w) to each of said process units; and means (20b, 50 to 62, 84, 95, 95a, 96, 114, 114a, 115, 115a) for reducing a variation in condition of the object transfer space (22), the processing apparatus further comprising at least one first process unit group (G1, G2) in which process units including a resist coating unit for coating a resist and a developing unit for developing a pattern of the resist are vertically stacked; and at least one second process unit group (G3, G4, G5) in which at least one or all of an alignment unit for aligning an object to be processed, a baking unit for baking the object, a cooling unit for cooling the object, an adhesion unit for subjecting the object to an adhesion process, and an extension unit are vertically stacked, wherein said first process unit group (G1, G2) has such an arrangement that the coating unit is placed below the developing unit.
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公开(公告)号：EP1385195A2
公开(公告)日：2004-01-28
申请号：EP03024266.3
申请日：1997-05-26
发明人： Kitano, Junichi , Shinya, Hiroshi , Katano, Takayuki , Yaegashi, Hidetami , Kawakami, Yasunori , Kawano, Fumihiko
CPC分类号： H01L21/67173 , G03F7/7075 , H01L21/67017 , H01L21/67178 , H01L21/67778 , Y10S414/14
摘要： The present invention provides a substrate treating system for successively treating a plurality of substrates W under an air-conditioned environment. The system comprises an outer casing (100a, 302) provided with a cassette transfer port (100b, 304) through which a cassette (CR, C) is transferred, a cassette section (10, 351) having a cassette table (20, 303) arranged within an inner space surrounded by the outer casing for supporting the cassette transferred through the cassette transfer port, a sub-arm mechanism (22, 311) for taking the substrates one by one from the cassette section, a process section (12, 352) positioned adjacent to the cassette section and having a plurality of treating units for treating the substrates arranged therein, a main arm mechanism (24, 312, 313) arranged within the process section for receiving the substrates from the sub-arm mechanism arranged in the cassette section and, then, transferring the received substrates to each of the treating units while transferring the treated substrates out of the treating units, an air supply mechanism (10a, 10b, 12a, 14a, 16a to 16e, 30, 31, 32, 33a to 33f, 34, 36, 37a to 37e, 38, 39, 48, 306, 306a, 306b) for supplying a clean air to form a down-stream within the space surrounded by the outer casing (100a, 302), and a partition plate (11, 11A, 29, 51, 61, 305) for partitioning the inner space surrounded by the outer casing (100a, 302) not to interfere the down-flow of the air formed by the air supply mechanism, the partition plate having a substrate transfer port (11a, 11b, 29a, 51a, 61a, 308) through which the substrate is transferred from one of the partitioned spaces to the other partitioned space.
摘要翻译： 本发明提供了一种用于在空调环境下连续处理多个基板W的基板处理系统。 该系统包括：外壳（100a，302），其设有盒式传送口（100b，304），盒（CR，C）通过该传送口传送;具有盒式表（20,303） ），其被布置在由所述外壳包围的内部空间中，用于支撑通过所述盒传送端口传送的盒;辅助臂机构（22,311），用于从所述盒部一个接一个地接收所述基板;处理部分， 352），其位于与盒部分相邻并且具有用于处理布置在其中的基板的多个处理单元;布置在处理部分内的主臂机构（24,312,313），用于从布置在所述盒子部分中的子臂机构接收基板 然后在将处理过的基板从处理单元传送出去的同时将接收到的基板传送到每个处理单元;空气供应机构（10a，10b，12a，14a，16a至16e，30,31,32 ，33a〜33f，34,36， 37a，38,39,48,306,306a，306b），用于在由所述外壳（100a，302）包围的空间内供给清洁空气以形成下游流;以及分隔板（11,11A， （100a，302）包围的内部空间不会干涉由空气供给机构形成的空气的下降的分隔板，具有基板搬送口（11a，29,51,61,305） ，11b，29a，51a，61a，308），通过该衬底将衬底从一个分隔空间传送到另一个分隔空间。
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