公开(公告)号：EP3120363A2

公开(公告)日：2017-01-25

申请号：EP15812124.4

申请日：2015-03-17

申请人： Phoenix Nuclear Labs LLC

发明人： RADEL, Ross ,  SCHNEIDER, Dave ,  MOLL, Eli ,  OZBURN, David ,  SENGBUSCH, Evan ,  CAMPBELL, Logan

IPC分类号： G21G4/02

CPC分类号： G21G4/02 ,  G21C1/30 ,  H05H1/06 ,  H05H3/06

摘要： A first system for producing a high flux of neutrons for non-destructive testing includes a dense plasma focus device neutronically coupled to a subcritical or sub-prompt critical fission assembly. The dense plasma focus device is a source of initiating neutrons for the fission assembly, and the fission assembly is configured to multiply a number of the initiating neutrons via inducing fission. A second system for producing a high flux of neutrons includes a gas-target neutron generator neutronically coupled to a subcritical or sub-prompt critical fission assembly. The gas-target neutron generator is a source of initiating neutrons for the fission assembly, and the fission assembly is configured to multiply a number of the initiating neutrons via inducing fission.

摘要翻译： 用于为非破坏性测试产生高通量中子的第一系统包括中子耦合到亚临界或亚临界裂变组件的致密等离子体聚焦装置。 致密等离子体聚焦装置是用于裂变组件的起爆中子的来源，并且裂变组件被配置为通过诱导裂变使多个起爆中子相乘。 用于产生高通量中子的第二系统包括中子耦合到亚临界或亚临界裂变组件的气体靶中子发生器。 气体靶中子发生器是用于裂变组件的起爆中子的来源，并且裂变组件被配置为通过诱导裂变使多个起爆中子相乘。

公开(公告)号：EP1305985A2

公开(公告)日：2003-05-02

申请号：EP01966789.8

申请日：2001-03-28

申请人： Plex LLC

发明人： MCGEOCH, Malcolm, W.

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05H1/06

摘要： A Z-pinch plasma X-ray source includes a chamber having an insulating wall and defining a pinch region, a pinch anode and a pinch cathode positioned at opposite ends of the pinch region, a first conductor defining an edge in close proximity to or contacting an inside surface of the insulating wall and a second conductor disposed around an outside surface of the insulating wall. A surface discharge is produced on the inside surface of the insulating wall in response to application of a voltage to the first and second conductors. The surface discharge causes the gas to ionize and to form a plasma shell near the inside surface of the insulating wall. The pinch anode and the pinch cathode produce a current through the plasma shell in an axial direction and produce an azimuthal magnetic field in the pinch region in response to application of a high energy electric pulse to the pinch anode and the pinch cathode. The azimuthal magnetic field causes the plasma shell to collapse to the central axis and to generate X-rays.

公开(公告)号：EP3358916A1

公开(公告)日：2018-08-08

申请号：EP17203037.1

申请日：2017-11-22

申请人： The Boeing Company

发明人： ANDERSON, Jeffery S. ,  GISH, Erin R.

IPC分类号： H05H1/06 ,  H05H1/24 ,  H05H1/54 ,  F15D1/08 ,  F03H1/00 ,  B05B5/16 ,  B05B1/14

CPC分类号： F03H1/0081 ,  B05B1/14 ,  B05B5/1608 ,  B64G1/408 ,  F03H1/0012 ,  F15D1/08 ,  H05H1/06 ,  H05H1/54

摘要： An injection system (150) includes a reservoir (152) for containing liquid (158), and a gating plate (216) having a circular array of gating plate apertures (218). The injection system (150) additionally includes a faceplate (250) positioned adjacent to the gating plate (216) and having a circular array (258) of faceplate orifices (256). The injection system (150) also has a motor (242) to rotate the gating plate (216), and a controller (248) to control the motor (242) for rotating the gating plate (216) into an aligned clocking orientation in which the gating plate apertures (218) and the faceplate orifices (256) are aligned to initiate the formation of a cylindrical array of liquid jets, and rotate the gating plate (216) into a non-aligned clocking orientation terminate formation of the liquid jets after a predetermined discrete quantity of the liquid is injected.

