摘要:
A compound represented by the general formula [1] [1] (wherein R , R , and R each independently represents a residue of an aromatic hydrocarbon; Y represents an anion derived from a fluorinated carboxylic acid having three or more carbon atoms; and n is 1 or 2, provided that R , R , and R each is not a phenyl group having a substituent in an ortho and/or a meta position); and a composition comprising the compound and a diazodisulfone compound. Use of the compound or the composition as an acid generator for resists produces the effect of improving the profiles of ultrafine patterns or diminishing side wall irregularities in ultrafine patterns. The compound is also useful as a cationic photopolymerization initiator.
摘要:
A compound shown by the general formula [1] (wherein R 1 , R 2 and R 3 are each independently an aromatic hydrocarbon residual group, Y n- is an anion derived from a carboxylic acid having 3 or more carbon atoms with substituted fluorine atoms, and n is 1 or 2, provided that R 1 , R 2 and R 3 each is not a phenyl group having substituents at an ortho and/or a meta position), and a composition consisting of the compound and a diazodisulfone compound are disclosed. Use of the compound or the compound as an acid generator for resists produces the effects of improving the profiles of ultra-fine patterns or diminishing sidewall irregularities in ultra-fine patterns. The compound is also useful as a cationic photopolymerization initiator.
摘要:
The present invention relates to a compound represented by the general formula (A), a base- and/or radical-generating agent comprising the compound, and so on.
In the formula, four pieces of R 1 each independently represents a hydrogen atom or a fluorine atom; four pieces of R 2 each independently represent a fluorine atom or a trifluoromethyl group; R 3 , R 6 , R 7 and R 10 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; R 4 and R 5 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, or R 4 and R 5 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; and R 8 and R 9 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group having 6 to 14 carbon atoms and optionally having a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, a dialkylamino group having 2 to 12 carbon atoms, a halogen atom, and a nitro group, or R 8 and R 9 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; provided that two or three of the eight groups R 3 to R 10 are each a hydrogen atom, and, in a case where two of the eight groups are each a hydrogen atom, then three to six of the remaining groups are each an alkyl group having 1 to 12 carbon atoms, and, in a case where three of the eight groups are each a hydrogen atom, then four or five of the remaining groups are each an alkyl group having 1 to 12 carbon atoms.
摘要:
An object of the present invention is to provide a method for effectively producing a triarylsulfonium salt having a structure that only one aromatic ring of three aromatic rings on the cation portion thereof is different from the other two aromatic rings (hereinafter, abbreviated as a triarylsulfonium salt relating to the present invention) in a high yield without forming any byproduct. The present invention relates to a method for producing a triarylsulfonium salt represented by the general formula [4]:
wherein, two R 1 's represent each hydrogen atom, halogen atom, alkyl group, haloalkyl group having 1 to 4 carbon atoms, alkoxy group, acyl group, hydroxyl group, amino group, nitro group or cyano group; R represents an aryl group which may have a substituent selected from a halogen atom, an alkyl group, a haloalkyl group having 1 to 4 carbon atoms, an alkoxy group, an alkylthio group, a N-alkylcarbamoyl group and a carbamoyl group, and the above substituent is different from one represented by the above R 1 ; and A 1 represents a strong acid residue, comprising reacting a diaryl sulfoxide represented by the general formula [1]:
wherein, R 1 represents the same as above, and an aryl Grignard reagent represented by the general formula [2]:
RMgX [2]
wherein, X represents a halogen atom; R represents the same as above, in the presence of an activator with high affinity for oxygen of 3 to 7.5 equivalents relative to the above diaryl sulfoxide, and then reacting the resultant reaction mixture with a strong acid represented by the general formula [3]:
HA 1 [3]
wherein, A 1 represents the same as above, or a salt thereof.