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    VARIABLE CAPACITOR BANK
    2.
    发明公开
    VARIABLE CAPACITOR BANK 审中-公开

    公开(公告)号：EP4283870A2

    公开(公告)日：2023-11-29

    申请号：EP23202393.7

    申请日：2019-09-04

    申请人： AES Global Holdings, Pte. Ltd.

    发明人： CRANDELL, Courtney, L.

    IPC分类号： H03H7/40

    摘要： A variable capacitor bank includes a conductive housing and a port extending through the housing. An electrical bus is disposed within the conductive housing and coupled to the port. The variable capacitor bank further includes capacitor modules disposed within the housing. Each capacitor module includes a module input electrically coupled to the electrical bus and a switched capacitor branch electrically coupled to the module input, the switched capacitor branch including a capacitor and a switch element in series with the capacitor. In certain implementations, one or more of the capacitor modules may include at least one second switched capacitor branch. The capacitor modules may further include an un switched, or "floor", capacitor that provides a minimum or otherwise known capacitance of the capacitor module. Each capacitor module may further be grounded by being electrically coupled to the conductive housing.

    SOLID-STATE IMPEDANCE MATCHING SYSTEMS INCLUDING A HYBRID TUNING NETWORK WITH A SWITCHABLE COARSE TUNING NETWORK AND A VARACTOR FINE TUNING NETWORK
    5.
    发明公开
    SOLID-STATE IMPEDANCE MATCHING SYSTEMS INCLUDING A HYBRID TUNING NETWORK WITH A SWITCHABLE COARSE TUNING NETWORK AND A VARACTOR FINE TUNING NETWORK 审中-公开

    公开(公告)号：EP4220957A1

    公开(公告)日：2023-08-02

    申请号：EP23162193.9

    申请日：2017-03-21

    申请人： MKS Instruments, Inc.

    发明人： COUMOU, David J. ,  BROWN, Dennis M. ,  RADOMSKI, Aaron T. ,  OLDZIEJ, Mariusz ,  CHAWLA, Yogendra K. ,  LINCOLN, Daniel J.

    IPC分类号： H03H7/40 ,  H03H7/01 ,  H05H1/46 ,  H03F1/32 ,  H03F3/20 ,  H01J37/32 ,  H03F1/56 ,  H03F3/189 ,  H03H11/28

    摘要： An impedance matching network (104, 304, 1004) is disclosed for providing an impedance match between a RF generator (102, 202, 302, 1002) and a load (106) such as a plasma chamber (306), the impedance matching network comprising: a first electronic variable capacitance comprising: an input terminal (505) for receiving a first radio frequency (RF) input signal (RF IN ) from the RF generator (102, 202); a coarse tuning network (50, 502) comprising a switchable circuit configured to (i) receive the first radio RF input signal (RF IN ), (ii) output a first RF output signal (RF OUT ) to a reference terminal (506) or to the load (106), and (iii) receive a first direct current (DC) bias voltage (V BIAS - Fig. 3), wherein the switchable circuit is configured to be switched between a first state and a second state, and wherein a capacitance of the switchable circuit is based on the first DC bias voltage (V BIAS - Fig. 3) while in the first state and is not based on the first DC bias voltage (V BIAS - Fig. 3) while in the second state; and a fine tuning network (400, 504) connected in parallel with the coarse tuning network (50, 502), the fine tuning network (400, 504) comprising a back-to-back diode varactor (400), wherein the back-to-back diode varactor (400) is configured to receive a second DC bias voltage (V BIAS - Fig. 8a, 8b) and includes: a first diode (D2) configured to receive the first RF input signal (RF IN ), and a second diode connected (D1) in a back-to-back configuration with the first diode (D2) and configured to output a second RF output signal to the reference terminal (506) or to the load (106), wherein a capacitance of the back-to-back diode varactor (400) is based on the second DC bias voltage (V BIAS - Fig. 8a, 8b); and a transformer (602, 622) connected to the input terminal (505) and between the first electronic variable capacitance and the plasma chamber, wherein the transformer (602, 622) converts a RF input signal received from the RF generator (102, 202) to the first RF input signal (RF IN ).

    PLASMA GENERATING DEVICE
    8.
    发明公开
    PLASMA GENERATING DEVICE 审中-公开

    公开(公告)号：EP4174904A1

    公开(公告)日：2023-05-03

    申请号：EP21827961.0

    申请日：2021-06-25

    申请人： EN2CORE TECHNOLOGY INC.

    发明人： UHM, Sae Hoon ,  LEE, Yun Seong ,  SOHN, Yeong Hoon ,  PARK, Se Hong ,  KIM, Ji Hoon

    IPC分类号： H01J37/32 ,  H03H7/40

    摘要： According to one embodiment of the present disclosure, there can be provided a plasma generating device for performing plasma discharge, the plasma generating device having multiple operation modes including a first mode and a second mode, and including: a first power supply capable of changing a frequency within a first frequency range; a second power supply capable of changing a frequency within a second frequency range that is at least partially different from the first frequency range; a dielectric tube; and an antenna module including a first unit coil wound around the dielectric tube at least one time, a second unit coil wound around the dielectric tube at least one time, and a first capacitor connected in series between the first unit coil and the second unit coil.