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    METHOD FOR DETECTING PLUGGING OF PRESSURE FLOW-RATE CONTROLLER AND SENSOR USED THEREFOR
    6.
    发明公开
    METHOD FOR DETECTING PLUGGING OF PRESSURE FLOW-RATE CONTROLLER AND SENSOR USED THEREFOR 有权
    法梗阻的压力测量流量控制器检测gler，一个用于这个目的所使用的传感器

    公开(公告)号：EP1035457A1

    公开(公告)日：2000-09-13

    申请号：EP99935120.8

    申请日：1999-08-09

    申请人： Fujikin Incorporated ,  TOKYO ELECTRON LIMITED ,  Ohmi, Tadahiro

    发明人： OHMI, Tadahiro, 1-17-301, Komegahukuro 2-chome ,  IIDA, Seiichi, 5-3, Sumiyoshiyamate 1-chome ,  KAGATSUME, Satoshi, Tokyo Electron Yamanashi Ltd. ,  HIROSE, Jun, Tokyo Electron Yamanashi Ltd. ,  NISHINO, Kouji, Fujikin Incorporated ,  IKEDA, Nobukazu, Fujikin Incorporated ,  YAMAJI, Michio, Fujikin Incorporated ,  DOHI, Ryousuke, Fujikin Incorporated ,  YOSHIKAWA, Kazuhiro, Fujikin Incorporated ,  KOYOMOGI, Mutsunori, Fujikin Incorporated ,  UNO, Tomio, Fujikin Incorporated ,  IDETA, Eiji, Fujikin Incorporated ,  HIROSE, Takashi, Fujikin Incorporated

    IPC分类号： G05D7/06

    CPC分类号： G05D7/0635 ,  Y10T137/0396 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/8326

    摘要： A method and apparatus for detection of the clogging of the orifice by measuring the upstream side pressure without breaking up the piping system in a flow rate control unit using an orifice, so as to extend the life of the flow control unit and enhance its safety.
    To be specific, the apparatus of detecting the clogging of the orifice in a pressure-type rate flow controller has a control valve (CV), an orifice (2), a pressure detector (14) for measuring the upstream pressure P 1 therebetween and a flow rate setting circuit (32) wherein with the upstream pressure P 1 maintained about two or more times higher than the downstream pressure P 2 , the downstream flow rate Q C is calculated from the equation Q C = KP 1 (K: constant) and wherein the control valve (CV) is controlled by the difference signal Q Y between the calculated flow rate Q C and the set flow rate Q S , the apparatus comprising:

    a storage memory M memorizing standard pressure attenuation data Y(t) of the upstream pressure P 1 measured with the flow rate switched from the high set flow rate Q SH to the low set flow rate Q SL , with the orifice (2) not clogged
    a pressure detector (14) for determination of the pressure attenuation data P(t) of the upstream pressure P 1 with the flow rate switched from the high set flow rate Q SR to the low set flow rate Q SL , with the orifice (2) in the actual conditions
    a central processing unit CPU for checking the pressure attenuation data P(t) against standard pressure attenuation data Y(t) and
    an alarm circuit (46) that turns on a clogging alarm when the pressure attenuation data P(t) deviates from standard pressure attenuation data Y(t) to a specific degree or beyond that.

    摘要翻译： 通过测量，而不使用到孔以便延伸流量控制单元的使用寿命并提高其安全性的流量控制单元分手管道系统中的上游侧压力检测用节流孔堵塞的方法和装置。 具体而言，在检测孔的堵塞的压力式速率流控制器的装置具有用于测量上游压力P1有和一个之间的控制阀（CV）与小孔（2），压力检测器（14） 流量设定电路（32）与上游侧压力P1 worin保持在约比下游压力P2，下游流量QC从等式QC = KP1（K：常数）计算值高两或更多倍和worin所述控制阀（ 一个存储装置M与所述流率测量的上游压力P1的记忆基准压力衰减数据Y（t）的切换：CV）是由计算的流量QC与设定流量QS，该装置包括之间的差信号QY控制 从高设定流量QSH为低设定流量QSL，与所述孔（2）无堵塞的压力检测器（14），用于判定与所述流量上游压力P1的压力衰减数据P（t）的切换 从 该高设定流量QSR为低设定流量QSL，与所述孔（2）在实际情况中，用于检查对基准压力衰减数据Y（t）的压力衰减数据P（t）的一个中央处理单元CPU和 报警电路（46）做了堵塞报警接通当压力衰减数据P（t）的标准压力衰减数据Y（t）的偏离到一个特定的程度或超出。

