Charged particle beam device
    11.
    发明专利
    Charged particle beam device 有权
    充电颗粒光束装置

    公开(公告)号:JP2007257969A

    公开(公告)日:2007-10-04

    申请号:JP2006079908

    申请日:2006-03-23

    Abstract: PROBLEM TO BE SOLVED: To provide a means for accurately measuring a surface potential at a high speed while applying retarding voltage to a test piece. SOLUTION: The retarding voltage is changed between a retarding voltage with which a primary electron beam does not reach the test piece and a retarding voltage with which the primary electron beam reaches the test piece. Output of a secondary electron detector at the time is detected and a potential at a surface of the test piece is calculated from relation between the retarding voltage and the output of the secondary electron detector. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种用于在向测试片施加延迟电压的同时高速精确地测量表面电位的装置。 解决方案:延迟电压在一次电子束未到达试片的延迟电压与一次电子束到达试片的延迟电压之间变化。 检测此时的二次电子检测器的输出,并根据延迟电压与二次电子检测器的输出之间的关系计算出试片表面的电位。 版权所有(C)2008,JPO&INPIT

    Pattern inspection method
    12.
    发明专利
    Pattern inspection method 审中-公开
    模式检验方法

    公开(公告)号:JP2007103645A

    公开(公告)日:2007-04-19

    申请号:JP2005291135

    申请日:2005-10-04

    Abstract: PROBLEM TO BE SOLVED: To realize automated generation of a recipe to be executed subsequently by obtaining and storing deviation between CAD (Computer Aided Design) data and a pattern inspection apparatus at the time of executing the recipe.
    SOLUTION: A plurality of patterns having priorities are registered to the recipe as the matching patterns of a global alignment point at the time of generating the recipe from the CAD data. When the generated recipe is executed first with the pattern inspection apparatus, pattern matching is conducted using the matching patterns in the priority sequence after movement to the global alignment point (801 to 803). When the pattern matching is completed successfully; the global alignment is conducted in order to obtain amount of deviation and amount of rotation, by utilizing coordinates of the position at which the pattern is found and the coordinates designated from the CAD data. If pattern matching has failed in all the matching patterns prepared; the global alignment is conducted by temporarily suspending the recipe, designating by an operator the pattern which should be located at the coordinates stored in the recipe on the image picked up (804 to 806), and utilizing the coordinate of the designated location and the coordinate designated from the CAD data.
    COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题:通过在执行食谱时获得和存储CAD(计算机辅助设计)数据和模式检查装置之间的偏差,实现随后执行的配方的自动生成。 解决方案:将具有优先权的多个图案作为从CAD数据生成配方时的全局对准点的匹配图案登记到配方。 当首先利用图案检查装置执行生成的配方时,在移动到全局对准点(801〜803)之后,使用优先顺序中的匹配图案进行图案匹配。 当模式匹配成功完成时; 通过利用找到图案的位置的坐标和从CAD数据指定的坐标来进行全局对准以获得偏差量和旋转量。 如果所有匹配模式中模式匹配失败; 通过临时挂起配方进行全局校准,由操作员指定应该位于拾取的图像上的食谱中存储的坐标上的图案(804至806),并利用指定位置和坐标的坐标 从CAD数据中指定。 版权所有(C)2007,JPO&INPIT

    Charged particle beam device, and operation condition setting device of charged particle beam device
    14.
    发明专利
    Charged particle beam device, and operation condition setting device of charged particle beam device 审中-公开
    充电颗粒光束装置和操作条件设置充电颗粒光束装置的装置

    公开(公告)号:JP2013164356A

    公开(公告)日:2013-08-22

    申请号:JP2012027960

    申请日:2012-02-13

    CPC classification number: G01B15/00 H01J37/28 H01J2237/2816 H01J2237/2817

    Abstract: PROBLEM TO BE SOLVED: To provide an electronic microscope device for improving the throughput of the device by accurately detecting a desired measurement pattern without detecting an addressing pattern in each time in the case of measuring an arbitrary position of a plurality of samples having the same shape, and a dimension measurement method in the device.SOLUTION: In the case of measuring an arbitrary position of a plurality of samples having the same shape, the measurement of a first sample is accurately subjected to visual field movement to a measurement pattern by using an addressing pattern. When detecting the addressing pattern and the measurement pattern at this time, a visual field deviation amount between targeted coordinates and actual coordinates is calculated, and the visual field deviation amount is reflected on targeted coordinates while measuring a pattern of the same coordinates when measuring the next sample.

