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公开(公告)号：EP2750164A4
公开(公告)日：2015-09-02
申请号：EP12825834
申请日：2012-08-24
发明人： FUKUGAMI NORIHITO , SAKATA YO , MATSUI KAZUAKI , WATANABE GENTA
IPC分类号： H01L21/027 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/38
摘要： Provided is a reflective mask having a light-shielding frame with high light-shielding performance, and a method for manufacturing thereof. In a reflective mask having a light-shielding frame dug into a multilayered reflective layer, when side etching is performed or processing to obtained a reverse tapered shape is performed only on the multilayered reflective layer, it becomes possible to suppress reflection of EUV light (extreme ultraviolet light) in the vicinity of the edge of the light-shielding frame, provide a reflective mask having high light-shielding ability, and form a transcription pattern with high accuracy.
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2.发明公开REFLECTIVE PHOTOMASK AND PRODUCTION METHOD THEREFOR 审中-公开REFLEKTIERENDE FOTOMASKE UND HERSTELLUNGSVERFAHRENDAFÜR
公开(公告)号：EP3043375A4
公开(公告)日：2017-05-03
申请号：EP14842142
申请日：2014-08-28
IPC分类号： G03F1/24 , H01L21/027
CPC分类号： G03F1/24
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3.发明公开REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHODS FOR MANUFACTURING REFLECTIVE MASK BLANK AND REFLECTIVE MASK 审中-公开反射型掩模中，用于制造反射型掩模和反射掩模反射掩模和方法
公开(公告)号：EP2763158A4
公开(公告)日：2015-12-30
申请号：EP12835771
申请日：2012-09-25
IPC分类号： H01L21/027 , G03F1/00 , G03F1/24
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