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    LASER PRODUCED PLASMA EUV LIGHT SOURCE
    2.
    发明公开
    LASER PRODUCED PLASMA EUV LIGHT SOURCE 有权
    LASERPRODUZIERTE PLASMA-EUV-LICHTQUELLE

    公开(公告)号：EP2095693A4

    公开(公告)日：2010-11-03

    申请号：EP07862537

    申请日：2007-12-04

    申请人： CYMER INC

    发明人： HANSSON BJORN A M ,  BYKANOV ALEXANDER N ,  FOMENKOV IGOR V ,  BRANDT DAVID C

    IPC分类号： H05G2/00 ,  G01J3/10

    CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

    摘要： An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.

    摘要翻译： 公开了一种EUV光源，其可以包括多个目标，例如锡滴，以及产生预脉冲和主脉冲的系统，其中具有用于照射目标的预脉冲以产生扩展的目标。 该系统还可以包括连续泵浦的激光器装置，其产生具有用于照射扩展的目标的主脉冲以产生EUV光脉冲的脉冲的主脉冲。 该系统还可以具有在EUV光脉冲的突发期间改变至少一个预脉冲参数的控制器。 此外，EUV光源还可以包括测量EUV光脉冲的脉冲串内的至少一个EUV光脉冲的强度的仪器，并且向控制器提供反馈信号以在脉冲串期间改变至少一个预脉冲参数 EUV光脉冲以产生具有预选剂量的EUV脉冲的脉冲串。

    HIGH RESOLUTION SPECTRAL MEASUREMENT DEVICE
    3.
    发明公开
    HIGH RESOLUTION SPECTRAL MEASUREMENT DEVICE 审中-公开
    高分辨率光谱测量

    公开(公告)号：EP1485686A4

    公开(公告)日：2008-09-24

    申请号：EP03744588

    申请日：2003-01-15

    申请人： CYMER INC

    发明人： SANDSTROM RICHARD L ,  ERSHOV ALEXANDER I ,  PARTLO WILLIAM N ,  FOMENKOV IGOR V ,  SMITH SCOTT T ,  BROWN DANIEL J W

    IPC分类号： G01J3/18 ,  G01J3/26 ,  G01J1/42 ,  G01J3/02 ,  G01J3/12 ,  G01J3/22 ,  G01J3/36 ,  G01J9/00 ,  G01J9/02 ,  G21K1/06 ,  H01S3/134 ,  H01S3/137

    CPC分类号： G01J3/26 ,  G01J1/4257 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/12 ,  G01J3/1804 ,  G01J3/22 ,  G01J9/02

    摘要： A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser (D) and the diffused light exiting the diffuser (D) illuminates an etalon (ET). A portion of its light exiting the etalon (ET) is collected and directed into a slit (S1) positioned at a fringe pattern of the etalon (ET). Light passing through the slit (S1) is collimated and the collimated light illuminates a grating (GR1) positioned in an approximately Littrow configuration which disperses the light according to wavelength. A portion of the dispersed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon (ET) and the grating (GR1) are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034pm (FWHM) and about 0.091pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiode array (PDA) and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array (PDA). Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer (50), and the etalon (ET) can be scanned.