    Abstract translation: 要解决的问题:提供一种电子显微镜装置,用于在测量具有相同形状的多个样本的任意位置的情况下,通过精确地检测期望的测量图案而不检测每次的寻址图案来提高设备的吞吐量 ,以及装置中的尺寸测量方法。解决方案:在测量具有相同形状的多个样品的任意位置的情况下,通过使用第一样品的测量精确地将第一样品的视场运动到测量图案 寻址模式。 此时,当检测到寻址图案和测量图案时,计算目标坐标和实际坐标之间的视野偏移量,并且在测量下一个测量时,在测量相同坐标的图案的同时,将目标坐标反映视野偏移量 样品。

    Charged particle beam apparatus
    15.
    发明专利
    Charged particle beam apparatus 有权
    充电颗粒光束装置

    公开(公告)号:JP2012155980A

    公开(公告)日:2012-08-16

    申请号:JP2011013560

    申请日:2011-01-26

    CPC classification number: H01J37/026 H01J37/28 H01J2237/0044 H01J2237/047

    Abstract: PROBLEM TO BE SOLVED: To provide a method of neutralizing a charged part, occurring in a region of a specimen irradiated with a charged particle beam, at high speed without mounting another device anew on a charged particle beam apparatus.SOLUTION: In a stage after irradiating a charged particle beam for measurement of a specimen before starting next measurement, a retarding voltage and/or an acceleration voltage is adjusted, and the operation is controlled so that neutralization is performed by reducing the difference between the value of the retarding voltage and the value of the acceleration voltage when compared with the difference during measurement. Since a charged part, occurring in a region of a specimen irradiated with a charged particle beam, can be neutralized without mounting another device on a charged particle beam apparatus, neutralization can be carried out without lowering the throughput.

    Abstract translation: 要解决的问题:提供一种中和在带电粒子束照射的样本的区域中的带电部分的方法,而不是在带电粒子束装置上重新安装另一个装置。 解决方案:在开始下一次测量之前在照射用于测量样品的带电粒子束之后的阶段中,调整延迟电压和/或加速电压,并且操作被控制,使得通过减小差异进行中和 在测量期间与延迟电压的值和加速电压的值之间的差值。 由于在被带电粒子束照射的样本的区域中发生的带电部分可以在不将另一装置安装在带电粒子束装置上的情况下被中和,可以在不降低生产率的情况下进行中和。 版权所有(C)2012,JPO&INPIT

    Method for evaluating pattern shape and electron microscope
    16.
    发明专利
    Method for evaluating pattern shape and electron microscope 有权
    用于评估图案形状和电子显微镜的方法

    公开(公告)号:JP2011107166A

    公开(公告)日:2011-06-02

    申请号:JP2011048474

    申请日:2011-03-07

    Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus of calculating and evaluating the level of roughness actually present in a pattern, for precisely and quickly evaluating the level of edge roughness from a SEM observation image of a fine line pattern having many noises, by calculating contribution of random noise of the apparatus on the basis of image data of one image and subtracting the roughness originated in the apparatus from a measurement value of an edge roughness index, from among the measured edge roughness indexes. SOLUTION: A quantity (or dispersion value) of fluctuation of edge position due to random noise is expected to be reduced statistically to 1/N when N edge position data items are averaged. Using this property, the single page image is averaged in a vertical direction with various values of parameter S, and then the edge roughness index is calculated. The S-dependence of the edge roughness index is analyzed and a term of a dispersion value directly proportional to 1/S is determined to be due to noise. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种计算和评估实际存在于图案中的粗糙度水平的方法和装置,用于从具有以下特征的细线图案的SEM观察图像精确且快速地评估边缘粗糙度的水平来精确和快速地评估: 通过根据一个图像的图像数据计算装置的随机噪声的贡献,并从测量的边缘粗糙度指标中减去来自边缘粗糙度指标的测量值的装置中产生的粗糙度的许多噪声。

