专利检索 ap:("ULVAC INC" OR "TOKYO ELECTRON LTD") AND inv:"KURANO YOSHITO" 第 1 页

1.

发明公开
PROCESS FOR PRODUCING MODIFIED POROUS SILICA FILM, MODIFIED POROUS SILICA FILM OBTAINED BY THE PROCESS, AND SEMICONDUCTOR DEVICE EMPLOYING THE MODIFIED POROUS SILICA FILM 审中-公开
标题翻译：用于生产改性的多孔硅石薄膜，通过过程GOT改性多孔质二氧化硅膜和改性的多孔硅石薄膜中使用的半导体COMPONENT

公开(公告)号：EP1855313A4

公开(公告)日：2011-09-28

申请号：EP06713744

申请日：2006-02-15

申请人： ULVAC INC , TOKYO ELECTRON LTD

发明人： FUJII NOBUTOSHI , KOHMURA KAZUO , MIYOSHI HIDENORI , TANAKA HIROFUMI , OIKE SHUNSUKE , MURAKAMI MASAMI , KUBOTA TAKESHI , KURANO YOSHITO

IPC分类号： H01L21/316 , C01B33/12 , H01L21/768 , H01L23/522

CPC分类号： H01L21/76826 , C01B33/12 , H01L21/02126 , H01L21/02203 , H01L21/02214 , H01L21/02282 , H01L21/02337 , H01L21/31608 , H01L21/31695 , Y10T428/249994