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公开(公告)号:EP3818380A1
公开(公告)日:2021-05-12
申请号:EP19749838.9
申请日:2019-07-05
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3.
公开(公告)号:EP3692378A1
公开(公告)日:2020-08-12
申请号:EP18812331.9
申请日:2018-10-02
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4.
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公开(公告)号:EP3327448A1
公开(公告)日:2018-05-30
申请号:EP16201131.6
申请日:2016-11-29
摘要: A scanning probe microscopy system (1) comprises a gap width measuring system for measuring, during probe exchange operations, a gap width (D1, D2) of a gap (3) in-between a probe (2) and a probe holder (21). The gap width measuring system comprises: a gas flow system (4, 5, 6, 7, 8) for controlling a gas flow of a gas by applying predetermined gas flow excitation conditions to said gas, wherein said gas flow occurs at least in said gap (3); a pressure sensor (9) for sensing a time-dependently variable pressure of said gas; and an evaluation system (10) for determining said gap width based on at least said sensed pressure and said predetermined gas flow excitation conditions. The invention allows for accurate measurement of the gap width, without substantially sacrificing building space of the SPM system nearby the location where the probe and the probe holder meet.
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公开(公告)号:EP2859360A1
公开(公告)日:2015-04-15
申请号:EP13742483.4
申请日:2013-06-10
申请人: Israelachvili, Jacob
发明人: Israelachvili, Jacob
CPC分类号: G01N13/00 , B01L3/00 , G01N1/00 , G01N1/28 , G01N3/04 , G01N19/02 , G01Q30/02 , G01Q30/18 , G01Q30/20 , G01Q70/02 , G02B21/26
摘要: A mounting system for samples and instruments for use with a measuring device such as a surface forces apparatus has a housing and a sample mount assembly positioned within the housing. The sample mount assembly has a pivot arm having a first edge and a flexing section. A spring has a first end coupled to the pivot arm. A first sample holder is coupled to the second end of the spring. A second sample holder is positioned in proximity to the first sample holder.
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公开(公告)号:EP2435837A4
公开(公告)日:2014-04-16
申请号:EP10781335
申请日:2010-05-28
发明人: CHOPRA HARSH DEEP , ARMSTRONG JASON N , HUA ZONGLU
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公开(公告)号:EP1012584A4
公开(公告)日:2006-10-04
申请号:EP98904705
申请日:1998-01-21
申请人: RAVE L L C
发明人: KLEY VICTOR B
IPC分类号: G01N27/00 , G01B7/34 , G01Q10/00 , G01Q30/02 , G01Q30/16 , G01Q40/00 , G01Q40/02 , G01Q60/06 , G01Q60/10 , G01Q60/18 , G01Q60/24 , G01Q70/02 , G01Q70/08 , G01Q70/16 , G01Q80/00 , G03F1/00 , G03F7/20 , G11B5/23 , G11B5/31
CPC分类号: G01Q70/16 , G01Q30/02 , G01Q30/16 , G01Q40/00 , G01Q40/02 , G01Q60/06 , G01Q70/02 , G01Q70/06 , G01Q80/00 , G03F1/84 , G03F7/2049 , G03F7/704 , G03F7/70616 , G11B5/232 , G11B5/3116 , G11B5/3163 , G11B5/3166
摘要: A system and method for measuring, analysis, removal, addition or imaging of material using nanostructures in conjunction with mechanical, electromagnetic (optical) and electrical means. Techniques for fabricating such nanostructures and techniques for combining these elements in a system which can modify bulk or large area objects such as silicon wafers, and masks for lithography.
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公开(公告)号:EP4055393A1
公开(公告)日:2022-09-14
申请号:EP20807915.2
申请日:2020-11-06
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公开(公告)号:EP3164720B1
公开(公告)日:2021-09-29
申请号:EP15738770.5
申请日:2015-07-03
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