    解决方案:当N个边缘位置数据项被平均时,由于随机噪声引起的边缘位置的波动的量(或色散值)预期在统计上减小到1 / N。 使用该属性,将单页图像在垂直方向上与参数S的各种值进行平均,然后计算边缘粗糙度指数。 分析边缘粗糙度指数的S依赖性,并将与1 / S成正比的色散值的项确定为噪声。 版权所有(C)2011,JPO&INPIT

    Charged particle beam device
    17.
    发明专利
    Charged particle beam device 有权
    充电颗粒光束装置

    公开(公告)号:JP2010251338A

    公开(公告)日:2010-11-04

    申请号:JP2010179923

    申请日:2010-08-11

    Abstract: PROBLEM TO BE SOLVED: To solve a problem in a conventional SEM, wherein the focus cannot be adjusted in a charged sample, or magnification cannot be correctly calculated, whereby a correct pattern dimension cannot be measured. SOLUTION: A retarding voltage is swept between a retarding voltage, with a primary electron beam not reaching a sample and a retarding voltage with the primary electron beam reaching the sample; the output of a secondary electron detector is detected, to acquire the retarding voltage and characteristics of the output of the secondary electron detector; and the potential of a sample surface is obtained based on the shift of the retarding voltage and the characteristics of the output of the secondary electron detector. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题为了解决传统的SEM中的问题,其中在带电样品中不能调节聚焦,或者无法正确计算放大倍数,从而不能测量正确的图案尺寸。 解决方案:延迟电压在一次电子束未到达样品的延迟电压和一次电子束到达样品的延迟电压之间扫描; 检测二次电子检测器的输出,以获得二次电子检测器的输出的延迟电压和特性; 并且基于延迟电压的偏移和二次电子检测器的输出的特性获得样品表面的电位。 版权所有(C)2011,JPO&INPIT

    Edge detecting method, and charged particle beam device
    18.
    发明专利
    Edge detecting method, and charged particle beam device 有权
    边缘检测方法和充电颗粒光束装置

    公开(公告)号:JP2009211960A

    公开(公告)日:2009-09-17

    申请号:JP2008054226

    申请日:2008-03-05

    CPC classification number: G06K9/4609 G06T7/13

    Abstract: PROBLEM TO BE SOLVED: To provide an edge detecting method and a device, wherein the edge can be detected stably by suppressing an effect of noises even in the case of an image having an inferior S/N ratio obtained by a charged particle beam device such as a scanning electron microscope or the like. SOLUTION: In order to solve the problems, the following method and device are presented in which a peak position is determined based on a two edge extracting method. As one embodiment, a combined method in which by combining a peak detecting method having a relatively high sensitivity as the edge detecting method, and a peak detecting method that is relatively hard to be effected by the noises compared with the former peak detecting method, the position where at least the two peak positions in the former method and the latter method are coincident is determined as the true peak position, is presented, and also the device therefor is presented. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题:为了提供边缘检测方法和装置,其中即使在通过带电粒子获得的具有较差S / N比的图像的情况下,也可以通过抑制噪声的影响来稳定地检测边缘 光束装置如扫描电子显微镜等。 解决方案:为了解决这些问题,提出了基于两边缘提取方法确定峰值位置的以下方法和装置。 作为一个实施例,通过组合具有相对较高灵敏度的峰值检测方法作为边缘检测方法的组合方法和与前一种峰值检测方法相比较难以被噪声影响的峰值检测方法, 将前一种方法中的至少两个峰值位置与后一种方法重合的位置确定为真实峰值位置,并给出其装置。 版权所有(C)2009,JPO&INPIT

