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    METHODS AND SYSTEMS FOR IN-SITU PYROMETER CALIBRATION
    1.
    发明公开
    METHODS AND SYSTEMS FOR IN-SITU PYROMETER CALIBRATION 审中-公开
    方法及系统现场校准高温计

    公开(公告)号：EP2659244A1

    公开(公告)日：2013-11-06

    申请号：EP11817495.2

    申请日：2011-12-22

    Applicant: Veeco Instruments Inc.

    Inventor： GURARY, Alexander, I. ,  BOGUSLAVSKIY, Vadim ,  KRISHNAN, Sandeep ,  KING, Matthew

    IPC: G01J5/00

    CPC classification number: G01J5/0003 ,  G01J5/0007 ,  G01J2005/0048

    Abstract: A method of in-situ pyrometer calibration for a wafer treatment reactor such as a CVD reactor 12 desirably includes the steps of positioning a calibrating pyrometer 80 at a first calibrating position A and heating the reactor until the reactor reaches a pyrometer calibration temperature. The method desirably further includes rotating a support element 40 about a rotational axis 42, and while the support element is rotating about the rotational axis, obtaining first operating temperature measurements from a first operating pyrometer 71 installed at a first operating position 1R, and obtaining first calibrating temperature measurements from the calibrating pyrometer 80. Both the calibrating pyrometer 80 and the first operating pyrometer 71 desirably are adapted to receive radiation from a first portion of the wafer support element 40 at a first radial distance D1 from the rotational axis 42 of the wafer support element.

    KEYED WAFER CARRIER
    4.
    发明公开
    KEYED WAFER CARRIER 有权
    CODIERTERWAFERTRÄGER

    公开(公告)号：EP2828886A1

    公开(公告)日：2015-01-28

    申请号：EP13763498.6

    申请日：2013-03-01

    Applicant: Veeco Instruments Inc.

    Inventor： KRISHNAN, Sandeep ,  MOY, Keng ,  GURARY, Alexander, I. ,  KING, Matthew ,  BOGUSLAVSKIY, Vadim ,  KROMMENHOEK, Steven

    IPC: H01L21/683 ,  H01L21/205 ,  C23C16/458

    CPC classification number: C23C16/4584 ,  C23C16/4586 ,  C23C16/46 ,  H01L21/6719 ,  H01L21/68764 ,  H01L21/68771 ,  H01L21/68792

    Abstract: A structure for a chemical vapor deposition reactor desirably includes a reaction chamber having an interior, a spindle mounted in the reaction chamber, and a wafer carrier releasably mounted onto the spindle for rotation therewith. The spindle desirably has a shaft extending along a vertical rotational axis and a key projecting outwardly from the shaft. The wafer carrier preferably has a body defining oppositely-facing top and bottom surfaces and at least one wafer-holding feature configured so that a wafer can be held therein with a surface of the wafer exposed at the top surface of the body. The wafer carrier desirably further has a recess extending into the body from the bottom surface of the body and a keyway projecting outwardly from a periphery of the recess along a first transverse axis. The shaft preferably is engaged in the recess and the key preferably is engaged into the keyway.

    Abstract translation: 化学气相沉积反应器的结构理想地包括具有内部的反应室，安装在反应室中的主轴和可释放地安装到主轴上以与其一起旋转的晶片载体。 主轴理想地具有沿着垂直旋转轴线延伸的轴和从轴向外突出的键。 晶片载体优选地具有限定相对面对的顶部和底部表面的主体和至少一个晶片保持特征，其被构造成使得晶片可以保持在其中，其中晶片的表面暴露在主体的顶部表面。 晶片载体理想地还具有从主体的底表面延伸到主体中的凹槽和沿着第一横向轴线从凹部的周边向外突出的键槽。 轴优选地接合在凹部中，并且键优选地接合到键槽中。

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