SUBSTRATE WASHING DEVICE AND PROCESS
    3.
    发明公开
    SUBSTRATE WASHING DEVICE AND PROCESS 审中-公开
    衬底清洗装置和过程

    公开(公告)号:EP3212834A1

    公开(公告)日:2017-09-06

    申请号:EP15784390.5

    申请日:2015-10-23

    IPC分类号: D06F1/00

    CPC分类号: D06F1/00

    摘要: A washing device for manual washing of a substrate, the washing device comprising: a) a receptacle for containing an aqueous wash liquor with a substrate at least partially immersed therein; b) a filling and access aperture defined by upper peripheral edge portion/s of the washing receptacle; and c) at least one upper portion of the device which is transparent or translucent.

    摘要翻译: 1。一种用于手动清洗基底的清洗装置,所述清洗装置包括:a)用于容纳含有洗涤液的容器,所述洗涤液具有至少部分浸入其中的基底; b)由洗涤容器的上周边部分限定的填充和进入孔; 和c)该装置的至少一个透明或半透明的上部。