公开(公告)号：EP1493039A4

公开(公告)日：2009-11-11

申请号：EP03723976

申请日：2003-04-09

申请人： CYMER INC

发明人： MELNYCHUK STEPHEN T ,  PARTLO WILLIAM N ,  FOMENKOV IGOR V ,  OLIVER I ROGER ,  NESS RICHARD M ,  BOWERING NORBERT ,  KHODYKIN OLEH ,  RETTIG CURTIS L ,  BLUMENSTOCK GERRY M ,  DYER TIMOTHY S ,  SIMMONS RODNEY D ,  HOFFMAN JERZY R ,  JOHNSON R MARK

IPC分类号： G21K5/00 ,  H05G2/00 ,  G01J1/00 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027 ,  H01S3/00 ,  H05H1/06 ,  H05H1/24

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70916 ,  H01S3/005 ,  H05G2/005 ,  H05G2/008 ,  H05H1/06

公开(公告)号：EP1602116A2

公开(公告)日：2005-12-07

申请号：EP04716949.5

申请日：2004-03-03

申请人： Cymer, Inc.

发明人： PARTLO, William, N. ,  BLUMENSTOCK, Gerry, M. ,  BOWERING, Norbert ,  BRUZZONE, Kent, A. ,  COBB, Dennis W. ,  DYER, Timothy, S. ,  DUNLOP, John ,  FOMENKOV, Igor, V. ,  HYSHAM, James, Christopher ,  OLIVER, Roger, I. ,  PALENSCHAT, Frederick, A. ,  PAN, Xiaojiang, J. ,  RETTIG, Curtis, L. ,  SIMMONS, Rodney, S. ,  WALKER, John ,  WEBB, Kyle, R. ,  HOFMANN, Thomas ,  KHODYKIN, Oleh

IPC分类号： H01J1/52

CPC分类号： H01S3/005 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70908 ,  G03F7/70916 ,  H01S3/225 ,  H05G2/003 ,  H05G2/005 ,  H05H1/06

摘要： An EUV source (20) includes a debris mitigation apparatus (60) employing a metal halogen gas producing a metal halide from debris exiting the plasma, a debris shield (36) having a plurality of curvilinear shield members (102) having inner and outer surface connected by light passages (104) and electrodes (28,88) for providing a discharged plasma (32) in a chamber (22).

公开(公告)号：EP1493039A2

公开(公告)日：2005-01-05

申请号：EP03723976.1

申请日：2003-04-09

申请人： Cymer, Inc.

发明人： MELNYCHUK, Stephen, T. ,  PARTLO, William, N. ,  FOMENKOV, Igor, V. ,  OLIVER, I., Roger ,  NESS, Richard, M. ,  BOWERING, Norbert ,  KHODYKIN, Oleh ,  RETTIG, Curtis, L. ,  BLUMENSTOCK, Gerry, M. ,  DYER, Timothy, S. ,  SIMMONS, Rodney, D. ,  HOFFMAN, Jerzy, R. ,  JOHNSON, R., Mark

IPC分类号： G01S1/00

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70916 ,  H01S3/005 ,  H05G2/005 ,  H05G2/008 ,  H05H1/06

摘要： A reliable, high-repetition rate, production line compatible high energy photon source wherein hot plasma containing an atomic element having an emission line within a desired extreme ultraviolet (EUV) wavelength range is produced in a vacuum chamber. The EUV light source unit is integrated directly into a lithography unit such as a stepper machine. The integrated parts may include a commentator, and a compression head of a solid-state pulse power unit and a vacuum vessel all as shown at (120). Support equipment is located in a support equipment cabinet (122), and rough vacuum pumps and high-pressure water pumps are located in a third cabinet (124). The pulse power unit provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts on a continuous basis and in excess of 20 Watts on a burst basis.

公开(公告)号：EP0759215B1

公开(公告)日：2003-06-04

申请号：EP96903678.9

申请日：1996-01-26

申请人： Cymer, Inc. ,  Advanced Pulse Power Technologies, Inc.

