公开(公告)号：EP2647693A1

公开(公告)日：2013-10-09

申请号：EP11845260.6

申请日：2011-11-28

申请人： Wako Pure Chemical Industries, Ltd.

发明人： KAWADA Hiromi ,  SHIRAHATA Satoshi ,  MIZUTA Hironori ,  KAKIZAWA Masahiko ,  SHIRAKI Kazuo

IPC分类号： C11D7/32 ,  C11D7/08 ,  C11D7/10 ,  H01L21/304

CPC分类号： C11D7/3245 ,  C11D7/3209 ,  C11D7/3218 ,  C11D11/0047 ,  H01L21/02074

摘要： It is an object of the present invention to provide a cleaning agent for a substrate having a copper wiring, which makes possible to sufficiently suppress elution of metal copper, and remove impurities or particles of copper hydroxide (II), copper oxide (II) and the like, generated by the chemical mechanical polishing (CMP) process, in cleaning of a semiconductor substrate after the chemical mechanical polishing (CMP) process, in a manufacturing process of the semiconductor substrate; and a method for cleaning a semiconductor substrate having a copper wiring, characterized by using the relevant substrate cleaner for a copper wiring: and the present invention relates to a cleaning agent for a substrate having a copper wiring consisting of an aqueous solution comprising [I] an amino acid represented by the following general formula [1], and [II] an alkylhydroxylamine; and a method for cleaning a semiconductor substrate having a copper wiring characterized by using the relevant cleaning agent for a substrate having a copper wiring;

(wherein R 1 represents a hydrogen atom, a carboxymethyl group or a carboxyethyl group; and R 2 and R 3 each independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, which may have a hydroxyl group, provided that those where R 1 to R 3 are all hydrogen atoms are excluded.).

摘要翻译： 它是本发明的一个目的是提供一种用于具有铜布线，这使得能够充分抑制的金属铜的洗脱，并除去杂质或氢氧化铜的粒子（II），氧化铜（II）和一个基片的清洗剂 等，通过化学机械抛光（CMP）过程中产生的，在半导体衬底的清洗的化学机械抛光（CMP）工艺之后，在半导体衬底的制造工艺; 以及用于清洁具有铜布线，通过使用相关的基板清洁器用于铜布线为特征的半导体基片的方法：并且本发明涉及一种清洗剂具有铜布线的水溶液由包含基材[I] 在由下述通式[1]，和[II]以烷基羟胺所示的氨基酸; 以及用于清洁具有通过使用用于具有铜布线的基板相关的清洁剂，其特征铜布线的半导体基板的方法; （Worin R 1表示氢原子，羧甲基或羧乙基;和R 2和R 3各自独立地darstellt氢原子或烷基具有1至4个碳原子，可以具有羟基基团，提供没有那些 其中R 1至R 3都为氢原子的情况除外。）。