摘要:
An object of the present invention is to provide a method for effectively producing a triarylsulfonium salt having a structure that only one aromatic ring of three aromatic rings on the cation portion thereof is different from the other two aromatic rings (hereinafter, abbreviated as a triarylsulfonium salt relating to the present invention) in a high yield without forming any byproduct. The present invention relates to a method for producing a triarylsulfonium salt represented by the general formula [4]:
wherein, two R 1 's represent each hydrogen atom, halogen atom, alkyl group, haloalkyl group having 1 to 4 carbon atoms, alkoxy group, acyl group, hydroxyl group, amino group, nitro group or cyano group; R represents an aryl group which may have a substituent selected from a halogen atom, an alkyl group, a haloalkyl group having 1 to 4 carbon atoms, an alkoxy group, an alkylthio group, a N-alkylcarbamoyl group and a carbamoyl group, and the above substituent is different from one represented by the above R 1 ; and A 1 represents a strong acid residue, comprising reacting a diaryl sulfoxide represented by the general formula [1]:
wherein, R 1 represents the same as above, and an aryl Grignard reagent represented by the general formula [2]:
RMgX [2]
wherein, X represents a halogen atom; R represents the same as above, in the presence of an activator with high affinity for oxygen of 3 to 7.5 equivalents relative to the above diaryl sulfoxide, and then reacting the resultant reaction mixture with a strong acid represented by the general formula [3]:
HA 1 [3]
wherein, A 1 represents the same as above, or a salt thereof.
摘要:
A compound represented by the general formula [1] [1] (wherein R , R , and R each independently represents a residue of an aromatic hydrocarbon; Y represents an anion derived from a fluorinated carboxylic acid having three or more carbon atoms; and n is 1 or 2, provided that R , R , and R each is not a phenyl group having a substituent in an ortho and/or a meta position); and a composition comprising the compound and a diazodisulfone compound. Use of the compound or the composition as an acid generator for resists produces the effect of improving the profiles of ultrafine patterns or diminishing side wall irregularities in ultrafine patterns. The compound is also useful as a cationic photopolymerization initiator.