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    MEASUREMENT SYSTEM, LITHOGRAPHIC SYSTEM, AND METHOD OF MEASURING A TARGET
    1.
    发明公开
    MEASUREMENT SYSTEM, LITHOGRAPHIC SYSTEM, AND METHOD OF MEASURING A TARGET 审中-公开
    测量系统，光刻系统和测量目标的方法

    公开(公告)号：EP3321736A1

    公开(公告)日：2018-05-16

    申请号：EP16198200.4

    申请日：2016-11-10

    申请人： ASML Netherlands B.V.

    发明人： TUKKER, Teunis, Willem ,  VAN DER ZOUW, Gerbrand ,  SINGH, Amandev

    IPC分类号： G03F7/20 ,  G03F9/00

    CPC分类号： G03F7/70633 ,  G01N21/95607 ,  G03F7/7015 ,  G03F7/70625 ,  G03F9/7046 ,  G03F9/7069 ,  G03F9/7088

    摘要： A measurement system is disclosed in which a first optical system splits an input radiation beam into a plurality of components. A modulator receives the plurality of components and applies a modulation to at least one of the components independently of at least one other of the components. A second optical system illuminates a target with the plurality of components and directs radiation scattered by the target to a detection system. The detection system distinguishes between each of one or more components, or between each of one or more groups of components, of the radiation directed to the detection system based on the modulation applied to each component or each group of components by the modulator.

    摘要翻译： 公开了一种测量系统，其中第一光学系统将输入辐射束分成多个分量。 调制器接收多个分量并且独立于至少另一个分量对至少一个分量施加调制。 第二光学系统用多个部件照射目标，并将由目标散射的辐射引导至检测系统。 基于调制器应用于每个组件或每个组件的调制，检测系统区分被引导至检测系统的辐射的一个或多个组件中的每一个或者一个或多个组件组中的每一个之间。

    GEMSTONE VERIFICATION
    3.
    发明公开
    GEMSTONE VERIFICATION 审中-公开
    宝石验证

    公开(公告)号：EP3230720A2

    公开(公告)日：2017-10-18

    申请号：EP15839123.5

    申请日：2015-12-08

    申请人： Sahajanand Medical Technologies Private Limited

    发明人： GAYWALA, Rahul Mahendra ,  GAJJAR, Munjalkumar Dhirajlal ,  PATEL, Chetan Fulchandbhai

    IPC分类号： G01N21/87 ,  G01N33/38

    CPC分类号： G01N21/87 ,  G01N21/95607 ,  G01N33/381 ,  G01N2201/06113 ,  G06F17/30247 ,  G06K19/06028

    摘要： Method(s) and System(s) for verifying authenticity of a gemstone (108) are described. The method includes receiving identification information associated with a gemstone (108). The identification information is indicative of at least one of a model number, a part number, a date, a time, and a gemstone ID associated with the gemstone (108). Thereafter, the gemstone (108) is analyzed to obtain an image pattern corresponding to the gemstone (108), the image pattern is based on refraction and reflection of a radiation incident on the gemstone (108). Thereafter, the method includes identifying a unique image pattern corresponding to the image pattern in a database. A stored identification information corresponding to the unique image pattern is then identified. The stored identification information and the unique image pattern are stored in the database for verification of the gemstone (108).

    摘要翻译： 描述了用于验证宝石（108）的真实性的方法和系统。 该方法包括接收与宝石（108）相关联的识别信息。 识别信息指示与宝石（108）相关联的型号，部件号，日期，时间以及宝石ID中的至少一个。 此后，分析宝石（108）以获得对应于宝石（108）的图像图案，图像图案基于入射在宝石（108）上的辐射的折射和反射。 此后，该方法包括在数据库中识别对应于图像图案的独特图像图案。 然后识别对应于唯一图像图案的存储的标识信息。 所存储的识别信息和唯一图像图案被存储在数据库中以验证宝石（108）。

    METHOD FOR GENERATING COMPENSATION MATRIX DURING SUBSTRATE INSPECTION
    4.
    发明公开
    METHOD FOR GENERATING COMPENSATION MATRIX DURING SUBSTRATE INSPECTION 有权
    用于生产MATRIX补偿时的测试基板

    公开(公告)号：EP3046406A4

    公开(公告)日：2016-11-16

    申请号：EP14844693

    申请日：2014-09-11

    申请人： KOHYOUNG TECHNOLOGY INC

    发明人： YOU HEEWOOK ,  CHOI JONGJIN ,  JUNG SEUNGWON

    IPC分类号： G01N21/956 ,  G06T7/00

    CPC分类号： G01N21/8851 ,  G01N21/956 ,  G01N21/95607 ,  G01N21/95684 ,  G01N2021/8896 ,  G01N2021/95638 ,  G01N2201/121 ,  G06T5/006 ,  G06T2207/20076 ,  G06T2207/30141

    摘要： The present invention relates to a method for generating a compensation matrix during a substrate inspection. The method comprises the steps of: selecting information of N1 (N1 ‰§2) feature objects which are randomly predetermined within a field of view (FOV) on a substrate; generating a first compensation matrix on the basis of information of the feature objects which are extracted on the substrate; comparing an offset value of each of all the feature objects with a predetermined reference value by applying all the feature objects within the FOV to the compensation matrix to count the number of the feature objects of which the offset value of the each of all the feature objects is less than the predetermined reference value; and repeatedly performing the above steps N2 times (N2‰§1), and generating a second compensation matrix using information of the feature objects which have the offset value which is less than the predetermined reference value, in case the number of the counted feature objects is the maximum.

