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公开(公告)号:EP2702648B1
公开(公告)日:2018-05-09
申请号:EP12774690.7
申请日:2012-03-16
发明人: VURGAFTMAN, Igor , MEYER, Jerry, R. , CANEDY, Chadwick, Lawrence , BEWLEY, William, W. , KIM, Chul, Soo , KIM, Mijin , MERRITT, Charles, D.
CPC分类号: H01S5/3402 , B82Y20/00 , H01S5/305 , H01S5/3086 , H01S5/3401 , H01S5/3407 , H01S5/3422 , H01S5/34313
摘要: Methods for improving the performance of type-II and type-I ICLs, particularly in the mid-IR wavelength range, are provided. The electron injector of a type-II or a type-I ICL can be heavily n-doped to increase the ratio of electrons to holes in the active quantum wells, thereby increasing the probability of radiative recombination in the active quantum wells and reducing the threshold current density Jth needed to achieve lasing. For both type-II and type-I ICLs, the doping should have a sheet density in the low-1012 range. In either the type-II or the type-I case, in some embodiments, heavy doping can be concentrated in the middle quantum wells of the electron injector, while in other embodiments, doping with silicon can be shifted towards the active quantum wells.
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公开(公告)号:EP2702648A1
公开(公告)日:2014-03-05
申请号:EP12774690.7
申请日:2012-03-16
发明人: VURGAFTMAN, Igor , MEYER, Jerry, R. , CANEDY, Chadwick, Lawrence , BEWLEY, William, W. , KIM, Chul, Soo , KIM, Mijin , MERRITT, Charles, D.
IPC分类号: H01S3/00
CPC分类号: H01S5/3402 , B82Y20/00 , H01S5/305 , H01S5/3086 , H01S5/3401 , H01S5/3407 , H01S5/3422 , H01S5/34313
摘要: Methods for improving the performance of type-II and type-I ICLs, particularly in the mid-IR wavelength range, are provided. The electron injector of a type-II or a type-I ICL can be heavily n-doped to increase the ratio of electrons to holes in the active quantum wells, thereby increasing the probability of radiative recombination in the active quantum wells and reducing the threshold current density
J
th needed to achieve lasing. For both type-II and type-I ICLs, the doping should have a sheet density in the low-10
12 range. In either the type-II or the type-I case, in some embodiments, heavy doping can be concentrated in the middle quantum wells of the electron injector, while in other embodiments, doping with silicon can be shifted towards the active quantum wells.-
公开(公告)号:EP4460878A2
公开(公告)日:2024-11-13
申请号:EP23737704.9
申请日:2023-01-04
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公开(公告)号:EP3465776A1
公开(公告)日:2019-04-10
申请号:EP17803639.8
申请日:2017-05-26
发明人: MEYER, Jerry, R. , VURGAFTMAN, Igor , CANEDY, Chadwick, Lawrence , BEWLEY, William, W. , KIM, Chul, Soo , MERRITT, Charles, D. , WARREN, Michael, V. , KIM, Mijin
IPC分类号: H01L31/101 , H01L31/0232 , H01L31/032
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5.
公开(公告)号:EP3821505A1
公开(公告)日:2021-05-19
申请号:EP19833825.3
申请日:2019-07-12
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