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    Method for image reconstruction in a high-resolution electron microscope, and electon microscope suitable for use of such a method
    3.
    发明公开
    Method for image reconstruction in a high-resolution electron microscope, and electon microscope suitable for use of such a method 失效
    图像重建方法在高分辨率电子显微镜和使用了这样的方法，能够电子显微镜。

    公开(公告)号：EP0597538A1

    公开(公告)日：1994-05-18

    申请号：EP93203108.1

    申请日：1993-11-05

    申请人： Philips Electronics N.V.

    发明人： Coene, Willem Marie Julia Marcel

    IPC分类号： H01J37/22 ,  H01J37/26 ,  G03H5/00

    CPC分类号： H01J37/26 ,  G03H5/00 ,  H01J37/222 ,  H01J2237/1514 ,  H01J2237/228 ,  H01J2237/2614

    摘要： A method for image reconstruction in a high-resolution electron microscope is described. The Fourier transform (29) of an electron hologram (28) is composed of a central frequency domain CB = I hol,0 ( G ) and two sidebands SB+ =Ihoi,+( G ) and SB-=I hol ,-( G ). The two sidebands represent the linear image information. By making use of the frequencies in the central frequency domain in the image reconstruction, a non-linear image reconstruction is performed so that a resolution can be achieved which is considerably higher than the achievable information limit in linear image reconstruction by using the sidebands.

    摘要翻译： 描述了一种用于在高分辨率电子显微镜的图像重建方法。 傅立叶变换（29）的电子全息图（28）是由一个中心频率域CB = Ihol，0（G）和两个边带SB + = Ihol，+（G）和SB = Ihol，的 - （G）。 两个边带代表线性图像信息。 通过利用频率在图像重建的中心频率域，象分辨率可以所有这比通过使用边带中的线性图像重建可实现的信息限制高得多地实现非线性图像重建被执行。

    Pattern formation method and apparatus using atomic beam holography technology
    9.
    发明公开
    Pattern formation method and apparatus using atomic beam holography technology 审中-公开
    全息摄影师Verfahren und Vorrichtung zur Erzeugung von Mustern mit Atomstrahlen

    公开(公告)号：EP0950930A2

    公开(公告)日：1999-10-20

    申请号：EP99107172.1

    申请日：1999-04-13

    申请人： NEC CORPORATION

    发明人： Fujita, Junichi ,  Shimizu, Fujio c/o Department of Applied Physics

    IPC分类号： G03H5/00 ,  H01J37/317

    CPC分类号： G03H5/00 ,  H01J2237/3175

    摘要： A pattern formation method wherein a very small pattern composed of a desired element (atoms) is formed directly on a substrate by using atomic beam hologram technology. Quantum coherent reflection of an atomic wave is utilized. A coherent atomic beam is irradiated as a material wave, for example, upon a hologram of the transmission type to modulate the atomic beam with pattern information included in the hologram. The atomic beam having passed through and diffracted by the hologram is introduced to a reflecting plane so that the atomic beam may be quantum coherent reflected by the reflecting plane, and the atomic beam thus reflected is introduced into a substrate. A binary (two-value) hologram produced by computer synthesis is used suitably as the hologram. A hologram of the potential control type may be also used.

    摘要翻译： 通过使用原子束全息图技术，在基板上直接形成由期望的元素（原子）构成的非常小的图案的图案形成方法。 利用原子波的量子相干反射。 相干原子束作为材料波被照射，例如，在透射型全息图上，用包含在全息图中的图案信息来调制原子束。 通过全息图衍射的原子束被引入反射平面，使得原子束可以被反射平面反射的量子相干，并将如此反射的原子束引入到衬底中。 通过计算机合成产生的二值（双值）全息图被适当地用作全息图。 也可以使用电位控制型的全息图。