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公开(公告)号:EP3602196B1
公开(公告)日:2024-01-03
申请号:EP18712471.4
申请日:2018-03-16
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公开(公告)号:EP3660189B1
公开(公告)日:2023-11-15
申请号:EP20152479.0
申请日:2015-03-24
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公开(公告)号:EP4234758A1
公开(公告)日:2023-08-30
申请号:EP21882602.2
申请日:2021-10-06
发明人: KOZONO, Tomoko , YUMOTO, Toru
摘要: Provided is a method that is for manufacturing a conductive pattern-provided structure, that involves simple manufacturing steps, and that enables formation of a conductive pattern-provided structure having excellent interlayer adhesion. One mode of the present invention provides a method for manufacturing a conductive pattern-provided structure, the method comprising: a coating film formation step for obtaining a coating film by printing, on a base material, a dispersion that contains copper oxide-containing particles; and a plating step for performing electroless plating on the coating film by using a plating solution. The plating solution contains EDTA (ethylenediaminetetraacetic acid).
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公开(公告)号:EP3969637B1
公开(公告)日:2022-11-02
申请号:EP21758055.4
申请日:2021-07-23
发明人: GÖTHE, Sven , ATTHOFF, Björn
IPC分类号: C23C18/20 , C08F271/00 , C09D151/08 , C09D151/04 , C08F285/00 , C08F283/04 , C08F220/20 , C08F220/06 , C08F4/34 , C08F2/46 , C08F4/04 , C08J7/18 , C09D4/00 , C23C18/28 , C23C18/30 , C23C18/38 , C23C18/16
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公开(公告)号:EP4038218A1
公开(公告)日:2022-08-10
申请号:EP20789234.0
申请日:2020-10-02
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公开(公告)号:EP3565915B8
公开(公告)日:2021-05-26
申请号:EP18779657.8
申请日:2018-09-28
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公开(公告)号:EP3565915B1
公开(公告)日:2021-01-20
申请号:EP18779657.8
申请日:2018-09-28
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公开(公告)号:EP3173508B1
公开(公告)日:2020-10-28
申请号:EP15825092.8
申请日:2015-07-15
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