专利检索 ap:("TOKYO OHKA KOGYO CO LTD") AND inv:"KINOSHITA HIROO" 第 1 页

1.

发明公开
ELECTRON-BEAM OR EUV (EXTREME ULTRAVIOLET) RESIST COMPOSITION AND PROCESS FOR THE FORMATION OF RESIST PATTERNS 审中-公开
标题翻译：抗蚀剂组合物用于电子束或EUV（极紫外）AND PROCESS FOR PRODUCING RESIST结构

公开(公告)号：EP1791024A4

公开(公告)日：2007-11-07

申请号：EP05781331

申请日：2005-09-01

申请人： TOKYO OHKA KOGYO CO LTD

发明人： HADA HIDEO , SHIONO DAIJU , KINOSHITA HIROO , WATANABE TAKEO

IPC分类号： G03F7/004 , G03F7/029 , G03F7/039

CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/12 , Y10S430/121 , Y10S430/122 , Y10S430/126 , Y10S430/143

摘要： An electron-beam or EUV resist composition comprising (A) a resin component which can be changed in alkali solubility by the action of an acid and (B) an acid generator component which can generate an acid on being exposed to light, characterized in that the component (B) contains at least one of the onium salts bearing anions represented by the general formulae (b-0-1) and (b-0-2): wherein X is C 2-6 alkylene wherein at least one hydrogen is replaced by fluorine; and Y and Z are each independently C 1-10 alkyl wherein at least one hydrogen is replaced by fluorine.