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    INSTALLATION AND PROCESS FOR THE TREATMENT OF METALLIC PIECES BY A PLASMA REACTOR
    1.
    发明公开
    INSTALLATION AND PROCESS FOR THE TREATMENT OF METALLIC PIECES BY A PLASMA REACTOR 审中-公开
    安装和方法在金属部件的处理由等离子体反应器的方式

    公开(公告)号：EP3022761A1

    公开(公告)日：2016-05-25

    申请号：EP14747800.2

    申请日：2014-07-15

    申请人： Whirlpool S.A. ,  Universidade Federal De Santa Catarina (UFSC)

    发明人： BINDER, Roberto ,  KLEIN, Aloisio Nelmo ,  BINDER, Cristiano ,  HAMMES, Gisele

    IPC分类号： H01J37/32 ,  B22F3/24

    摘要： The plasma reactor comprises a reaction chamber (23) connectable to a source of ionizable gases (25) and to a heating device (80), said reactor (10) being subjected to the phases of heating (A), cleaning (L) and/or surface treatment (S), cooling (R), unloading (D) and loading (C) of metallic pieces (1). The installation comprises: at least two reactors (10), each being selectively and alternately connected to: the same source of ionizable gases (25); the same vacuum source (60); the same electrical energy source (50); and to the same heating device (80), the latter being displaceable between operative positions, in each of which surrounding laterally and superiorly a respective reactor (10), while the latter is in its heating phase (A) and cleaning phase (L) and/or in the surface treatment phase (S) of the metallic pieces (1).

    摘要翻译： 的等离子体反应器包括反应室（23）连接到可电离气体（25）的源极和一个加热装置（80）所述反应器（10）进行加热（A），清洁（L）的相位和 金属片/或表面处理（S），冷却（R），卸载（D）和加载（C）（1）。 该设备包括：至少两个反应器（10），每个被选择性地且交替地连接到：可电离气体（25）的相同的源; 在相同的真空源（60）; 相同的电能源（50）; 和相同的加热装置（80），后者是操作位置之间移动，在其中的每一个周围尾盘反弹和向上一个respectivement反应器（10），而后者是在其加热阶段（A）和清洁相（L） 和/或在金属片的表面处理相（S）（1）。

    PLASMA PROCESS AND REACTOR FOR TREATING METALLIC PIECES
    3.
    发明公开
    PLASMA PROCESS AND REACTOR FOR TREATING METALLIC PIECES 有权
    等离子体处理等反应器处理的金属片

    公开(公告)号：EP2294598A1

    公开(公告)日：2011-03-16

    申请号：EP09761190.9

    申请日：2009-06-09

    申请人： Whirlpool S.A. ,  Universidade Federal De Santa Catarina (UFSC)

    发明人： BINDER, Roberto ,  KLEIN, Aloisio Nelmo ,  BINDER, Cristiano ,  HAMMES, Gisele

    IPC分类号： H01J37/32

    CPC分类号： H01J37/32522 ,  B22F2998/00 ,  H01J37/3244 ,  H01J37/32568 ,  H01J37/32623 ,  H01J37/32834 ,  H01J2237/335 ,  B22F3/11

    摘要： The plasma reactor (10) defines a reaction chamber (23) provided with a support (30) for the metallic pieces (1) and an anode-cathode system (40), and a heating means (70) is mounted externally to said plasma reactor (10). The plasma process, for a cleaning operation, comprises the steps of connecting the support (30) to the grounded anode and the cathode to a negative potential of a power source (50); feeding an ionizable gaseous charge into the reaction chamber (23) and heating the latter at vaporization temperatures of piece contaminants; applying an electrical discharge to the cathode; and providing the exhaustion of the gaseous charge and contaminants. A subsequent heat treatment comprises the steps of: inverting the energization polarity of the anode-cathode system (40); feeding a new gaseous charge to the reaction chamber (23) and maintaining it heated; applying an electrical discharge to the cathode; and exhausting the gaseous charge from the reaction chamber (23).

    PLASMA PROCESS AND REACTOR FOR THE THERMOCHEMICAL TREATMENT OF THE SURFACE OF METALLIC PIECES
    9.
    发明公开
    PLASMA PROCESS AND REACTOR FOR THE THERMOCHEMICAL TREATMENT OF THE SURFACE OF METALLIC PIECES 审中-公开
    用于金属片表面热化学处理的等离子体处理和反应器

    公开(公告)号：EP3210233A1

    公开(公告)日：2017-08-30

    申请号：EP15790820.3

    申请日：2015-10-19

    申请人： Universidade Federal De Santa Catarina (UFSC)

    发明人： BINDER, Cristiano ,  BERNARDELLI, Euclides Alexandre ,  HAMMES, Gisele ,  KLEIN, Aloisio Nelmo ,  LAMIM, Thiago De Souza ,  BINDER, Roberto

    IPC分类号： H01J37/32 ,  C23C16/448 ,  H01J37/34

    摘要： The reactor (R) has a reaction chamber (RC) provided with a support (S) for the metallic pieces (1) and with a system of an anode (2), connected to a ground (2b), and of a cathode system (3) connected to the support (S) and to a pulsating DC power supply (10). In the reaction chamber (RC), which is heated and supplied with a gas load is formed, by means of an electric discharge in the cathode (3), a gas plasma. A liquid or gas precursor is admitted in at least one tubular cracking chamber (20) associated with a high voltage energy source (30). It may be provided at least one tubular sputtering chamber (40) associated with an electric power supply (50) receiving a solid precursor. A potential difference is applied between the anode (2) and one and/or other of said tubular chambers (20, 40), in order to release the alloy elements to be ionically bombarded against the metallic pieces (1), either simultaneously or individually and in any order.

    摘要翻译： 反应器（R）具有设置有用于金属片（1）的支撑件（S）的反应室（RC）以及连接到地面（2b）的阳极（2）的系统和阴极系统 （3）连接到支架（S）和脉动直流电源（10）。 在通过阴极（3）中的放电形成被加热并供应有气体负载的反应室（RC）中的气体等离子体。 液态或气态前体进入至少一个与高压能源（30）相关的管式裂化室（20）中。 可以提供与接收固体前体的电源（50）相关联的至少一个管状溅射室（40）。 在阳极（2）和所述管状腔室（20,40）中的一个和/或另一个之间施加电位差，以便同时或单独地释放合金元素以对金属片（1）进行离子轰击 并以任何顺序。