公开(公告)号：EP1687460A2

公开(公告)日：2006-08-09

申请号：EP04819061.5

申请日：2004-11-08

Applicant: VEECO INSTRUMENTS INC.

Inventor： KOOLS, Jacques C.S. ,  BUBBER, Randhir ,  MAO, Ming ,  SCHNEIDER, Thomas Andrew ,  WANG, Jinsong

IPC: C23C16/455

CPC classification number: C23C16/45544 ,  C23C16/45565 ,  C23C16/45591

Abstract: A method and apparatus for fabricating a conformal thin film on a substrate are disclosed. The method includes introducing a gas from a gas inlet into an expansion volume associated with an atomic layer deposition (ALD) system. The gas is flowed through a diffuser plate adjacent to the expansion volume and a reaction chamber. The diffuser plate includes a protrusion located opposite the gas inlet and the protrusion reduces turbulence in the expansion volume.

公开(公告)号：EP1687460B1

公开(公告)日：2007-12-26

申请号：EP04819061.5

申请日：2004-11-08

Applicant: VEECO INSTRUMENTS INC.

Inventor： KOOLS, Jacques C.S. ,  BUBBER, Randhir ,  MAO, Ming ,  SCHNEIDER, Thomas Andrew ,  WANG, Jinsong

IPC: C23C16/455

CPC classification number: C23C16/45544 ,  C23C16/45565 ,  C23C16/45591

Abstract: A method and apparatus for fabricating a conformal thin film on a substrate are disclosed. The method includes introducing a gas from a gas inlet into an expansion volume associated with an atomic layer deposition (ALD) system. The gas is flowed through a diffuser plate adjacent to the expansion volume and a reaction chamber. The diffuser plate includes a protrusion located opposite the gas inlet and the protrusion reduces turbulence in the expansion volume.