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公开(公告)号：EP1156130B1
公开(公告)日：2019-02-20
申请号：EP00979084.1
申请日：2000-12-04
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2.发明公开PLASMA PROCESSING CONTAINER INTERNAL MEMBER AND PRODUCTION METHOD THEREFOR 审中-公开INTERNES ELEMENTFÜRPLASMABEHANDLUNGSBEHTERLTER UND HERSTELLUNGSVERFAHREN
公开(公告)号：EP1156130A1
公开(公告)日：2001-11-21
申请号：EP00979084.1
申请日：2000-12-04
发明人： Harada, Yoshio , Takeuchi, Junichi , Hamaguchi, Tatsuya , Nagayama, Nobuyuki Tokyo Elect. Yamanashi Co. Ltd. , Mitsuhashi, Kouji Tokyo Elect. Yamanashi Co., Ltd.
CPC分类号： H01J37/32477 , B01J19/02 , B01J2219/0218 , B01J2219/0236 , B01J2219/024 , B01J2219/0263 , B01J2219/0286 , B01J2219/0894 , C09D1/00 , C23C4/00 , C23C4/02 , C23C4/11 , Y10T428/12458 , Y10T428/12479 , Y10T428/12549 , Y10T428/12618 , Y10T428/24999
摘要： It is to propose an internal member for a plasma treating vessel having excellent resistances to chemical corrosion and plasma erosion under an environment containing a halogen gas and an advantageous method of producing the same, which is a member formed by covering a surface of a substrate with a multilayer composite layer consisting of a metal coating formed as an undercoat, Al 2 O 3 film formed on the undercoat as a middle layer and Y 2 O 3 sprayed coating formed on the middle layer as a top coat.
摘要翻译： 本发明提供一种等离子体处理容器的内部构件，该等离子体处理容器在含有卤素气体的环境下具有优异的耐化学腐蚀和等离子体侵蚀性，以及制造该等离子体处理容器的有利方法，该方法是通过将基材的表面覆盖 由作为底涂层形成的金属涂层，在作为中间层的底涂层上形成的Al 2 O 3膜和在中间层上形成的作为顶涂层的Y 2 O 3喷涂层构成的多层复合层。
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