Abstract:
An optical coating structure is provided that when applied to a surface of an object to imparts a colour to the object, the optical coating structure comprising: a base layer; a reflector on the base layer; and profile elements on the base layer under the reflector, the profile elements having a width and length which are each in the range of 5 to 500 μm in size, and being arranged in non-periodic manner or a periodic manner. The reflector may be a multilayer structure of alternating dielectric materials. A method of forming the optical coating structure is also provided.
Abstract:
A display device includes a cover unit and a display panel coupled to the cover unit. The cover unit includes a first base member disposed on the display panel and including a first area and a second area when viewed in a plan view, a pattern layer disposed between the first base member and the display panel, a color layer disposed between the first base member and the pattern layer and having a light transmittance, and a reflective layer disposed between the display panel and the pattern layer.
Abstract:
A multilayer optical film including a stack of microlayers arranged into optical repeat units. At a design angle of incidence, such as normal incidence, the stack provides a 1st order reflection band, a 2nd order reflection band, and optionally a 3rd order reflection band. The 2nd order reflection band substantially overlaps the 1st and/or 3rd order reflection bands to form a single wide reflection band. The wide reflection band may cover at least a portion of visible and infrared wavelengths. The multilayer optical film may include an additional optical layer which maybe be an anti-glare layer and/or may be an absorbing layer. The multilayer optical film is suitable for use as a window film.
Abstract:
A reflective film includes interior layers arranged to selectively reflect light by constructive or destructive interference, the layers extending from a first zone to a second zone of the film. The film has a first thickness and the interior layers provide a first reflective characteristic in the first zone; the film has a second thickness and the interior layers provide a second reflective characteristic in the second zone. The difference between the first and second reflective characteristics is not substantially attributable to any difference between the first and second thicknesses, which difference may be zero. Rather, the difference in the reflective characteristics is substantially attributable to reduced birefringence of at least some of the interior layers in one zone relative to the other zone. The film may also incorporate absorbing agents to assist in the manufacture or processing of the film. Related methods and articles are also disclosed.
Abstract:
The invention relates to a durable coloured mirror (1) comprising a transparent substrate (2), a reflective metal layer (3) and at least one interface layer (4) between the substrate and the metal layer, characterised in that the interface layer (4) comprises at least one discontinuous metal layer (40), the so-called discontinuous layer, and at least one layer of a dielectric material (41) deposited on the discontinuous layer, the so-called overlayer. The discontinuous metal layer allows the adaptation of the colour reflected by the mirror. The nominal thickness thereof and the type of material, as well as the nature and thickness of the dielectric overlayer, play a role in obtaining the colour of the mirror.
Abstract:
The invention relates to a method for producing a mirror element, more particularly for a microlithographic projection exposure apparatus. A method according to the invention comprises the following steps: providing a substrate (101, 102, 103, 104, 201, 202, 301, 302, 401, 402, 501, 502, 801, 901, 951, 961) and forming a layer stack (111, 112, 113, 114, 211, 212, 311, 312, 411, 412, 511, 512) on the substrate, wherein forming the layer stack is carried out in such a way that a desired curvature - wanted for a predefined operating temperature - of the mirror element is produced by a bending force exerted by the layer stack, wherein, before the layer stack is formed, the substrate has a curvature deviating from said desired curvature of the mirror element, and wherein the bending force exerted by the layer stack is at least partly produced by an aftertreatment for altering the layer stress of the layer stack being carried out.
Abstract:
A broadband mirror, polarizer, or other reflector includes at least one stack of microlayers. Microlayers in the stack are arranged into optical repeat units. At a design angle of incidence such as normal incidence, the stack provides a 1st order reflection band, a 2nd order reflection band, and optionally a 3rd order reflection band. The 2nd order reflection band overlaps, or substantially overlaps, the 1st and/or 3rd order reflection bands to form a single wide reflection band. The wide reflection band may include the 2nd and 1st but not a 3rd order reflection band, or the 2nd and 3rd but not the 1st order reflection band, or it may include the 1st, 2nd, and 3rd order reflection bands, as well as still higher order reflection bands. The wide reflection band may cover at least a portion of visible and infrared wavelengths.
Abstract:
A multilayer mirror for reflecting extreme ultraviolet (EUV) radiation, the mirror comprises a substrate and a stack of layers formed on the substrate. The stack of layers comprises layers comprising a low index material and a high index material, the low index material having a lower real part of the refractive index than the high index material at a given operating wavelength λ. The mirror provides a first peak of reflectivity of 20% or more at a first wavelength λ 1 in a first wavelength band extending from 6 nm to 7 nm and a second peak of reflectivity of 20% or more at a second wavelength λ 2 in a second wavelength band extending from 12.5 nm to 15 nm.