    DIAPHRAGM VALVE FOR VACUUM EVACUATION SYSTEM
    7.
    发明授权
    DIAPHRAGM VALVE FOR VACUUM EVACUATION SYSTEM 有权
    蝶阀抽真空系统

    公开(公告)号：EP1596107B1

    公开(公告)日：2008-07-23

    申请号：EP04709325.7

    申请日：2004-02-09

    申请人： Fujikin Incorporated ,  Ohmi, Tadahiro

    发明人： OHMI, Tadahiro ,  IKEDA, Nobukazu, Fujikin Incorporated ,  YAMAJI, Michio, Fujikin Incorporated ,  KITANO, Masafumi, Fujikin Incorporated ,  MORIMOTO, Akihiro, Fujikin Incorporated

    IPC分类号： F16K7/12 ,  F16K27/00

    CPC分类号： F16K7/16 ,  F16K51/02

    摘要： A diaphragm valve for a vacuum evacuation system applicable to a semiconductor manufacturing system. Corrosion of members due to deposition/adhesion of products produced by thermolysis of gas, clogging due to products, and seat leakage are prevented. This diaphragm valve leads to reduction in the scale of the vacuum evacuation system facility, reduction in cost, and reduction in diameter of piping of the vacuum evacuation system for the purpose of decrease in vacuum evacuation time. Specifically, the diaphragm valve (1) comprises a body (2) having an inlet passage (6), an outlet passage (7), and a valve seat (8) provided between the passages, a diaphragm (3) which is provided to the body (2) and can be separated from the valve seat (8) and brought into contact with the same, and drive means (4) provided to the body (2) and adapted to separate the diaphragm (3) from the valve seat (8) and to bring the diaphragm (3) into contact with the same. The portion (25) of the body (2) and the portion (25) of the diaphragm (3) both coming into contact with a fluid are coated with a synthetic resin coating (5) of predetermined thickness.

    DEVICE FOR CONTROLLING CHAMBER INNER PRESSURE AND INNER PRESSURE CONTROLLED-TYPE CHAMBER
    8.
    发明公开
    DEVICE FOR CONTROLLING CHAMBER INNER PRESSURE AND INNER PRESSURE CONTROLLED-TYPE CHAMBER 审中-公开
    EINRICHTUNG ZUR STEUERUNG DES KAMMERINNENDRUCKS UND KAMMER DES INNENDRUCKGESTEUERTEN TYPE

    公开(公告)号：EP1672457A1

    公开(公告)日：2006-06-21

    申请号：EP04817112.8

    申请日：2004-09-14

    申请人： FUJIKIN INCORPORATED ,  OHMI, Tadahiro

    发明人： OHMI, Tadahiro ,  TERAMOTO, Akinobu ,  UNO, Tomio, Fujikin Incorporated ,  DOHI, Ryousuke, Fujikin Incorporated ,  NISHINO, Kouji, Fujikin Incorporated ,  NAKAMURA, Osamu, Fujikin Incorporated ,  MATSUMOTO, Atsushi, Fujikin Incorporated ,  NAGASE, Masaaki, Fujikin Incorporated ,  IKEDA, Nobukazu, Fujikin Incorporated

    IPC分类号： G05D7/06

    CPC分类号： G05D16/208 ,  Y10T137/7761 ,  Y10T137/8741 ,  Y10T137/87507

    摘要： The present invention makes it possible to achieve an accurate control of an internal pressure of a chamber over a wide range by preventing substantial reduction of accuracy of flow rate control in the small flow quantity range and to ensure an accurate flow control over the entire range of flow rate control, thus adjusting the flow rate of a gas supplied to the chamber.
    A gas supply facility includes a plurality of pressure type flow controllers connected in parallel, and a controller to control operation of the plurality of pressure type flow controllers so as to supply a desired gas exhausted by a vacuum pump to a chamber while controlling its flow rate, one of the pressure type flow controllers is the controller to control the gas flow rate range up to 10% of the maximum flow rate supplied to the chamber, while the remaining pressure type flow controllers are made to be ones that control the rest of the gas flow rate range. Furthermore, pressure inside the chamber is controlled by installing a pressure detector in the chamber, inputting the value detected by the detector to the controller, and by adjusting a control signal to the pressure type flow controller.

