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1.发明公开Binary silica-titania glass articles having a ternary doped silica-titania critical zone 审中-公开二氧化硅 - 钛二进制玻璃制品掺杂三元临界二氧化硅 - 钛区
公开(公告)号：EP2565713A3
公开(公告)日：2015-04-15
申请号：EP12182315.7
申请日：2012-08-30
申请人： Corning Incorporated
发明人： Annamalai, Sezhian
摘要： In one aspect the disclosure is directed to a binary silica-titania blank having a CTE of 0 ± 30 ppb/°C or less and a insert made of silica-titania-dopant(s) glass in the critical zone, wherein the dopants are selected from the group consisting of aluminum oxide, selected transition metal oxides, and amount of the dopants is in the range of 0.05 wt.% to 8 wt.% and the insert is fusion bonded to the blank with or without a frit. In various embodiments the dopants are selected from the group consisting of 0.25 wt.% to 8 wt.% Al 2 O 3 , 0.05 wt.% to 3 wt.% Nb 2 O 5 , and 0.25 wt.% to 6 wt.% Ta 2 O 5 .
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2.发明公开REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHODS FOR MANUFACTURING REFLECTIVE MASK BLANK AND REFLECTIVE MASK 审中-公开反射型掩模中，用于制造反射型掩模和反射掩模反射掩模和方法
公开(公告)号：EP2763158A1
公开(公告)日：2014-08-06
申请号：EP12835771.2
申请日：2012-09-25
IPC分类号： H01L21/027 , G03F1/24
摘要： An objective is to provide a reflective mask blank, a reflective mask, and methods for manufacturing those, suppress reflectance at a light-shielding frame, and improve quality.
The reflective mask includes a substrate, a multilayered reflective layer formed on the substrate, an absorption layer formed on the multilayered reflective layer, and a frame-shaped light-shielding frame area at which the absorption layer has a film thickness larger than a film thickness at other areas. The multilayered reflective layer is diffused and mixed at the light-shielding frame area through melting.摘要翻译： 一个目的是提供一种反射型掩模基板，反射式掩模，以及用于制造这些方法中，在遮光框抑制反射率，并提高质量。 用反射型掩模包括基板，形成在其中吸收层的多层反射层上形成的基板的多层反射层，以及在哪个吸收层的膜厚比薄膜厚度大的框状的遮光框区域 在其他地区。 多层反射层被扩散，并在通过熔化遮光框区域混合。
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3.发明公开REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHODS FOR MANUFACTURING REFLECTIVE MASK BLANK AND REFLECTIVE MASK 审中-公开反射型掩模中，用于制造反射型掩模和反射掩模反射掩模和方法
公开(公告)号：EP2763158A4
公开(公告)日：2015-12-30
申请号：EP12835771
申请日：2012-09-25
IPC分类号： H01L21/027 , G03F1/00 , G03F1/24
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4.发明公开Optically transparent and electrically conductive coatings and method for their deposition on a substrate 审中-公开光学透明且导电的涂层和方法用于其在衬底上沉积
公开(公告)号：EP2581789A1
公开(公告)日：2013-04-17
申请号：EP11185280.2
申请日：2011-10-14
申请人： Fundació Institut de Ciències Fotòniques , Institució Catalana de Recerca i Estudis Avançats , Carl Zeiss SMS GmbH
摘要： The present inventions relates to a substrate for a photolithographic mask comprising a coating deposited on a rear surface of the substrate, wherein the coating comprises (a) at least one electrically conducting layer, and (b) wherein a thickness of the at least one layer is smaller than 30 nm, preferably smaller than 20 nm, and most preferably smaller than 10 nm.
摘要翻译： 本发明涉及一种用于光刻掩模包括沉积在基片的后表面上的涂层的基材，worin该涂层包括（a）至少一个导电层，和（b）worin的厚度，所述至少一个层的 是小于30nm，优选小于20nm，并且最优选小于10纳米。
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5.发明公开Binary silica-titania glass articles having a ternary doped silica-titania critical zone 审中-公开二氧化硅 - Titan-Glasartikel mitternärdotierter kritischer二氧化硅 - Titan-Zone
公开(公告)号：EP2565713A2
公开(公告)日：2013-03-06
申请号：EP12182315.7
申请日：2012-08-30
申请人： Corning Incorporated
发明人： Annamalai, Sezhian
IPC分类号： G03F1/22
摘要： In one aspect the disclosure is directed to a binary silica-titania blank having a CTE of 0 ± 30 ppb/°C or less and a insert made of silica-titania-dopant(s) glass in the critical zone, wherein the dopants are selected from the group consisting of aluminum oxide, selected transition metal oxides, and amount of the dopants is in the range of 0.05 wt.% to 8 wt.% and the insert is fusion bonded to the blank with or without a frit. In various embodiments the dopants are selected from the group consisting of 0.25 wt.% to 8 wt.% Al 2 O 3 , 0.05 wt.% to 3 wt.% Nb 2 O 5 , and 0.25 wt.% to 6 wt.% Ta 2 O 5 .
摘要翻译： 在一个方面，本公开涉及具有0±30ppb /℃或更低的CTE的二元二氧化硅 - 二氧化钛坯料和在临界区中由二氧化硅 - 二氧化钛 - 掺杂剂玻璃制成的插入物，其中掺杂剂为 选自氧化铝，选定的过渡金属氧化物和掺杂剂的量在0.05重量％至8重量％的范围内，并且插入物与或不与玻璃料熔合在一起。 在各种实施方案中，掺杂剂选自由0.25重量％至8重量％的Al 2 O 3，0.05重量％至3重量％的Nb 2 O 5和0.25重量％至6重量％ Ta 2 O 5。
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