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    ION BEAM CHAMBER FLUID DELIVERY APPARATUS AND METHOD AND ION BEAM ETCHER USING SAME
    3.
    发明公开
    ION BEAM CHAMBER FLUID DELIVERY APPARATUS AND METHOD AND ION BEAM ETCHER USING SAME 审中-公开

    公开(公告)号：EP4102537A1

    公开(公告)日：2022-12-14

    申请号：EP22177388.0

    申请日：2022-06-06

    申请人： Techinsights Inc.

    发明人： PAWLOWICZ, Christopher ,  SORKIN, Alexander ,  FRENCH, Trevor ,  JONES, Ian ,  GAGNON, Paul

    IPC分类号： H01J37/18 ,  H01J37/20 ,  H01J37/305

    摘要： Described are various embodiments of an ion beam chamber fluid delivery system and method for delivering a fluid onto a substrate in an ion beam system during operation. In one embodiment, the system comprises: a chamber comprising an ion beam gun oriented so as to cause ions to impinge the substrate, said chamber having a fluid delivery conduit therein for delivering the fluid into the chamber; a transferable substrate stage for holding the substrate, the transferable stage further configured to move between an operating position and a payload position during non-operation, said payload position for receiving and removing said substrate; and a fluid delivery nozzle being in a fixed location relative to the transferable stage, at least during operation, with an outlet position that is configured to deliver a fluid to a predetermined location on said transferable stage.