摘要:
The invention relates to a light source for injecting excess carriers into a semiconductor wafer, fully illuminating a surface of the wafer (4). According to the invention, the source (1) includes at least one set of point sources (2) which are spaced apart at regular intervals along the X and Y axes, such that the source emits a monochromatic beam of a size that is at least equal to that of the semiconductor wafer surface to be illuminated. Each of the point sources (2) is sinusoidally modulated by a common electrical modulator (3), the distance (d) between two point sources and the distance (D) between the source (1) and the semiconductor wafer surface (4) to be illuminated being selected such that the monochromatic light beam uniformly illuminates said surface.