公开(公告)号：EP2964455A1

公开(公告)日：2016-01-13

申请号：EP14760501.8

申请日：2014-03-05

申请人： The Trustees of Columbia University in the City of New York

发明人： GAATHON, Ophir ,  ENGLUND, Dirk, R. ,  HODGES, Jonathan ,  LI, Luozhou ,  TRUSHEIM, Matthew

IPC分类号： B32B3/00

CPC分类号： C01B31/065 ,  C01B32/28 ,  C09K11/65 ,  H01J37/32651 ,  H01J37/32788 ,  H01J2237/3341 ,  H01J2237/339

摘要： Techniques for fabricating diamond nanostructures including application of a self-assembled hard mask to a surface of a diamond substrate to define a pattern of masked regions having a predetermined diameter surrounded by an exposed portion. The exposed portion can be vertically etched to a predetermined depth using inductively coupled plasma to form a plurality of nanoposts corresponding to the masked regions. The nanoposts can be harvested to obtain a nanostructure with a diameter corresponding to the predetermined diameter and a length corresponding to the predetermined depth.