    摘要翻译： 本发明通过防止在小流量范围内的流量控制的精度的显着降低，可以在宽范围内实现对室的内部压力的精确控制，并且确保在整个范围内的精确的流量控制 流量控制，从而调节供应到室的气体的流量。 气体供给设备包括并联连接的多个压力式流量控制器和控制器，用于控制多个压力式流量控制器的操作，以便在控制其流量的同时将由真空泵排出的期望气体提供给腔室 压力式流量控制器之一是用于控制气体流量范围高达供应给腔室的最大流量的10％的控制器，而剩余的压力式流量控制器被制成控制其余部分 气体流量范围。 此外，通过在室内安装压力检测器，将检测器检测到的值输入到控制器，并通过调节压力型流量控制器的控制信号来控制室内的压力。

    DIAPHRAGM VALVE FOR VACUUM EVACUATION SYSTEM
    9.
    发明公开
    DIAPHRAGM VALVE FOR VACUUM EVACUATION SYSTEM 有权
    MEMBRANVENTILFÜRVAKUUMEVAKUIERUNGSSYSTEM

    公开(公告)号：EP1596107A1

    公开(公告)日：2005-11-16

    申请号：EP04709325.7

    申请日：2004-02-09

    申请人： FUJIKIN INCORPORATED ,  OHMI, Tadahiro

    发明人： OHMI, Tadahiro ,  IKEDA, Nobukazu, Fujikin Incorporated ,  YAMAJI, Michio, Fujikin Incorporated ,  KITANO, Masafumi, Fujikin Incorporated ,  MORIMOTO, Akihiro, Fujikin Incorporated

    IPC分类号： F16K7/12 ,  F16K27/00

    CPC分类号： F16K7/16 ,  F16K51/02

    摘要： With the diaphragm valve in the vacuum exhaustion system applied to the semiconductor manufacturing facilities, it is possible to prevent the corrosion of the valve members caused by the accumulation and adherence of the substances as produced by the thermal decomposition, the clogging caused by the substances as produced, and the seat leakage. Further, it is possible to make the facilities for the vacuum exhaustion system small-sized, and, as a result, to lower the costs. It is also possible to reduce the diameter of the vacuum exhaustion system pipings for shortening the vacuum exhaustion time.
    Specifically, the diaphragm valve 1 is provided with a body 2 having a flow-in passage 6, a flow-out passage 7, and a valve seat 8 formed between the passages; a diaphragm 3 installed in the body 2 and permitted to rest on and move away from the valve seat 8; and a driving means 4 installed on the body 2 to allow the diaphragm 3 to rest on and move away from the valve seat 8, wherein synthetic resin films 5 of predetermined thickness are coated on fluid-contacting parts 25 of the afore-mentioned body 2 and diaphragm 3.

    摘要翻译： 通过将真空排气系统中的隔膜阀应用于半导体制造设备，可以防止由热分解产生的物质的积聚和粘附引起的阀构件的腐蚀，由物质引起的堵塞 产生和座位泄漏。 此外，可以使真空耗尽系统的设施小型化，从而降低成本。 也可以减小真空耗尽系统管道的直径，以缩短真空耗尽时间。 具体地，隔膜阀1设置有形成在通道之间的流入通道6，流出通道7和阀座8的主体2; 隔膜3安装在主体2中并允许静止在阀座8上并远离阀座8; 以及安装在主体2上的驱动装置4，以允许隔膜3搁置并离开阀座8，其中预定厚度的合成树脂膜5涂覆在上述主体2的流体接触部分25上 和隔膜3.