PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT
    2.
    发明公开
    PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT 有权
    VERFAHREN ZUR HERSTELLUNG VON TRIARYLSULFONIUMSALZEN

    公开(公告)号:EP1676835A1

    公开(公告)日:2006-07-05

    申请号:EP04792015.2

    申请日:2004-10-04

    IPC分类号: C07C381/12

    CPC分类号: C07C381/12

    摘要: An object of the present invention is to provide a method for effectively producing a triarylsulfonium salt having a structure that only one aromatic ring of three aromatic rings on the cation portion thereof is different from the other two aromatic rings (hereinafter, abbreviated as a triarylsulfonium salt relating to the present invention) in a high yield without forming any byproduct. The present invention relates to a method for producing a triarylsulfonium salt represented by the general formula [4]:

    wherein, two R 1 's represent each hydrogen atom, halogen atom, alkyl group, haloalkyl group having 1 to 4 carbon atoms, alkoxy group, acyl group, hydroxyl group, amino group, nitro group or cyano group; R represents an aryl group which may have a substituent selected from a halogen atom, an alkyl group, a haloalkyl group having 1 to 4 carbon atoms, an alkoxy group, an alkylthio group, a N-alkylcarbamoyl group and a carbamoyl group, and the above substituent is different from one represented by the above R 1 ; and A 1 represents a strong acid residue,
    comprising reacting a diaryl sulfoxide represented by the general formula [1]:

    wherein, R 1 represents the same as above,
    and an aryl Grignard reagent represented by the general formula [2]:

            RMgX     [2]

    wherein, X represents a halogen atom; R represents the same as above,
    in the presence of an activator with high affinity for oxygen of 3 to 7.5 equivalents relative to the above diaryl sulfoxide, and then reacting the resultant reaction mixture with a strong acid represented by the general formula [3]:

            HA 1      [3]

    wherein, A 1 represents the same as above,
    or a salt thereof.

    摘要翻译: 本发明的目的是提供一种有效地制备三芳基锍盐的方法,其具有如下结构:其阳离子部分上的三个芳环的一个芳环不同于其它两个芳环(以下简称为三芳基锍盐 涉及本发明),而不形成任何副产物。 本发明涉及由通式[4]表示的三芳基锍盐的制造方法:其中,两个R 1表示氢原子,卤素原子,烷基,碳原子数1〜4的卤代烷基,烷氧基 酰基,羟基,氨基,硝基或氰基; R表示可以具有选自卤素原子,烷基,具有1〜4个碳原子的卤代烷基,烷氧基,烷硫基,N-烷基氨基甲酰基和氨基甲酰基的取代基的芳基, 上述取代基不同于上述R 1表示的取代基; 并且A 1表示强酸残基,包括使由通式[1]表示的二芳基亚砜:其中,R 1表示与上述相同的基团,和由通式[2]表示的芳基格氏试剂:€ƒ€ ƒ€ƒ€ƒ€ƒ€ƒ€ƒRMgX€ƒ€ƒ€ƒ€ƒ[2]其中,X表示卤素原子; R表示与上述相同,在相对于上述二芳基亚砜为3〜7.5当量的氧的亲和力高的活化剂的存在下,使所得反应混合物与通式[3]表示的强酸反应: ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒHA1€ƒ€ƒ€ƒ€ƒ[3]其中,A 1表示与上述相同的盐或其盐。

    SULFONIUM SALT COMPOUND
    3.
    发明授权
    SULFONIUM SALT COMPOUND 有权
    锍盐化合物

    公开(公告)号:EP1314725B1

    公开(公告)日:2008-03-19

    申请号:EP01945637.5

    申请日:2001-06-27

    摘要: A compound represented by the general formula [1] [1] (wherein R , R , and R each independently represents a residue of an aromatic hydrocarbon; Y represents an anion derived from a fluorinated carboxylic acid having three or more carbon atoms; and n is 1 or 2, provided that R , R , and R each is not a phenyl group having a substituent in an ortho and/or a meta position); and a composition comprising the compound and a diazodisulfone compound. Use of the compound or the composition as an acid generator for resists produces the effect of improving the profiles of ultrafine patterns or diminishing side wall irregularities in ultrafine patterns. The compound is also useful as a cationic photopolymerization initiator.

    摘要翻译: 由通式[1] [1]表示的化合物(其中R 1,R 2和R 3各自独立地表示芳族烃的残基; Y表示由氟化羧酸衍生的阴离子 具有三个或更多个碳原子;并且n是1或2,条件是R 1,R 2和R 3各自不是在邻位和/或间位具有取代基的苯基) ; 以及包含该化合物和重氮二砜化合物的组合物。 使用该化合物或该组合物作为抗酸剂的酸产生剂产生改善超细图案的轮廓或减小超细图案中的侧壁不规则的效果。 该化合物也可用作阳离子光聚合引发剂。