发明人： BIRX, Daniel, L. ,  DAS, Palash, P. ,  FOMENKOV, Igor, V. ,  PARTLO, William, N. ,  WATSON, Tom, A.

IPC分类号： H01S3/00 ,  H03K3/57 ,  H01S3/097 ,  H03K17/80

CPC分类号： H05H1/06 ,  H01S3/097 ,  H01S3/225 ,  H03K3/57 ,  H03K17/80 ,  H03K2217/0036

公开(公告)号：EP4376556A2

公开(公告)日：2024-05-29

申请号：EP24170038.4

申请日：2018-06-07

申请人： University of Washington ,  Lawrence Livermore National Security, LLC

发明人： SHUMLAK, Uri ,  MCLEAN, Harry S. ,  NELSON, BRIAN, A.

IPC分类号： H05H1/06

CPC分类号： G21B1/05 ,  G21B1/11 ,  H05H1/06 ,  H05H1/16 ,  H05H1/54 ,  Y02E30/10

摘要： An example plasma confinement system includes an inner electrode having a rounded first end that is disposed on a longitudinal axis of the plasma confinement system and an outer electrode that at least partially surrounds the inner electrode. The outer electrode includes a solid conductive shell and an electrically conductive material disposed on the solid conductive shell and on the longitudinal axis of the plasma confinement system. The electrically conductive material has a melting point within a range of 170° C to 800° C at 1 atmosphere of pressure. Related plasma confinement systems and methods are also disclosed herein.

公开(公告)号：EP3229330A1

公开(公告)日：2017-10-11

申请号：EP17164803.3

申请日：2017-04-04

申请人： The Boeing Company

发明人： CLEMEN Jr, Mark Joseph ,  GROSSNICKLE, James A ,  NIKIC, Dejan

IPC分类号： H01S4/00 ,  H05H1/06 ,  H01S3/032 ,  H01S3/22

CPC分类号： H01S4/00 ,  H01S3/032 ,  H01S3/22 ,  H05H1/06

摘要： Laser amplification utilizing plasma confinement of a gas laser gain media is described. The gas laser gain media is compressed into plasma utilizing a self-reinforcing magnetic field referred to a plasma pinch (e.g., a flow stabilized z-pinch). In the pinch, the gas laser gain media is compressed to a high density, which improves the gain of the media. Coherent light is transmitted through the plasma pinch, which is amplified by the plasma pinch.

摘要翻译： 描述了利用气体激光增益介质的等离子体约束的激光放大。 气体激光增益介质利用被称为等离子体收缩的自增强磁场（例如，流动稳定的z收缩）被压缩成等离子体。 在捏合中，气体激光增益介质被压缩到高密度，这提高了介质的增益。 相干光透过等离子体夹点，由等离子体夹点放大。

公开(公告)号：EP1602116A4

公开(公告)日：2010-03-31

申请号：EP04716949

申请日：2004-03-03

申请人： CYMER INC

发明人： PARTLO WILLIAM N ,  BLUMENSTOCK GERRY M ,  BOWERING NORBERT ,  BRUZZONE KENT A ,  COBB DENNIS W ,  DYER TIMOTHY S ,  DUNLOP JOHN ,  FOMENKOV IGOR V ,  HYSHAM JAMES CHRISTOPHER ,  OLIVER ROGER I ,  PALENSCHAT FREDERICK A ,  PAN XIAOJIANG J ,  RETTIG CURTIS L ,  SIMMONS RODNEY S ,  WALKER JOHN ,  WEBB KYLE R ,  HOFMANN THOMAS ,  KHODYKIN OLEH

IPC分类号： H01J1/52 ,  G01J20060101 ,  G03F7/20 ,  H01S3/00 ,  H01S3/225 ,  H05G2/00 ,  H05H1/06

CPC分类号： H01S3/005 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70908 ,  G03F7/70916 ,  H01S3/225 ,  H05G2/003 ,  H05G2/005 ,  H05H1/06