    METHOD FOR GENERATING COMPENSATION MATRIX DURING SUBSTRATE INSPECTION
    5.
    发明公开
    METHOD FOR GENERATING COMPENSATION MATRIX DURING SUBSTRATE INSPECTION 有权
    VERFAHREN ZUR ERZEUGUNG EINER KOMPENSATIONSMATRIXWÄHRENDEINERSUBSTRATPRÜFUNG

    公开(公告)号：EP3046406A1

    公开(公告)日：2016-07-20

    申请号：EP14844693.3

    申请日：2014-09-11

    申请人： KohYoung Technology Inc.

    发明人： YOU, Heewook ,  CHOI, Jongjin ,  JUNG, Seungwon

    IPC分类号： H05K13/08

    CPC分类号： G01N21/8851 ,  G01N21/956 ,  G01N21/95607 ,  G01N21/95684 ,  G01N2021/8896 ,  G01N2021/95638 ,  G01N2201/121 ,  G06T5/006 ,  G06T2207/20076 ,  G06T2207/30141

    摘要： The present invention relates to a method for generating a compensation matrix during a substrate inspection. The method comprises the steps of: selecting information of N1 (N1 ≧2) feature objects which are randomly predetermined within a field of view (FOV) on a substrate; generating a first compensation matrix on the basis of information of the feature objects which are extracted on the substrate; comparing an offset value of each of all the feature objects with a predetermined reference value by applying all the feature objects within the FOV to the compensation matrix to count the number of the feature objects of which the offset value of the each of all the feature objects is less than the predetermined reference value; and repeatedly performing the above steps N2 times (N2≧1), and generating a second compensation matrix using information of the feature objects which have the offset value which is less than the predetermined reference value, in case the number of the counted feature objects is the maximum.

    摘要翻译： 本发明涉及在衬底检查期间产生补偿矩阵的方法。 该方法包括以下步骤：在衬底上选择在视场（FOV）内随机预定的N1（N1‰§2）特征对象的信息; 基于在所述基板上提取的所述特征对象的信息生成第一补偿矩阵; 通过将FOV内的所有特征对象应用于补偿矩阵来对所有特征对象中的每一个的偏移值与预定的参考值进行比较，以对所有特征对象中的每一个的偏移值进行计数的特征对象的数量 小于预定参考值; 并重复执行上述步骤N2次（N2‰§1），并且使用具有小于预定参考值的偏移值的特征对象的信息生成第二补偿矩阵，在计数特征对象的数量 是最大值。

    TIME-VARYING INTENSITY MAP GENERATION FOR RETICLES
    8.
    发明公开
    TIME-VARYING INTENSITY MAP GENERATION FOR RETICLES 审中-公开
    生成时间变化的强度卡的电网网络

    公开(公告)号：EP2815422A1

    公开(公告)日：2014-12-24

    申请号：EP13748706.2

    申请日：2013-02-14

    申请人： Kla-Tencor Corporation

    发明人： HESS, Carl ,  SHI, Rui-fang ,  VAVUL, Thomas

    IPC分类号： H01L21/027 ,  G03F1/44

    CPC分类号： G01N21/95 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F1/84 ,  G03F7/7065

    摘要： Disclosed are methods and apparatus for inspecting a photolithographic reticle. A plurality of patch areas of a reticle is defined. Prior to using a reticle in any photolithography process, an optical reticle inspection tool is used during a first inspection to obtain, for each of a plurality of sets of one or more patch areas, a reference average of multiple reference intensity values corresponding to light measured from a plurality of sub-areas of each patch area of the reticle. After using the reticle in a plurality of photolithography processes, the optical reticle inspection tool is used during a second inspection to obtain, for each of the sets of one or more patch areas, an average of multiple test intensity values corresponding to light measured from the plurality of sub-areas of each patch area of the reticle. A same setup recipe for the optical reticle inspection tool is used for both the first and second inspections. A difference intensity map is generated, and such map comprises a plurality of map values that each corresponds to a difference between each average of the test intensity values and average of the reference intensity values for each of the sets of one or more patches. The difference intensity map indicates whether the reticle has degraded over time more than a predefined level.

    INSPEKTIONSVERFAHREN
    9.
    发明公开
    INSPEKTIONSVERFAHREN 审中-公开
    检查程序

    公开(公告)号：EP2815230A1

    公开(公告)日：2014-12-24

    申请号：EP13701760.4

    申请日：2013-01-25

    申请人： Hseb Dresden GmbH

    发明人： SIAHKALI, Arman ,  SROCKA, Bernd ,  RAUE, Hagen

    IPC分类号： G01N21/95

    CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G06T2207/30148

    摘要： The invention relates to a method for the inspection of flat objects, in particular wafers (10, 12, 14, 16, 18, 20, 24, 26, 28, 30), comprising the following steps: recording one digital image of the object surface of several homogeneous objects of a series in each case, wherein each digital image consists of a multiplicity of pixels having an intensity value assigned to the said pixel; and detecting defects on the respective object surface by comparing the recorded image with a reference image; wherein the images of the objects of the whole series are recorded before the comparison with the reference image, and the reference image is generated from several or all images of the series, e.g. by averaging (median) the images of the series.