    Method for evaluating pattern shapes with high accuracy, and apparatus thereof
    19.
    发明专利
    Method for evaluating pattern shapes with high accuracy, and apparatus thereof 有权
    用于高精度评估图案的方法及其装置

    公开(公告)号:JP2006215020A

    公开(公告)日:2006-08-17

    申请号:JP2005343047

    申请日:2005-11-29

    CPC classification number: G01N23/2251

    Abstract: PROBLEM TO BE SOLVED: To provide a method for evaluating edge roughness actually existing in an object to be observed or indexes of roughness in line width, and a roughness component originated from noise contained in a observation result from one sheet of image obtained by normal pattern observation in shorter time than the conventional time, and without decreasing at least a same precision as the conventional method, and to provide an apparatus thereof. SOLUTION: To precisely and quickly evaluate the degree of the edge roughness from a SEM observation image of a micro line pattern with noisy, contribution of random noise originated from a device in indexes of the edge roughness is calculated based on data of one sheet of image. The degree of roughness, actually existing in the pattern, is calculated by subtracting the roughness originated from the device from the measured value of the edge roughness index. Quantity (distributed values), originated from the random noise in fluctuations at edge position statistically reduces to 1/N when N pieces of edge position data, are averaged. The image is averaged by values of various parameters S to one image in the lengthwise direction, by using the feature, and then the index of edge roughness is determined. The S dependence of the index of edge roughness is analyzed, and a term with distributed value proportional to 1/S is originated from noise. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题:提供一种用于评估实际存在于要观察对象物中的边缘粗糙度的方法或线宽度粗糙度指标,以及源自所获得的一张图像的观察结果中包含的噪声的粗糙度分量 通过常规图形观察在比传统时间更短的时间内,并且不降低与常规方法至少相同的精度,并提供其装置。

    解决方案:为了从具有噪声的微线图案的SEM观察图像精确且快速地评估边缘粗糙度的程度,基于一个数据,计算来自边缘粗糙度指标的器件的随机噪声的贡献 一张图片。 实际存在于图案中的粗糙度通过从边缘粗糙度指数的测量值中减去从装置产生的粗糙度来计算。 当N个边缘位置数据被平均时,源自边缘位置波动的随机噪声的数量(分布值)统计地减小到1 / N。 通过使用该特征,将图像通过各种参数S的长度方向的一个图像的值进行平均,然后确定边缘粗糙度的指标。 分析了边缘粗糙度指数的S依赖性,分布值与1 / S成比例的项源自噪声。 版权所有(C)2006,JPO&NCIPI

    走査型電子顕微鏡及び試料観察方法
    20.
    发明专利
    走査型電子顕微鏡及び試料観察方法 有权
    扫描电子显微镜和样品观察方法

    公开(公告)号:JP2015043334A

    公开(公告)日:2015-03-05

    申请号:JP2014216829

    申请日:2014-10-24

    CPC classification number: H01J37/28 H01J2237/2803

    Abstract: 【課題】走査型電子顕微鏡を用いた観察において、一次荷電粒子線照射起因帯電の影響を抑制し、二次電子の検出率を向上させることで二次元パターンの輪郭のコントラストを向上させると共にシェーディングを抑制できる好適な走査装置及び方法を提供する。【解決手段】GUIと、試料に関する情報を入力する試料情報入力手段と、該試料情報入力手段により入力することによって推奨走査条件が前記GUIに表示する表示手段と、該推奨走査条件を選択することによって前記試料に応じた走査線密度で走査することを特徴とする走査型電子顕微鏡。【選択図】図5

    Abstract translation: 要解决的问题:为了提供合适的扫描装置和方法,其抑制由于一次带电粒子束的照射引起的充电的影响,在使用扫描电子显微镜的观察中,增强了二维图案的轮廓的对比度 同时通过提高二次电子的检测率来抑制阴影。解决方案:扫描电子显微镜包括GUI,用于输入关于样本的信息的样本信息输入装置和用于通过从GUI输入来显示推荐的扫描条件的显示装置 样本信息输入装置。 通过选择推荐的扫描条件,根据样品扫描线密度进行扫描。

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