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公开(公告)号：EP4246232A1
公开(公告)日：2023-09-20
申请号：EP22163108.8
申请日：2022-03-18
申请人： Stichting VU , Stichting Nederlandse Wetenschappelijk Onderzoek Instituten , Universiteit van Amsterdam , ASML Netherlands B.V.
发明人： VAN SCHAIJK, Theodorus, Thomas, Marinus , DEN BOEF, Arie, Jeffrey , DE BOER, Johannes, Fitzgerald , MESSINIS, Christos , BUIJS, Robin, Daniel
摘要： Disclosed is an illumination arrangement for providing at least one radiation beam for use as an illumination beam and/or reference beam in a metrology device. The illumination arrangement comprises at least one radiation beam modifier module operable to receive source illumination and output a modified radiation beam comprising a first beam component and a second beam component. Each radiation beam modifier module comprises at least one path length varying arrangement for controllably varying the optical path length of at least one of said first beam component and said second beam component, such that said first beam component and second beam component of said modified radiation beam comprise a respective different optical path length.
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公开(公告)号：EP4451021A1
公开(公告)日：2024-10-23
申请号：EP23168262.6
申请日：2023-04-17
发明人： ABDOLVAND, Amir , NI, Yongfeng , BUIJS, Robin, Daniel , DEN BOEF, Arie, Jeffrey , PROVINO, Laurent, Jean, François , VAN SCHAIJK, Theodorus, Thomas, Marinus
IPC分类号： G02B6/02
摘要： A photonic crystal fiber (10) comprising a core region and a cladding region surrounding the core region. The core region and the cladding region comprise a material (12) having a first refractive index, the cladding region additionally comprising a plurality of microstructures (14) extending from an input end of the fiber along a longitudinal axis of the fiber to an output end of the fiber, the plurality of microstructures (14) having a second refractive index which less than the first refractive index. The plurality of microstructures in the cladding region are arranged in a cross-sectional pattern comprising at least one ring of microstructures surrounding the core region, wherein a diameter of the core region Dcore is at least 16 µm, the photonic crystal fiber having a transmission bandwidth of 200 nm or more.
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3.发明公开
公开(公告)号：EP4246231A1
公开(公告)日：2023-09-20
申请号：EP22163109.6
申请日：2022-03-18
申请人： Stichting VU , Stichting Nederlandse Wetenschappelijk Onderzoek Instituten , Universiteit van Amsterdam , ASML Netherlands B.V.
发明人： DEN BOEF, Arie, Jeffrey , VAN SCHAIJK, Theodorus, Thomas, Marinus , BUIJS, Robin, Daniel , DE BOER, Johannes, Fitzgerald , MESSINIS, Christos
摘要： A method for determining a vertical position of a structure on a substrate with respect to a nominal vertical position is disclosed. The method comprises obtaining complex field data relating to scattered radiation from said structure, for a plurality of different wavelengths, determining variation in a phase parameter with wavelength from said complex field data; and determining said vertical position with respect to a nominal vertical position from the determined variation in phase with wavelength.
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公开(公告)号：EP4361703A1
公开(公告)日：2024-05-01
申请号：EP22204014.9
申请日：2022-10-27
CPC分类号： G02B27/283 , G02B27/0043 , G03F7/706847 , G03F7/706849 , G03F9/7065 , G02B5/1828 , G02B26/0808 , G02B27/1006
摘要： Disclosed is an illumination configuration module comprising: a polarizing and wavelength separation arrangement operable to separate input broadband illumination into at least first dispersed illumination comprising a first polarization state and second dispersed illumination comprising a second polarization state; a single spatial light modulation device operable to individually modulate each of the first dispersed illumination and second dispersed illumination to obtain first spectrally configured illumination and second spectrally configured illumination; and output optics operable to combine said first spectrally configured illumination and second spectrally configured illumination into an output illumination beam.
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公开(公告)号：EP4318131A1
公开(公告)日：2024-02-07
申请号：EP22188074.3
申请日：2022-08-01
发明人： VAN SCHAIJK, Theodorus, Thomas, Marinus , BUIJS, Robin, Daniel , DEN BOEF, Arie, Jeffrey , DE WIT, Johannes, Matheus, Marie , TUKKER, Teunis, Willem
摘要： A sensor module is disclosed for a metrology apparatus. The sensor module comprises an illumination device for illuminating a structure on a substrate, said illumination device comprising at least a first set of illuminators and a second set of illuminators, wherein said first set of illuminators comprise one or more illuminators which are each operable to illuminate said structure with first illumination comprising a first optical characteristic and wherein said second set of illuminators comprise one or more illuminators which are each operable to illuminate said structure with second illumination comprising a second optical characteristic different to said first optical characteristic; an optical system being operable to capture scattered radiation scattered by the structure resultant from the structure being illuminated; and a detector operable to detect the scattered radiation.
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公开(公告)号：EP4332678A1
公开(公告)日：2024-03-06
申请号：EP22193868.1
申请日：2022-09-05
摘要： A method of determining a parameter of interest of a structure comprising at least one first feature oriented along a first axis of a structure coordinate system and at least one second feature oriented along a second axis of the structure coordinate system. The method comprising: illuminating the first feature and the second feature with first illumination from a first direction oblique to said first axis and second axis, so as to generate first scattered radiation from the first feature and second scattered radiation from the second feature, detecting a first interference pattern formed by interference between a portion of the first scattered radiation and first reference illumination; detecting a second interference pattern formed by interference between a portion of the second scattered radiation and the first reference illumination; and determining the parameter of interest of the structure using the first interference pattern and the second interference pattern.
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公开(公告)号：EP4312079A1
公开(公告)日：2024-01-31
申请号：EP22187892.9
申请日：2022-07-29
IPC分类号： G03F7/20
摘要： Disclosed is a method of determining an orthonormalized structure of interest reference image, the orthonormalized structure of interest reference image for applying to a measured image of the structure of interest to correct for the effect of crosstalk from at least one nuisance structure. The method comprises determining a structure of interest reference image based on knowledge of the structure of interest; determining at least one nuisance structure reference image based on knowledge of the at least one nuisance structure; and orthonormalizing the structure of interest reference image to the at least one nuisance reference image to obtain the orthonormalized structure of interest reference image.
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