METHOD FOR MANUFACTURING CONDUCTIVE PATTERN-PROVIDED STRUCTURE

    公开(公告)号:EP4234758A1

    公开(公告)日:2023-08-30

    申请号:EP21882602.2

    申请日:2021-10-06

    IPC分类号: C23C18/30 C23C18/40

    摘要: Provided is a method that is for manufacturing a conductive pattern-provided structure, that involves simple manufacturing steps, and that enables formation of a conductive pattern-provided structure having excellent interlayer adhesion. One mode of the present invention provides a method for manufacturing a conductive pattern-provided structure, the method comprising: a coating film formation step for obtaining a coating film by printing, on a base material, a dispersion that contains copper oxide-containing particles; and a plating step for performing electroless plating on the coating film by using a plating solution. The plating solution contains EDTA (ethylenediaminetetraacetic acid).